KR101201577B1 - 향상된 조직 균일성을 가진 내화 금속판 - Google Patents

향상된 조직 균일성을 가진 내화 금속판 Download PDF

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Publication number
KR101201577B1
KR101201577B1 KR1020107002603A KR20107002603A KR101201577B1 KR 101201577 B1 KR101201577 B1 KR 101201577B1 KR 1020107002603 A KR1020107002603 A KR 1020107002603A KR 20107002603 A KR20107002603 A KR 20107002603A KR 101201577 B1 KR101201577 B1 KR 101201577B1
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South Korea
Prior art keywords
refractory metal
thickness
plate
metal plate
gradient
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Korean (ko)
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KR20100054127A (ko
Inventor
피터 알. 젭슨
딘서 보즈카야
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에이치. 씨. 스타아크 아이앤씨
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • B21B1/227—Surface roughening or texturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/18—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces by using pressure rollers
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18—High-melting or refractory metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B2265/00—Forming parameters
    • B21B2265/24—Forming parameters asymmetric rolling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B2267/00—Roll parameters
    • B21B2267/02—Roll dimensions
    • B21B2267/06—Roll diameter
    • B21B2267/065—Top and bottom roll have different diameters; Asymmetrical rolling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B2273/00—Path parameters
    • B21B2273/02—Vertical deviation, e.g. slack, looper height
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B39/00—Arrangements for moving, supporting, or positioning work, or controlling its movement, combined with or arranged in, or specially adapted for use in connection with, metal-rolling mills
    • B21B39/02—Feeding or supporting work; Braking or tensioning arrangements, e.g. threading arrangements
    • B21B39/04—Lifting or lowering work for conveying purposes, e.g. tilting tables arranged immediately in front of or behind the pass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12458—All metal or with adjacent metals having composition, density, or hardness gradient

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Metal Rolling (AREA)
  • Powder Metallurgy (AREA)
  • Forging (AREA)
  • Control Of Metal Rolling (AREA)
KR1020107002603A 2007-08-06 2008-08-05 향상된 조직 균일성을 가진 내화 금속판 Active KR101201577B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US96361607P 2007-08-06 2007-08-06
US60/963,616 2007-08-06
PCT/US2008/009388 WO2009020587A1 (en) 2007-08-06 2008-08-05 Refractory metal plates with improved uniformity of texture

Publications (2)

Publication Number Publication Date
KR20100054127A KR20100054127A (ko) 2010-05-24
KR101201577B1 true KR101201577B1 (ko) 2012-11-14

Family

ID=40020260

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020107002603A Active KR101201577B1 (ko) 2007-08-06 2008-08-05 향상된 조직 균일성을 가진 내화 금속판
KR1020127018608A Active KR101365774B1 (ko) 2007-08-06 2008-08-06 틸트 압연에 의해 플레이트 및 시트의 조직을 제어하기 위한 방법 및 장치
KR1020107002711A Active KR101204245B1 (ko) 2007-08-06 2008-08-06 틸트 압연에 의해 플레이트 및 시트의 조직을 제어하기 위한 방법 및 장치

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020127018608A Active KR101365774B1 (ko) 2007-08-06 2008-08-06 틸트 압연에 의해 플레이트 및 시트의 조직을 제어하기 위한 방법 및 장치
KR1020107002711A Active KR101204245B1 (ko) 2007-08-06 2008-08-06 틸트 압연에 의해 플레이트 및 시트의 조직을 제어하기 위한 방법 및 장치

Country Status (7)

Country Link
US (5) US9095885B2 (enExample)
EP (3) EP2185300B1 (enExample)
JP (6) JP5389802B2 (enExample)
KR (3) KR101201577B1 (enExample)
CN (2) CN101772385B (enExample)
CA (1) CA2694355A1 (enExample)
WO (2) WO2009020587A1 (enExample)

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US7837929B2 (en) * 2005-10-20 2010-11-23 H.C. Starck Inc. Methods of making molybdenum titanium sputtering plates and targets
KR101201577B1 (ko) 2007-08-06 2012-11-14 에이치. 씨. 스타아크 아이앤씨 향상된 조직 균일성을 가진 내화 금속판
KR101626286B1 (ko) * 2008-11-03 2016-06-01 토소우 에스엠디, 인크 스퍼터 타겟 제조 방법 및 이에 의해 제조된 스퍼터 타겟
US8449818B2 (en) 2010-06-30 2013-05-28 H. C. Starck, Inc. Molybdenum containing targets
US8449817B2 (en) 2010-06-30 2013-05-28 H.C. Stark, Inc. Molybdenum-containing targets comprising three metal elements
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US9334565B2 (en) 2012-05-09 2016-05-10 H.C. Starck Inc. Multi-block sputtering target with interface portions and associated methods and articles
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JP6602550B2 (ja) 2014-04-28 2019-11-06 株式会社アライドマテリアル スパッタリングターゲット用材料
CN104226565B (zh) * 2014-08-27 2016-04-06 史建平 Uv固化机用压平防撞结构
CN104646416B (zh) * 2015-01-16 2016-08-17 湖南科技大学 一种金属板材强剪切轧制成形方法与装置
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JP6293928B2 (ja) * 2015-05-22 2018-03-14 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
JP6638639B2 (ja) * 2016-12-19 2020-01-29 トヨタ自動車株式会社 差厚金属板の製造方法、プレス部品の製造方法及び加工機
CN106756832B (zh) * 2016-12-27 2019-03-12 宁夏东方钽业股份有限公司 一种靶材的制备方法
US11062889B2 (en) 2017-06-26 2021-07-13 Tosoh Smd, Inc. Method of production of uniform metal plates and sputtering targets made thereby
CN109213086B (zh) * 2017-06-29 2020-10-23 台湾积体电路制造股份有限公司 制程系统与制程方法
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CN115116857B (zh) * 2022-07-01 2024-08-02 江西蓝微电子科技有限公司 一种绝缘覆合金键合丝及其制备方法
TW202513813A (zh) 2023-06-29 2025-04-01 美商萬騰榮公司 用於濺鍍靶材的金屬和金屬合金
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US20090038362A1 (en) 2009-02-12
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