KR101069494B1 - 도포막형성장치 - Google Patents

도포막형성장치 Download PDF

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Publication number
KR101069494B1
KR101069494B1 KR1020050028560A KR20050028560A KR101069494B1 KR 101069494 B1 KR101069494 B1 KR 101069494B1 KR 1020050028560 A KR1020050028560 A KR 1020050028560A KR 20050028560 A KR20050028560 A KR 20050028560A KR 101069494 B1 KR101069494 B1 KR 101069494B1
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KR
South Korea
Prior art keywords
stage
substrate
roller
nozzle
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020050028560A
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English (en)
Korean (ko)
Other versions
KR20060045531A (ko
Inventor
타케오 카에리야마
요시하루 오오타
키요히사 타테야마
미츠히로 사카이
키미오 모토다
히로노부 카지와라
카즈히토 미야자키
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20060045531A publication Critical patent/KR20060045531A/ko
Application granted granted Critical
Publication of KR101069494B1 publication Critical patent/KR101069494B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020050028560A 2004-04-07 2005-04-06 도포막형성장치 Expired - Fee Related KR101069494B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00113023 2004-04-07
JP2004113023 2004-04-07
JP2004273645A JP4386430B2 (ja) 2004-04-07 2004-09-21 塗布膜形成装置
JPJP-P-2004-00273645 2004-09-21

Publications (2)

Publication Number Publication Date
KR20060045531A KR20060045531A (ko) 2006-05-17
KR101069494B1 true KR101069494B1 (ko) 2011-09-30

Family

ID=35469892

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050028560A Expired - Fee Related KR101069494B1 (ko) 2004-04-07 2005-04-06 도포막형성장치

Country Status (3)

Country Link
JP (1) JP4386430B2 (enExample)
KR (1) KR101069494B1 (enExample)
TW (1) TWI260686B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100803147B1 (ko) * 2007-04-04 2008-02-14 세메스 주식회사 도포장치 및 이를 이용한 처리액의 도포 방법
KR100840528B1 (ko) 2007-04-13 2008-06-23 주식회사 케이씨텍 슬릿 코터용 예비토출장치
KR200456618Y1 (ko) * 2007-05-07 2011-11-09 주식회사 케이씨텍 슬릿 코터용 예비토출장치
KR100969347B1 (ko) 2009-09-07 2010-07-09 한국기계연구원 멀티 코터 및 이를 이용한 코팅 방법과 롤 프린팅 방법
KR102061315B1 (ko) * 2011-07-27 2019-12-31 스미도모쥬기가이고교 가부시키가이샤 기판제조장치 및 기판제조방법
JP5912403B2 (ja) * 2011-10-21 2016-04-27 東京エレクトロン株式会社 塗布処理装置
KR101744512B1 (ko) * 2016-02-04 2017-06-20 황중국 양면 코팅장치
CN117184835A (zh) * 2022-05-31 2023-12-08 上海德沪涂膜设备有限公司 涂布设备

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11169769A (ja) * 1997-12-08 1999-06-29 Toray Ind Inc 塗布装置及び塗布方法並びにカラーフィルタの製造装置及び製造方法
JP2001070858A (ja) * 1999-07-07 2001-03-21 Canon Inc 塗料の塗工装置および塗工方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11169769A (ja) * 1997-12-08 1999-06-29 Toray Ind Inc 塗布装置及び塗布方法並びにカラーフィルタの製造装置及び製造方法
JP2001070858A (ja) * 1999-07-07 2001-03-21 Canon Inc 塗料の塗工装置および塗工方法

Also Published As

Publication number Publication date
JP2005322873A (ja) 2005-11-17
TW200537585A (en) 2005-11-16
JP4386430B2 (ja) 2009-12-16
KR20060045531A (ko) 2006-05-17
TWI260686B (en) 2006-08-21

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