JP5389802B2 - 組織の均一性が改善された高融点金属プレート - Google Patents
組織の均一性が改善された高融点金属プレート Download PDFInfo
- Publication number
- JP5389802B2 JP5389802B2 JP2010519963A JP2010519963A JP5389802B2 JP 5389802 B2 JP5389802 B2 JP 5389802B2 JP 2010519963 A JP2010519963 A JP 2010519963A JP 2010519963 A JP2010519963 A JP 2010519963A JP 5389802 B2 JP5389802 B2 JP 5389802B2
- Authority
- JP
- Japan
- Prior art keywords
- plate
- refractory metal
- metal plate
- less
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
- B21B1/227—Surface roughening or texturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/18—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces by using pressure rollers
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
- C22F1/18—High-melting or refractory metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B2265/00—Forming parameters
- B21B2265/24—Forming parameters asymmetric rolling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B2267/00—Roll parameters
- B21B2267/02—Roll dimensions
- B21B2267/06—Roll diameter
- B21B2267/065—Top and bottom roll have different diameters; Asymmetrical rolling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B2273/00—Path parameters
- B21B2273/02—Vertical deviation, e.g. slack, looper height
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B39/00—Arrangements for moving, supporting, or positioning work, or controlling its movement, combined with or arranged in, or specially adapted for use in connection with, metal-rolling mills
- B21B39/02—Feeding or supporting work; Braking or tensioning arrangements, e.g. threading arrangements
- B21B39/04—Lifting or lowering work for conveying purposes, e.g. tilting tables arranged immediately in front of or behind the pass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12458—All metal or with adjacent metals having composition, density, or hardness gradient
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Metal Rolling (AREA)
- Powder Metallurgy (AREA)
- Forging (AREA)
- Control Of Metal Rolling (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US96361607P | 2007-08-06 | 2007-08-06 | |
| US60/963,616 | 2007-08-06 | ||
| PCT/US2008/009388 WO2009020587A1 (en) | 2007-08-06 | 2008-08-05 | Refractory metal plates with improved uniformity of texture |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013143996A Division JP6085531B2 (ja) | 2007-08-06 | 2013-07-09 | 組織の均一性が改善された高融点金属プレート |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010535943A JP2010535943A (ja) | 2010-11-25 |
| JP5389802B2 true JP5389802B2 (ja) | 2014-01-15 |
Family
ID=40020260
Family Applications (6)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010519963A Active JP5389802B2 (ja) | 2007-08-06 | 2008-08-05 | 組織の均一性が改善された高融点金属プレート |
| JP2010519977A Pending JP2010535633A (ja) | 2007-08-06 | 2008-08-06 | 傾斜圧延法によってプレートおよびシートの組織を制御する方法 |
| JP2013051303A Active JP5766733B2 (ja) | 2007-08-06 | 2013-03-14 | 傾斜圧延法によってプレートおよびシートの組織を制御する方法 |
| JP2013143996A Active JP6085531B2 (ja) | 2007-08-06 | 2013-07-09 | 組織の均一性が改善された高融点金属プレート |
| JP2015122175A Active JP6140771B2 (ja) | 2007-08-06 | 2015-06-17 | 傾斜圧延法によってプレートおよびシートの組織を制御する方法 |
| JP2016020371A Pending JP2016148110A (ja) | 2007-08-06 | 2016-02-05 | 組織の均一性が改善された高融点金属プレート |
Family Applications After (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010519977A Pending JP2010535633A (ja) | 2007-08-06 | 2008-08-06 | 傾斜圧延法によってプレートおよびシートの組織を制御する方法 |
| JP2013051303A Active JP5766733B2 (ja) | 2007-08-06 | 2013-03-14 | 傾斜圧延法によってプレートおよびシートの組織を制御する方法 |
| JP2013143996A Active JP6085531B2 (ja) | 2007-08-06 | 2013-07-09 | 組織の均一性が改善された高融点金属プレート |
| JP2015122175A Active JP6140771B2 (ja) | 2007-08-06 | 2015-06-17 | 傾斜圧延法によってプレートおよびシートの組織を制御する方法 |
