KR101273688B1 - 경화성 수지 조성물 및 반사 방지막 - Google Patents

경화성 수지 조성물 및 반사 방지막 Download PDF

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KR101273688B1
KR101273688B1 KR1020060110365A KR20060110365A KR101273688B1 KR 101273688 B1 KR101273688 B1 KR 101273688B1 KR 1020060110365 A KR1020060110365 A KR 1020060110365A KR 20060110365 A KR20060110365 A KR 20060110365A KR 101273688 B1 KR101273688 B1 KR 101273688B1
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group
compound
resin composition
curable resin
meth
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KR20070050372A (ko
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겐스께 미야오
군페이 고바야시
도시미쯔 기꾸찌
미쯔노부 도이모또
다까히로 가와이
다까로 야시로
히데아끼 다까세
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제이에스알 가부시끼가이샤
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C08L101/04—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
KR1020060110365A 2005-11-10 2006-11-09 경화성 수지 조성물 및 반사 방지막 Active KR101273688B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2005326009 2005-11-10
JPJP-P-2005-00326009 2005-11-10
JPJP-P-2006-00049627 2006-02-27
JP2006049627 2006-02-27
JPJP-P-2006-00273925 2006-10-05
JP2006273925A JP5045052B2 (ja) 2005-11-10 2006-10-05 硬化性樹脂組成物及び反射防止膜

Publications (2)

Publication Number Publication Date
KR20070050372A KR20070050372A (ko) 2007-05-15
KR101273688B1 true KR101273688B1 (ko) 2013-06-12

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KR1020060110365A Active KR101273688B1 (ko) 2005-11-10 2006-11-09 경화성 수지 조성물 및 반사 방지막

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JP (1) JP5045052B2 (https=)
KR (1) KR101273688B1 (https=)
CN (1) CN1962748B (https=)
TW (1) TWI471376B (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4678399B2 (ja) * 2006-12-01 2011-04-27 Ｊｓｒ株式会社 反射防止膜
JP2009143048A (ja) * 2007-12-12 2009-07-02 Tdk Corp ハードコート層および光透過層を有する積層体およびその製造方法
JP5672661B2 (ja) * 2008-04-25 2015-02-18 日立化成株式会社 樹脂組成物及びその硬化物を用いた光学部材
JP2009292898A (ja) * 2008-06-03 2009-12-17 Kaneka Corp 硬化性組成物およびその硬化物
JP5441056B2 (ja) * 2008-11-28 2014-03-12 日東電工株式会社 ハードコート層形成用組成物、ハードコートフィルム、光学素子および画像表示装置
US9005750B2 (en) 2009-07-08 2015-04-14 Nitto Denko Corporation Transparent conductive film, electronic device, and touch panel
JP6128576B2 (ja) 2011-04-22 2017-05-17 日東電工株式会社 光学積層体
JP2012234164A (ja) * 2011-04-22 2012-11-29 Nitto Denko Corp 光学積層体
WO2013153936A1 (ja) * 2012-04-13 2013-10-17 横浜ゴム株式会社 光硬化性樹脂組成物
JP5737466B1 (ja) * 2013-08-02 2015-06-17 ダイキン工業株式会社 重合性官能基及び架橋性官能基からなる群より選択される少なくとも１種の基を含有する含フッ素重合体を含む組成物及び塗装物品
CN104007618B (zh) * 2014-06-18 2017-09-29 杭州福斯特应用材料股份有限公司 一种pcb用高粘附力感光干膜
JP6543344B2 (ja) * 2015-08-06 2019-07-10 シャープ株式会社 光学部材、及び、ナノインプリント用の重合性組成物
CN106009021B (zh) * 2016-05-18 2019-03-12 西南科技大学 一种适合塑料基材的减反射、防指纹涂覆膜的制备方法
KR102753467B1 (ko) * 2020-05-14 2025-01-10 삼성에스디아이 주식회사 경화형 수지 조성물, 그로부터 형성된 경화막, 및 상기 경화막을 갖는 전자 장치
CN115551934B (zh) * 2020-05-14 2024-03-12 三星Sdi株式会社 硬化性树脂组合物、由其制备的硬化膜、以及包括硬化膜的电子装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005089536A (ja) 2003-09-12 2005-04-07 Jsr Corp 硬化性樹脂組成物及び反射防止膜
JP2005179613A (ja) 2003-12-24 2005-07-07 Tdk Corp ハードコート剤組成物及びこれを用いた光情報媒体

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
JPH05279435A (ja) * 1992-04-01 1993-10-26 Asahi Glass Co Ltd 活性エネルギー線硬化性組成物
JPH0729232A (ja) * 1993-07-14 1995-01-31 Kuraray Co Ltd 光磁気記録媒体
JP3118389B2 (ja) * 1995-02-28 2000-12-18 株式会社クラレ 含水性眼用レンズ材料
JP3474330B2 (ja) * 1995-10-03 2003-12-08 Ｊｓｒ株式会社 反応性シリカ粒子、その製法および用途
JP4271840B2 (ja) * 1999-11-10 2009-06-03 パナソニック株式会社 光ディスク
JP4085630B2 (ja) * 2001-12-21 2008-05-14 Ｊｓｒ株式会社 エチレン性不飽和基含有含フッ素重合体、並びにそれを用いた硬化性樹脂組成物及び反射防止膜
JP2003185820A (ja) * 2001-12-21 2003-07-03 Jsr Corp 感放射線性屈折率変化性組成物および屈折率変化法
JP4452909B2 (ja) * 2003-03-27 2010-04-21 Ｄｉｃ株式会社 フッ素系界面活性剤
JP4213989B2 (ja) * 2003-05-08 2009-01-28 富士フイルム株式会社 防眩性フィルムの製造方法
JP2005186568A (ja) * 2003-12-26 2005-07-14 Fuji Photo Film Co Ltd 反射防止フィルム、偏光板及び液晶表示装置
JP2005234476A (ja) * 2004-02-23 2005-09-02 Fuji Photo Film Co Ltd 反射防止膜、反射防止フィルムおよび画像表示装置
JP2006036835A (ja) * 2004-07-23 2006-02-09 Jsr Corp 硬化性樹脂組成物及び反射防止膜

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005089536A (ja) 2003-09-12 2005-04-07 Jsr Corp 硬化性樹脂組成物及び反射防止膜
JP2005179613A (ja) 2003-12-24 2005-07-07 Tdk Corp ハードコート剤組成物及びこれを用いた光情報媒体

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JP2007254706A (ja) 2007-10-04
CN1962748A (zh) 2007-05-16
KR20070050372A (ko) 2007-05-15
JP5045052B2 (ja) 2012-10-10
TWI471376B (zh) 2015-02-01
TW200730576A (en) 2007-08-16
CN1962748B (zh) 2010-11-03

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