KR101009327B1 - 반도체 공정 환경에서 사용되는 접합 구조체 - Google Patents
반도체 공정 환경에서 사용되는 접합 구조체 Download PDFInfo
- Publication number
- KR101009327B1 KR101009327B1 KR1020057002722A KR20057002722A KR101009327B1 KR 101009327 B1 KR101009327 B1 KR 101009327B1 KR 1020057002722 A KR1020057002722 A KR 1020057002722A KR 20057002722 A KR20057002722 A KR 20057002722A KR 101009327 B1 KR101009327 B1 KR 101009327B1
- Authority
- KR
- South Korea
- Prior art keywords
- plate
- outer end
- head portion
- inner edge
- arm portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims description 26
- 239000000463 material Substances 0.000 claims abstract description 34
- 239000010453 quartz Substances 0.000 claims abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 230000008018 melting Effects 0.000 claims description 7
- 238000002844 melting Methods 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 claims description 5
- 229910010293 ceramic material Inorganic materials 0.000 claims description 4
- 238000005304 joining Methods 0.000 claims description 4
- 230000007423 decrease Effects 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 claims description 2
- 238000004891 communication Methods 0.000 claims 1
- 230000003247 decreasing effect Effects 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 239000012636 effector Substances 0.000 abstract description 42
- 235000012431 wafers Nutrition 0.000 description 16
- 239000007789 gas Substances 0.000 description 12
- 238000005452 bending Methods 0.000 description 8
- 238000004806 packaging method and process Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/07—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers Not used, see H01L21/677
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/225,545 US6929299B2 (en) | 2002-08-20 | 2002-08-20 | Bonded structures for use in semiconductor processing environments |
| US10/225,545 | 2002-08-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20050058341A KR20050058341A (ko) | 2005-06-16 |
| KR101009327B1 true KR101009327B1 (ko) | 2011-01-18 |
Family
ID=31946304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020057002722A Expired - Lifetime KR101009327B1 (ko) | 2002-08-20 | 2003-07-24 | 반도체 공정 환경에서 사용되는 접합 구조체 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6929299B2 (enExample) |
| JP (1) | JP4575773B2 (enExample) |
| KR (1) | KR101009327B1 (enExample) |
| WO (1) | WO2004019375A2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4302557B2 (ja) * | 2004-03-15 | 2009-07-29 | 大日本スクリーン製造株式会社 | 熱処理装置および基板処理装置 |
| US20080129064A1 (en) * | 2006-12-01 | 2008-06-05 | Asm America, Inc. | Bernoulli wand |
| JP2010278408A (ja) * | 2009-04-30 | 2010-12-09 | Fluoro Mechanic Kk | ベルヌーイチャック |
| US20110148128A1 (en) * | 2009-12-23 | 2011-06-23 | Memc Electronic Materials, Inc. | Semiconductor Wafer Transport System |
| JP6496919B2 (ja) * | 2013-02-05 | 2019-04-10 | サムコ株式会社 | ベルヌーイハンド及び半導体製造装置 |
| US20150290815A1 (en) * | 2014-04-11 | 2015-10-15 | Varian Semiconductor Equipment Associates, Inc. | Planar end effector and method of making a planar end effector |
| JP6128050B2 (ja) * | 2014-04-25 | 2017-05-17 | トヨタ自動車株式会社 | 非接触型搬送ハンド |
| US10515834B2 (en) * | 2015-10-12 | 2019-12-24 | Lam Research Corporation | Multi-station tool with wafer transfer microclimate systems |
| US10566230B2 (en) * | 2016-04-01 | 2020-02-18 | Sunpower Corporation | Gripper for semiconductor devices |
| CN108346607B (zh) * | 2017-01-25 | 2020-11-03 | 上海新昇半导体科技有限公司 | 竖直插入式阻挡脚及伯努利吸盘 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6183183B1 (en) * | 1997-01-16 | 2001-02-06 | Asm America, Inc. | Dual arm linear hand-off wafer transfer assembly |
| US6499777B1 (en) * | 1999-05-11 | 2002-12-31 | Matrix Integrated Systems, Inc. | End-effector with integrated cooling mechanism |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US821847A (en) * | 1905-12-27 | 1906-05-29 | Luis Arnavat | Shovel. |
| US1211655A (en) * | 1916-05-23 | 1917-01-09 | Joseph W Adams | Root-cutter. |
| US4911743A (en) | 1986-05-29 | 1990-03-27 | Hughes Aircraft Company | Glass structure strengthening by etching |
| US5080549A (en) * | 1987-05-11 | 1992-01-14 | Epsilon Technology, Inc. | Wafer handling system with Bernoulli pick-up |
| US5746460A (en) | 1995-12-08 | 1998-05-05 | Applied Materials, Inc. | End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector |
| US6116848A (en) | 1997-11-26 | 2000-09-12 | Brooks Automation, Inc. | Apparatus and method for high-speed transfer and centering of wafer substrates |
| JPH11180554A (ja) * | 1997-12-22 | 1999-07-06 | Canon Inc | 基板搬送用ハンド及び基板搬送装置 |
| JP3807074B2 (ja) * | 1998-01-27 | 2006-08-09 | 石川島播磨重工業株式会社 | Cfrp補強長尺構造物 |
| US6260894B1 (en) * | 1999-05-28 | 2001-07-17 | Applied Materials, Inc. | Assembly for wafer handling system |
| JP4189093B2 (ja) * | 1999-08-31 | 2008-12-03 | 京セラ株式会社 | セラミック製搬送アーム及びその製造方法 |
| US6244641B1 (en) * | 1999-12-02 | 2001-06-12 | M.E.C. Technology, Inc. | Wafer transfer arm |
| CA2493963C (en) * | 2002-07-29 | 2011-07-05 | E.I. Du Pont De Nemours And Company | Carbon fiber composite transfer member with reflective surfaces |
-
2002
- 2002-08-20 US US10/225,545 patent/US6929299B2/en not_active Expired - Lifetime
-
2003
- 2003-07-24 KR KR1020057002722A patent/KR101009327B1/ko not_active Expired - Lifetime
- 2003-07-24 JP JP2004530845A patent/JP4575773B2/ja not_active Expired - Lifetime
- 2003-07-24 WO PCT/US2003/023186 patent/WO2004019375A2/en not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6183183B1 (en) * | 1997-01-16 | 2001-02-06 | Asm America, Inc. | Dual arm linear hand-off wafer transfer assembly |
| US6499777B1 (en) * | 1999-05-11 | 2002-12-31 | Matrix Integrated Systems, Inc. | End-effector with integrated cooling mechanism |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20050058341A (ko) | 2005-06-16 |
| WO2004019375A2 (en) | 2004-03-04 |
| JP2005536889A (ja) | 2005-12-02 |
| JP4575773B2 (ja) | 2010-11-04 |
| US20050088003A1 (en) | 2005-04-28 |
| US6929299B2 (en) | 2005-08-16 |
| WO2004019375A3 (en) | 2004-04-22 |
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| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20050217 Patent event code: PA01051R01D Comment text: International Patent Application |
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| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20080722 Comment text: Request for Examination of Application |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20100809 Patent event code: PE09021S01D |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20101210 |
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| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20110112 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
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