KR101273688B1 - 경화성 수지 조성물 및 반사 방지막 - Google Patents

경화성 수지 조성물 및 반사 방지막 Download PDF

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KR101273688B1
KR101273688B1 KR1020060110365A KR20060110365A KR101273688B1 KR 101273688 B1 KR101273688 B1 KR 101273688B1 KR 1020060110365 A KR1020060110365 A KR 1020060110365A KR 20060110365 A KR20060110365 A KR 20060110365A KR 101273688 B1 KR101273688 B1 KR 101273688B1
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group
compound
resin composition
curable resin
meth
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KR20070050372A (ko
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겐스께 미야오
군페이 고바야시
도시미쯔 기꾸찌
미쯔노부 도이모또
다까히로 가와이
다까로 야시로
히데아끼 다까세
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제이에스알 가부시끼가이샤
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C08L101/04—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
KR1020060110365A 2005-11-10 2006-11-09 경화성 수지 조성물 및 반사 방지막 Active KR101273688B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00326009 2005-11-10
JP2005326009 2005-11-10
JPJP-P-2006-00049627 2006-02-27
JP2006049627 2006-02-27
JPJP-P-2006-00273925 2006-10-05
JP2006273925A JP5045052B2 (ja) 2005-11-10 2006-10-05 硬化性樹脂組成物及び反射防止膜

Publications (2)

Publication Number Publication Date
KR20070050372A KR20070050372A (ko) 2007-05-15
KR101273688B1 true KR101273688B1 (ko) 2013-06-12

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JP (1) JP5045052B2 (enExample)
KR (1) KR101273688B1 (enExample)
CN (1) CN1962748B (enExample)
TW (1) TWI471376B (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4678399B2 (ja) * 2006-12-01 2011-04-27 Ｊｓｒ株式会社 反射防止膜
JP2009143048A (ja) * 2007-12-12 2009-07-02 Tdk Corp ハードコート層および光透過層を有する積層体およびその製造方法
JP5672661B2 (ja) * 2008-04-25 2015-02-18 日立化成株式会社 樹脂組成物及びその硬化物を用いた光学部材
JP2009292898A (ja) * 2008-06-03 2009-12-17 Kaneka Corp 硬化性組成物およびその硬化物
JP5441056B2 (ja) * 2008-11-28 2014-03-12 日東電工株式会社 ハードコート層形成用組成物、ハードコートフィルム、光学素子および画像表示装置
WO2011004845A1 (ja) 2009-07-08 2011-01-13 日東電工株式会社 透明導電性フィルム、電子機器およびタッチパネル
JP2012234164A (ja) * 2011-04-22 2012-11-29 Nitto Denko Corp 光学積層体
JP6128576B2 (ja) 2011-04-22 2017-05-17 日東電工株式会社 光学積層体
WO2013153936A1 (ja) * 2012-04-13 2013-10-17 横浜ゴム株式会社 光硬化性樹脂組成物
US10066108B2 (en) * 2013-08-02 2018-09-04 Daikin Industries, Ltd. Composition including fluorine-containing polymer comprising at least one type of group selected from group comprising polymerizable functional groups and cross-linkable functional groups; and coated article
CN104007618B (zh) * 2014-06-18 2017-09-29 杭州福斯特应用材料股份有限公司 一种pcb用高粘附力感光干膜
US10471692B2 (en) * 2015-08-06 2019-11-12 Sharp Kabushiki Kaisha Optical member and polymerizable composition for nanoimprinting
CN106009021B (zh) * 2016-05-18 2019-03-12 西南科技大学 一种适合塑料基材的减反射、防指纹涂覆膜的制备方法
KR102753467B1 (ko) * 2020-05-14 2025-01-10 삼성에스디아이 주식회사 경화형 수지 조성물, 그로부터 형성된 경화막, 및 상기 경화막을 갖는 전자 장치
WO2021230552A1 (ko) * 2020-05-14 2021-11-18 삼성에스디아이 주식회사 경화형 수지 조성물, 그로부터 형성된 경화막, 및 상기 경화막을 갖는 전자 장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005089536A (ja) 2003-09-12 2005-04-07 Jsr Corp 硬化性樹脂組成物及び反射防止膜
JP2005179613A (ja) 2003-12-24 2005-07-07 Tdk Corp ハードコート剤組成物及びこれを用いた光情報媒体

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Publication number Priority date Publication date Assignee Title
JPH05279435A (ja) * 1992-04-01 1993-10-26 Asahi Glass Co Ltd 活性エネルギー線硬化性組成物
JPH0729232A (ja) * 1993-07-14 1995-01-31 Kuraray Co Ltd 光磁気記録媒体
JP3118389B2 (ja) * 1995-02-28 2000-12-18 株式会社クラレ 含水性眼用レンズ材料
JP3474330B2 (ja) * 1995-10-03 2003-12-08 Ｊｓｒ株式会社 反応性シリカ粒子、その製法および用途
JP4271840B2 (ja) * 1999-11-10 2009-06-03 パナソニック株式会社 光ディスク
JP2003185820A (ja) * 2001-12-21 2003-07-03 Jsr Corp 感放射線性屈折率変化性組成物および屈折率変化法
JP4085630B2 (ja) * 2001-12-21 2008-05-14 Ｊｓｒ株式会社 エチレン性不飽和基含有含フッ素重合体、並びにそれを用いた硬化性樹脂組成物及び反射防止膜
JP4452909B2 (ja) * 2003-03-27 2010-04-21 Ｄｉｃ株式会社 フッ素系界面活性剤
JP4213989B2 (ja) * 2003-05-08 2009-01-28 富士フイルム株式会社 防眩性フィルムの製造方法
JP2005186568A (ja) * 2003-12-26 2005-07-14 Fuji Photo Film Co Ltd 反射防止フィルム、偏光板及び液晶表示装置
JP2005234476A (ja) * 2004-02-23 2005-09-02 Fuji Photo Film Co Ltd 反射防止膜、反射防止フィルムおよび画像表示装置
JP2006036835A (ja) * 2004-07-23 2006-02-09 Jsr Corp 硬化性樹脂組成物及び反射防止膜

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005089536A (ja) 2003-09-12 2005-04-07 Jsr Corp 硬化性樹脂組成物及び反射防止膜
JP2005179613A (ja) 2003-12-24 2005-07-07 Tdk Corp ハードコート剤組成物及びこれを用いた光情報媒体

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CN1962748B (zh) 2010-11-03
TW200730576A (en) 2007-08-16
CN1962748A (zh) 2007-05-16
TWI471376B (zh) 2015-02-01
JP2007254706A (ja) 2007-10-04
KR20070050372A (ko) 2007-05-15
JP5045052B2 (ja) 2012-10-10

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