| JP2016020371A Pending JP2016148110A (ja) | 2007-08-06 | 2016-02-05 | 組織の均一性が改善された高融点金属プレート |
Country Status (7)
| Country | Link |
|---|---|
| US (5) | US9095885B2 (enExample) |
| EP (3) | EP2185300B1 (enExample) |
| JP (6) | JP5389802B2 (enExample) |
| KR (3) | KR101201577B1 (enExample) |
| CN (2) | CN101772385B (enExample) |
| CA (1) | CA2694355A1 (enExample) |
| WO (2) | WO2009020587A1 (enExample) |
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| US7837929B2 (en) * | 2005-10-20 | 2010-11-23 | H.C. Starck Inc. | Methods of making molybdenum titanium sputtering plates and targets |
| KR101201577B1 (ko) | 2007-08-06 | 2012-11-14 | 에이치. 씨. 스타아크 아이앤씨 | 향상된 조직 균일성을 가진 내화 금속판 |
| KR101626286B1 (ko) * | 2008-11-03 | 2016-06-01 | 토소우 에스엠디, 인크 | 스퍼터 타겟 제조 방법 및 이에 의해 제조된 스퍼터 타겟 |
| US8449818B2 (en) | 2010-06-30 | 2013-05-28 | H. C. Starck, Inc. | Molybdenum containing targets |
| US8449817B2 (en) | 2010-06-30 | 2013-05-28 | H.C. Stark, Inc. | Molybdenum-containing targets comprising three metal elements |
| KR20170016024A (ko) | 2011-05-10 | 2017-02-10 | 에이치. 씨. 스타아크 아이앤씨 | 멀티-블록 스퍼터링 타겟 및 이에 관한 제조방법 및 물품 |
| US9216445B2 (en) | 2011-08-03 | 2015-12-22 | Ut-Battelle, Llc | Method of forming magnesium alloy sheets |
| CN103105776B (zh) * | 2011-11-15 | 2015-03-04 | 宝山钢铁股份有限公司 | 无取向硅钢酸洗剪边控制方法 |
| US9334565B2 (en) | 2012-05-09 | 2016-05-10 | H.C. Starck Inc. | Multi-block sputtering target with interface portions and associated methods and articles |
| CN102719772B (zh) * | 2012-07-04 | 2013-08-07 | 北京科技大学 | 有两表面不同粗糙度和非对称梯度组织的铜材及成形方法 |
| JP2014110276A (ja) | 2012-11-30 | 2014-06-12 | Samsung Display Co Ltd | 有機電界発光素子用正孔輸送材料及びそれを用いた有機電界発光素子 |
| CN104690088A (zh) * | 2013-12-05 | 2015-06-10 | 北京有色金属研究总院 | 一种轧制工艺的模拟实验方法 |
| CN104801541A (zh) * | 2014-01-23 | 2015-07-29 | 大连理工大学 | 一种制备高室温塑性镁合金板材的轧制方法 |
| WO2015146516A1 (ja) * | 2014-03-27 | 2015-10-01 | Jx日鉱日石金属株式会社 | タンタルスパッタリングターゲット及びその製造方法 |
| US10023953B2 (en) | 2014-04-11 | 2018-07-17 | H.C. Starck Inc. | High purity refractory metal powders and their use in sputtering targets which may have random texture |
| JP6602550B2 (ja) | 2014-04-28 | 2019-11-06 | 株式会社アライドマテリアル | スパッタリングターゲット用材料 |
| CN104226565B (zh) * | 2014-08-27 | 2016-04-06 | 史建平 | Uv固化机用压平防撞结构 |
| CN104646416B (zh) * | 2015-01-16 | 2016-08-17 | 湖南科技大学 | 一种金属板材强剪切轧制成形方法与装置 |
| DE102015101580B3 (de) | 2015-02-04 | 2016-06-02 | Hydro Aluminium Rolled Products Gmbh | Verfahren und Vorrichtung zum Prägewalzen eines Bandes |
| EP3211118B1 (en) | 2015-05-22 | 2020-09-09 | JX Nippon Mining & Metals Corporation | Tantalum sputtering target, and production method therefor |
| JP6293928B2 (ja) * | 2015-05-22 | 2018-03-14 | Jx金属株式会社 | タンタルスパッタリングターゲット及びその製造方法 |
| JP6638639B2 (ja) * | 2016-12-19 | 2020-01-29 | トヨタ自動車株式会社 | 差厚金属板の製造方法、プレス部品の製造方法及び加工機 |
| CN106756832B (zh) * | 2016-12-27 | 2019-03-12 | 宁夏东方钽业股份有限公司 | 一种靶材的制备方法 |
| US11062889B2 (en) | 2017-06-26 | 2021-07-13 | Tosoh Smd, Inc. | Method of production of uniform metal plates and sputtering targets made thereby |
| CN109213086B (zh) * | 2017-06-29 | 2020-10-23 | 台湾积体电路制造股份有限公司 | 制程系统与制程方法 |
| CN108465700B (zh) * | 2018-03-13 | 2020-09-08 | 重庆大学 | 一种获得均匀组织和织构的溅射靶材用钽板轧制方法 |
| WO2020018710A1 (en) * | 2018-07-17 | 2020-01-23 | Viaderm Llc | Indwelling hyper-dimensional cardiac physiologic data logging and transmission system and method of doing business |
| CN110586942B (zh) * | 2018-12-17 | 2020-08-14 | 南京中科煜宸激光技术有限公司 | 3d打印制造梯度管材及微观组织调控的方法 |
| CN115116857B (zh) * | 2022-07-01 | 2024-08-02 | 江西蓝微电子科技有限公司 | 一种绝缘覆合金键合丝及其制备方法 |
| TW202513813A (zh) | 2023-06-29 | 2025-04-01 | 美商萬騰榮公司 | 用於濺鍍靶材的金屬和金屬合金 |
| WO2025129000A1 (en) | 2023-12-15 | 2025-06-19 | Materion Corporation | Refractory metal plates |
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