KR101037227B1 - 노광 시스템 및 디바이스 제조방법 - Google Patents

노광 시스템 및 디바이스 제조방법 Download PDF

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Publication number
KR101037227B1
KR101037227B1 KR1020080050548A KR20080050548A KR101037227B1 KR 101037227 B1 KR101037227 B1 KR 101037227B1 KR 1020080050548 A KR1020080050548 A KR 1020080050548A KR 20080050548 A KR20080050548 A KR 20080050548A KR 101037227 B1 KR101037227 B1 KR 101037227B1
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KR
South Korea
Prior art keywords
temperature
fluid
exposure apparatus
control
adjusting means
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Expired - Fee Related
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KR1020080050548A
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English (en)
Korean (ko)
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KR20080106074A (ko
Inventor
요시유키 오카다
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20080106074A publication Critical patent/KR20080106074A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

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  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020080050548A 2007-05-31 2008-05-30 노광 시스템 및 디바이스 제조방법 Expired - Fee Related KR101037227B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007146347A JP5207663B2 (ja) 2007-05-31 2007-05-31 露光システムおよびデバイス製造方法
JPJP-P-2007-00146347 2007-05-31

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020110014567A Division KR20110036022A (ko) 2007-05-31 2011-02-18 노광 시스템 및 디바이스 제조방법

Publications (2)

Publication Number Publication Date
KR20080106074A KR20080106074A (ko) 2008-12-04
KR101037227B1 true KR101037227B1 (ko) 2011-05-25

Family

ID=40173899

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020080050548A Expired - Fee Related KR101037227B1 (ko) 2007-05-31 2008-05-30 노광 시스템 및 디바이스 제조방법
KR1020110014567A Ceased KR20110036022A (ko) 2007-05-31 2011-02-18 노광 시스템 및 디바이스 제조방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020110014567A Ceased KR20110036022A (ko) 2007-05-31 2011-02-18 노광 시스템 및 디바이스 제조방법

Country Status (4)

Country Link
US (1) US7760325B2 (https=)
JP (1) JP5207663B2 (https=)
KR (2) KR101037227B1 (https=)
TW (1) TWI399619B (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101581673B1 (ko) * 2008-02-05 2015-12-31 어플라이드 머티어리얼스, 인코포레이티드 제조 프로세스들로부터의 가연성 폐기물 가스들을 처리하기 위한 시스템 및 방법
WO2009100163A1 (en) * 2008-02-05 2009-08-13 Applied Materials, Inc. Methods and apparatus for operating an electronic device manufacturing system
JP2010182834A (ja) * 2009-02-04 2010-08-19 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP5641709B2 (ja) * 2009-04-23 2014-12-17 キヤノン株式会社 デバイス製造装置およびデバイス製造方法
US9075408B2 (en) * 2009-11-16 2015-07-07 Applied Materials, Inc. Energy savings and global gas emissions monitoring and display
US9207270B2 (en) * 2012-08-31 2015-12-08 Elwha Llc Method and apparatus for measuring negawatt usage of an appliance
KR102247922B1 (ko) * 2019-04-29 2021-05-04 강용훈 경화장치 냉각 시스템
JP7541841B2 (ja) * 2020-03-18 2024-08-29 株式会社Kelk 温度制御システム
JP7807939B2 (ja) * 2022-02-25 2026-01-28 キヤノン株式会社 冷凍装置、リソグラフィ装置、物品製造方法、ならびに、冷凍装置の制御装置および制御方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005142382A (ja) * 2003-11-07 2005-06-02 Canon Inc 露光装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61160934A (ja) * 1985-01-10 1986-07-21 Canon Inc 投影光学装置
WO1999012194A1 (en) 1997-08-29 1999-03-11 Nikon Corporation Temperature adjusting method and aligner to which this method is applied
JPH11135429A (ja) 1997-08-29 1999-05-21 Nikon Corp 温度制御方法及び該方法を使用する露光装置
JP2001244179A (ja) * 2000-02-29 2001-09-07 Canon Inc 温度調節装置を備えた露光装置およびデバイス製造方法
JP2002158170A (ja) * 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
JP3709338B2 (ja) 2000-11-22 2005-10-26 日本電気株式会社 携帯電話のユーザー設定情報管理方法とユーザー設定情報管理システム
JP2003067058A (ja) * 2001-08-30 2003-03-07 Canon Inc 温度調節装置、およびこれを有するデバイス製造装置
JP2003115440A (ja) * 2001-10-03 2003-04-18 Canon Inc 温度調節装置および非干渉化温調制御装置並びにこれらの装置を備えた露光装置
JP2003133211A (ja) * 2001-10-26 2003-05-09 Canon Inc デバイス製造装置およびその温調制御方法
JP2004128213A (ja) * 2002-10-02 2004-04-22 Canon Inc 温調システム及びそれを組み込んだ露光装置
JP2006005135A (ja) * 2004-06-17 2006-01-05 Canon Inc 温度調節装置およびデバイス製造装置
JP2006041251A (ja) * 2004-07-28 2006-02-09 Canon Inc 露光装置
JP4418724B2 (ja) * 2004-09-17 2010-02-24 キヤノン株式会社 露光装置
JP2006222165A (ja) * 2005-02-08 2006-08-24 Canon Inc 露光装置
JP4835970B2 (ja) * 2005-05-24 2011-12-14 株式会社ニコン 調整方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005142382A (ja) * 2003-11-07 2005-06-02 Canon Inc 露光装置

Also Published As

Publication number Publication date
KR20080106074A (ko) 2008-12-04
TWI399619B (zh) 2013-06-21
JP5207663B2 (ja) 2013-06-12
US20090011376A1 (en) 2009-01-08
JP2008300702A (ja) 2008-12-11
US7760325B2 (en) 2010-07-20
KR20110036022A (ko) 2011-04-06
TW200912554A (en) 2009-03-16

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