KR101089531B1 - 신규 중합체 - Google Patents

신규 중합체 Download PDF

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Publication number
KR101089531B1
KR101089531B1 KR1020107000778A KR20107000778A KR101089531B1 KR 101089531 B1 KR101089531 B1 KR 101089531B1 KR 1020107000778 A KR1020107000778 A KR 1020107000778A KR 20107000778 A KR20107000778 A KR 20107000778A KR 101089531 B1 KR101089531 B1 KR 101089531B1
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KR
South Korea
Prior art keywords
polymer
monomer
mass
meth
preferable
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KR1020107000778A
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English (en)
Korean (ko)
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KR20100049007A (ko
Inventor
미노루 야마구치
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가부시키가이샤 닛폰 쇼쿠바이
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Publication of KR20100049007A publication Critical patent/KR20100049007A/ko
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Publication of KR101089531B1 publication Critical patent/KR101089531B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C08F222/402—Alkyl substituted imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
KR1020107000778A 2007-07-18 2008-07-17 신규 중합체 KR101089531B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007186577 2007-07-18
JPJP-P-2007-186577 2007-07-18
PCT/JP2008/062903 WO2009011381A1 (ja) 2007-07-18 2008-07-17 新規重合体

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020117016376A Division KR101388818B1 (ko) 2007-07-18 2008-07-17 신규 중합체

Publications (2)

Publication Number Publication Date
KR20100049007A KR20100049007A (ko) 2010-05-11
KR101089531B1 true KR101089531B1 (ko) 2011-12-05

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020107000778A KR101089531B1 (ko) 2007-07-18 2008-07-17 신규 중합체
KR1020117016376A KR101388818B1 (ko) 2007-07-18 2008-07-17 신규 중합체

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020117016376A KR101388818B1 (ko) 2007-07-18 2008-07-17 신규 중합체

Country Status (4)

Country Link
JP (1) JP4296225B2 (ja)
KR (2) KR101089531B1 (ja)
TW (2) TWI542604B (ja)
WO (1) WO2009011381A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5250888B2 (ja) * 2007-07-18 2013-07-31 東友ファインケム株式会社 着色感光性樹脂組成物及びその着色感光性樹脂組成物を用いて得られるカラーフィルタ並びにそのカラーフィルタを備える液晶表示装置
JP5615123B2 (ja) * 2010-10-12 2014-10-29 株式会社日本触媒 重合体およびその用途
JP6166526B2 (ja) * 2011-12-09 2017-07-19 株式会社日本触媒 硬化性樹脂組成物及びその用途
JP2013167786A (ja) * 2012-02-16 2013-08-29 Mitsubishi Chemicals Corp 有機絶縁膜用硬化性樹脂組成物、硬化物、ｔｆｔアクティブマトリックス基板及び液晶表示装置
JP6095416B2 (ja) * 2012-10-08 2017-03-15 株式会社日本触媒 スチレン系ポリマー溶液
CN103848930A (zh) * 2013-12-30 2014-06-11 苏州瑞红电子化学品有限公司 一种含n-苯基马来酰亚胺光敏丙烯酸树脂的合成及其在负性光致抗蚀剂中的应用
TWI627504B (zh) * 2015-08-11 2018-06-21 奇美實業股份有限公司 彩色濾光片用感光性樹脂組成物及其應用
WO2019124144A1 (ja) 2017-12-18 2019-06-27 株式会社日本触媒 重合体、硬化性樹脂組成物、及びその用途

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004224894A (ja) * 2003-01-22 2004-08-12 Nippon Shokubai Co Ltd マレイミド系共重合体

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US5614299A (en) * 1996-02-26 1997-03-25 Kabushiki Kaisha Kobe Seiko Sho Heat-resistant unsaturated polyester resin composition and heat-resistant fiber-reinforced composite material
JP3867177B2 (ja) * 1997-04-30 2007-01-10 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物
TWI250996B (en) * 1999-09-01 2006-03-11 Jsr Corp Curable composition and color filter protective film
JP2003082073A (ja) * 2001-09-11 2003-03-19 Nippon Petrochemicals Co Ltd 環状オレフィン単量体組成物およびその製造方法ならびに環状オレフィン重合体組成物および環状オレフィン重合体水素化組成物
JP4142973B2 (ja) * 2003-03-28 2008-09-03 株式会社日本触媒 硬化性樹脂組成物およびその用途
JP2004300203A (ja) * 2003-03-28 2004-10-28 Nippon Shokubai Co Ltd 酸基含有ポリマー
JP4379073B2 (ja) * 2003-08-26 2009-12-09 パナソニック電工株式会社 人造大理石用樹脂組成物および該組成物を加熱硬化させて得られた人造大理石
JP2005239999A (ja) * 2004-01-27 2005-09-08 Nippon Shokubai Co Ltd 可視光線、近赤外線又はネオン光線吸収層形成用樹脂組成物
JP2006089528A (ja) * 2004-09-21 2006-04-06 Nippon Shokubai Co Ltd Ｌｅｄ封止剤、それを含む発光ダイオードおよび硬化性組成物
JP4852935B2 (ja) * 2005-08-30 2012-01-11 三菱化学株式会社 色材分散液、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP5092326B2 (ja) * 2005-09-26 2012-12-05 三菱化学株式会社 色材分散液、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP5275548B2 (ja) * 2006-03-30 2013-08-28 三菱化学株式会社 緑色顔料分散液、着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2008056867A (ja) * 2006-09-04 2008-03-13 The Inctec Inc 顔料分散液および着色感光性組成物

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004224894A (ja) * 2003-01-22 2004-08-12 Nippon Shokubai Co Ltd マレイミド系共重合体

Also Published As

Publication number Publication date
TWI542604B (zh) 2016-07-21
WO2009011381A1 (ja) 2009-01-22
TW201428012A (zh) 2014-07-16
KR20110099315A (ko) 2011-09-07
TWI458744B (zh) 2014-11-01
KR101388818B1 (ko) 2014-04-23
KR20100049007A (ko) 2010-05-11
TW200914474A (en) 2009-04-01
JP4296225B2 (ja) 2009-07-15
JP2009040999A (ja) 2009-02-26

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