KR100970357B1 - 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법 - Google Patents

네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법 Download PDF

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KR100970357B1
KR100970357B1 KR1020057009394A KR20057009394A KR100970357B1 KR 100970357 B1 KR100970357 B1 KR 100970357B1 KR 1020057009394 A KR1020057009394 A KR 1020057009394A KR 20057009394 A KR20057009394 A KR 20057009394A KR 100970357 B1 KR100970357 B1 KR 100970357B1
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South Korea
Prior art keywords
group
ring
photosensitive composition
violet laser
image forming
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Expired - Lifetime
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Korean (ko)
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KR20060065576A (ko
Inventor
준지 미즈카미
야스히로 가메야마
에리코 도시미츠
유지 미즈호
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니뽄 고오세이가가꾸 고오교오 가부시끼가이샤
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Publication of KR20060065576A publication Critical patent/KR20060065576A/ko
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Assigned to 닛코-매터리얼즈 가부시키가이샤 reassignment 닛코-매터리얼즈 가부시키가이샤 권리의 전부이전등록 Assignors: 니뽄 고오세이가가꾸 고오교오 가부시끼가이샤
Assigned to 초우코우 매터리얼즈 가부시키가이샤 reassignment 초우코우 매터리얼즈 가부시키가이샤 권리의 전부이전등록 Assignors: 닛코-매터리얼즈 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
KR1020057009394A 2003-09-25 2004-09-22 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법 Expired - Lifetime KR100970357B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003332626 2003-09-25
JPJP-P-2003-00332626 2003-09-25
JP2003344636 2003-10-02
JPJP-P-2003-00344636 2003-10-02

Related Child Applications (1)

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KR1020077028436A Division KR100998459B1 (ko) 2003-09-25 2004-09-22 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법

Publications (2)

Publication Number Publication Date
KR20060065576A KR20060065576A (ko) 2006-06-14
KR100970357B1 true KR100970357B1 (ko) 2010-07-16

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KR1020057009394A Expired - Lifetime KR100970357B1 (ko) 2003-09-25 2004-09-22 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법
KR1020077028436A Expired - Lifetime KR100998459B1 (ko) 2003-09-25 2004-09-22 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법

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KR (2) KR100970357B1 (https=)
TW (2) TW200821754A (https=)
WO (1) WO2005031463A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1950750B (zh) * 2004-05-12 2012-10-24 旭化成电子材料株式会社 图案形成材料、图案形成设备和图案形成方法
JP2006308983A (ja) * 2005-04-28 2006-11-09 Fuji Photo Film Co Ltd パターン形成方法
JP5013831B2 (ja) * 2006-06-23 2012-08-29 富士フイルム株式会社 カラーフィルタ用硬化性組成物、カラーフィルタ、及びその製造方法
TWI437280B (zh) * 2006-06-23 2014-05-11 Fujifilm Corp 化合物、感光性組成物、硬化性組成物、彩色濾光片用硬化性組成物、彩色濾光片及其製法
CN103792788A (zh) * 2008-04-28 2014-05-14 日立化成工业株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法及印刷电路板的制造方法
CN102395924B (zh) * 2009-04-30 2013-11-06 日立化成株式会社 感光性树脂组合物、使用其的感光性元件、抗蚀图形的形成方法和印刷线路板的制造方法
TWI491982B (zh) * 2009-10-28 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
CN105001081B (zh) * 2015-06-24 2017-03-01 常州强力电子新材料股份有限公司 一种蒽系增感剂及其在uv‑led光固化体系中的应用
CN112835268B (zh) * 2020-12-30 2022-12-30 烟台魔技纳米科技有限公司 一种生物基水溶性负性光刻胶及其在飞秒激光直写加工方法中的应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003140358A (ja) * 2001-11-01 2003-05-14 Fuji Photo Film Co Ltd 感光性平版印刷版の製版方法
JP2003221517A (ja) * 2002-01-30 2003-08-08 Fuji Photo Film Co Ltd 増感色素の製造方法及びそれを用いた感光性組成物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0990619A (ja) * 1995-09-20 1997-04-04 Brother Ind Ltd 光硬化型組成物及び感光性カプセル
JP4685259B2 (ja) * 2000-04-19 2011-05-18 コダック株式会社 感光性平版印刷版及び印刷版の製版方法
JP3832248B2 (ja) * 2001-01-26 2006-10-11 三菱化学株式会社 光重合性組成物及びカラーフィルター
JP2002287380A (ja) * 2001-03-26 2002-10-03 Mitsubishi Chemicals Corp 画像形成方法
JP4221467B2 (ja) * 2001-04-20 2009-02-12 デュポン エムアールシー ドライフィルム株式会社 レジスト用光重合性樹脂組成物
KR20050047088A (ko) * 2002-08-07 2005-05-19 미쓰비시 가가꾸 가부시키가이샤 청자색 레이저 감광성 레지스트재층을 갖는 화상 형성재및 그 레지스트 화상 형성 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003140358A (ja) * 2001-11-01 2003-05-14 Fuji Photo Film Co Ltd 感光性平版印刷版の製版方法
JP2003221517A (ja) * 2002-01-30 2003-08-08 Fuji Photo Film Co Ltd 増感色素の製造方法及びそれを用いた感光性組成物

Also Published As

Publication number Publication date
TW200521624A (en) 2005-07-01
WO2005031463A1 (ja) 2005-04-07
KR20060065576A (ko) 2006-06-14
KR20070119098A (ko) 2007-12-18
TW200821754A (en) 2008-05-16
KR100998459B1 (ko) 2010-12-06
TWI354864B (https=) 2011-12-21

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