KR100974112B1 - 액체 토출 헤드 및 그의 제조 방법 - Google Patents

액체 토출 헤드 및 그의 제조 방법 Download PDF

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Publication number
KR100974112B1
KR100974112B1 KR1020070126838A KR20070126838A KR100974112B1 KR 100974112 B1 KR100974112 B1 KR 100974112B1 KR 1020070126838 A KR1020070126838 A KR 1020070126838A KR 20070126838 A KR20070126838 A KR 20070126838A KR 100974112 B1 KR100974112 B1 KR 100974112B1
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South Korea
Prior art keywords
discharge
liquid
substrate
photosensitive resin
discharge portion
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Expired - Fee Related
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KR1020070126838A
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English (en)
Korean (ko)
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KR20080059043A (ko
Inventor
쇼지 시바
아끼히꼬 오까노
요시까즈 사이또
가즈히로 아사이
다마끼 사또
다꾸미 스즈끼
마사히꼬 구보따
마끼 가또
히로에 이시꾸라
신스께 츠지
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20080059043A publication Critical patent/KR20080059043A/ko
Application granted granted Critical
Publication of KR100974112B1 publication Critical patent/KR100974112B1/ko
Expired - Fee Related legal-status Critical Current
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/162Manufacturing of the nozzle plates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14016Structure of bubble jet print heads
    • B41J2/14032Structure of the pressure chamber
    • B41J2/1404Geometrical characteristics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1629Manufacturing processes etching wet etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1645Manufacturing processes thin film formation thin film formation by spincoating
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14475Structure thereof only for on-demand ink jet heads characterised by nozzle shapes or number of orifices per chamber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01Embodiments of or processes related to ink-jet heads
    • B41J2202/11Embodiments of or processes related to ink-jet heads characterised by specific geometrical characteristics

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
KR1020070126838A 2006-12-22 2007-12-07 액체 토출 헤드 및 그의 제조 방법 Expired - Fee Related KR100974112B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2006-00346266 2006-12-22
JP2006346266 2006-12-22

Publications (2)

Publication Number Publication Date
KR20080059043A KR20080059043A (ko) 2008-06-26
KR100974112B1 true KR100974112B1 (ko) 2010-08-04

Family

ID=39565441

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KR1020070126838A Expired - Fee Related KR100974112B1 (ko) 2006-12-22 2007-12-07 액체 토출 헤드 및 그의 제조 방법

Country Status (5)

Country Link
US (1) US7971964B2 (https=)
JP (1) JP5230189B2 (https=)
KR (1) KR100974112B1 (https=)
CN (1) CN101204880B (https=)
TW (1) TWI335273B (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5506600B2 (ja) * 2010-08-25 2014-05-28 キヤノン株式会社 液体吐出ヘッドの製造方法
JP5065464B2 (ja) * 2010-09-29 2012-10-31 キヤノン株式会社 液体吐出ヘッドおよび液体吐出ヘッドの製造方法
US8652767B2 (en) * 2011-02-28 2014-02-18 Canon Kabushiki Kaisha Liquid ejection head and process for producing the same
CN103252997B (zh) * 2012-02-16 2015-12-16 珠海纳思达珠海赛纳打印科技股份有限公司 一种液体喷头及其制造方法
JP6008556B2 (ja) * 2012-04-25 2016-10-19 キヤノン株式会社 液体吐出ヘッドの製造方法及び露光方法
JP6071560B2 (ja) 2013-01-07 2017-02-01 キヤノン株式会社 液体吐出ヘッドの製造方法
JP6071565B2 (ja) * 2013-01-11 2017-02-01 キヤノン株式会社 液体吐出ヘッドの製造方法
JP6180143B2 (ja) * 2013-03-22 2017-08-16 キヤノン株式会社 液体吐出ヘッドの製造方法
JP6193715B2 (ja) * 2013-10-08 2017-09-06 キヤノン株式会社 液体吐出ヘッド
JP6341799B2 (ja) * 2014-08-19 2018-06-13 キヤノン株式会社 液体吐出ヘッドの製造方法
JP6632225B2 (ja) * 2015-06-05 2020-01-22 キヤノン株式会社 吐出口面の撥水処理方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100585903B1 (ko) 2002-07-10 2006-06-07 캐논 가부시끼가이샤 미세 구조체의 제조 방법, 액체 토출 헤드의 제조 방법 및액체 토출 헤드
KR20060132493A (ko) * 2005-06-17 2006-12-21 캐논 가부시끼가이샤 액체 토출 헤드 제조 방법, 액체 토출 헤드, 및 액체 토출기록 장치

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0645242B2 (ja) * 1984-12-28 1994-06-15 キヤノン株式会社 液体噴射記録ヘツドの製造方法
JP3674885B2 (ja) * 1996-08-07 2005-07-27 コニカミノルタホールディングス株式会社 インクジェット記録ヘッド
US6379571B1 (en) * 1998-06-11 2002-04-30 Canon Kabushiki Kaisha Etching method for processing substrate, dry etching method for polyetheramide resin layer, production method of ink-jet printing head, ink-jet head and ink-jet printing apparatus
JP3957920B2 (ja) 1998-06-11 2007-08-15 キヤノン株式会社 インクジェットヘッドの製造方法
JP2001179979A (ja) * 1999-12-22 2001-07-03 Canon Inc 液体噴射記録ヘッド及びその製造方法
JP3751227B2 (ja) * 2001-07-02 2006-03-01 ニックス株式会社 金型装置
JP3862624B2 (ja) * 2002-07-10 2006-12-27 キヤノン株式会社 液体吐出ヘッドおよび、該ヘッドの製造方法
JP4761498B2 (ja) * 2004-06-28 2011-08-31 キヤノン株式会社 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法
WO2006001534A2 (en) * 2004-06-28 2006-01-05 Canon Kabushiki Kaisha Method for manufacturing minute structure, method for manufacturing liquid discharge head, and liquid discharge head
CN100590524C (zh) * 2004-09-30 2010-02-17 三菱制纸株式会社 用于制版掩膜的喷墨记录用片材及制造苯胺印刷版的方法
KR100612027B1 (ko) * 2005-05-12 2006-08-11 삼성전자주식회사 가교 폴리머를 이용한 잉크젯 프린트헤드의 제조방법
JP2006315310A (ja) * 2005-05-13 2006-11-24 Sony Corp 液体吐出ヘッドの製造方法、液体吐出ヘッド及び液体吐出装置
KR100717023B1 (ko) * 2005-08-27 2007-05-10 삼성전자주식회사 잉크젯 프린트헤드 및 그 제조방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100585903B1 (ko) 2002-07-10 2006-06-07 캐논 가부시끼가이샤 미세 구조체의 제조 방법, 액체 토출 헤드의 제조 방법 및액체 토출 헤드
KR20060132493A (ko) * 2005-06-17 2006-12-21 캐논 가부시끼가이샤 액체 토출 헤드 제조 방법, 액체 토출 헤드, 및 액체 토출기록 장치

Also Published As

Publication number Publication date
TWI335273B (en) 2011-01-01
JP2008173970A (ja) 2008-07-31
TW200914280A (en) 2009-04-01
US7971964B2 (en) 2011-07-05
US20080252689A1 (en) 2008-10-16
CN101204880B (zh) 2012-04-04
JP5230189B2 (ja) 2013-07-10
CN101204880A (zh) 2008-06-25
KR20080059043A (ko) 2008-06-26

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