KR100955018B1 - 유기 무기 하이브리드 재료 및 나노임프린트 기술을 이용한미세 구조체의 제조 방법 및 이 방법으로부터 제조된 미세구조체 - Google Patents

유기 무기 하이브리드 재료 및 나노임프린트 기술을 이용한미세 구조체의 제조 방법 및 이 방법으로부터 제조된 미세구조체 Download PDF

Info

Publication number
KR100955018B1
KR100955018B1 KR1020050123018A KR20050123018A KR100955018B1 KR 100955018 B1 KR100955018 B1 KR 100955018B1 KR 1020050123018 A KR1020050123018 A KR 1020050123018A KR 20050123018 A KR20050123018 A KR 20050123018A KR 100955018 B1 KR100955018 B1 KR 100955018B1
Authority
KR
South Korea
Prior art keywords
organic
inorganic hybrid
hybrid material
transparent substrate
delete delete
Prior art date
Application number
KR1020050123018A
Other languages
English (en)
Korean (ko)
Other versions
KR20060067875A (ko
Inventor
츠토무 모리모토
노부히토 미우라
나가노리 츠츠이
가즈히코 후지이
겐지 고자키
용춘 루오
나오미 나가이
Original Assignee
가부시키가이샤 가네카
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 가네카 filed Critical 가부시키가이샤 가네카
Publication of KR20060067875A publication Critical patent/KR20060067875A/ko
Application granted granted Critical
Publication of KR100955018B1 publication Critical patent/KR100955018B1/ko

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00Subject matter not provided for in other groups of this subclass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0009Forming specific nanostructures
    • B82B3/0038Manufacturing processes for forming specific nanostructures not provided for in groups B82B3/0014 - B82B3/0033
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V3/00Globes; Bowls; Cover glasses
    • F21V3/04Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Micromachines (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
KR1020050123018A 2004-12-15 2005-12-14 유기 무기 하이브리드 재료 및 나노임프린트 기술을 이용한미세 구조체의 제조 방법 및 이 방법으로부터 제조된 미세구조체 KR100955018B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004362858A JP2006168147A (ja) 2004-12-15 2004-12-15 有機無機ハイブリッド材料とナノインプリント技術を用いた微細構造体の製造方法および微細構造体
JPJP-P-2004-00362858 2004-12-15

Publications (2)

Publication Number Publication Date
KR20060067875A KR20060067875A (ko) 2006-06-20
KR100955018B1 true KR100955018B1 (ko) 2010-04-27

Family

ID=36669397

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050123018A KR100955018B1 (ko) 2004-12-15 2005-12-14 유기 무기 하이브리드 재료 및 나노임프린트 기술을 이용한미세 구조체의 제조 방법 및 이 방법으로부터 제조된 미세구조체

Country Status (5)

Country Link
JP (1) JP2006168147A (zh)
KR (1) KR100955018B1 (zh)
CN (1) CN100557467C (zh)
HK (1) HK1091905A1 (zh)
TW (1) TW200633845A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101302350B1 (ko) * 2012-02-10 2013-08-30 노바테크인더스트리 주식회사 광 추출용 투명기판의 제조방법

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8318253B2 (en) 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
JP5189772B2 (ja) * 2007-02-09 2013-04-24 昭和電工株式会社 微細パターン転写材料
JP5261817B2 (ja) * 2008-08-30 2013-08-14 国立大学法人長岡技術科学大学 表面に微細凹凸パターンを有したセラミックス焼成体及びその製造方法
JP2010069730A (ja) * 2008-09-18 2010-04-02 Osaka Univ ナノインプリントリソグラフィー用の高耐久性レプリカモールドおよびその作製方法
JP2010129507A (ja) * 2008-12-01 2010-06-10 Asahi Kasei Corp 照明器具
SG168513A1 (en) * 2009-08-04 2011-02-28 Agency Science Tech & Res A method of reducing the dimension of an imprint structure on a substrate
KR100974288B1 (ko) * 2010-01-13 2010-08-05 한국기계연구원 나노임프린트를 이용한 금속 산화박막 패턴 형성방법 및 이를 이용한 led 소자의 제조방법
KR20140031514A (ko) * 2012-09-03 2014-03-13 포항공과대학교 산학협력단 굴절률 조절층을 포함하는 발광 다이오드 및 그 제조 방법
CN104101923B (zh) * 2014-07-08 2016-05-18 淮安信息职业技术学院 具有随机微米/纳米混合结构的光扩散片的制备方法
CN105487151A (zh) * 2016-01-22 2016-04-13 武汉理工大学 一种基于纳米压印的图形转移制备光栅的方法
TWI610804B (zh) * 2016-05-23 2018-01-11 國立成功大學 節能玻璃及其製造方法
CN110546734B (zh) * 2017-03-08 2024-04-02 佳能株式会社 固化物图案的制造方法和光学部件、电路板和石英模具复制品的制造方法以及用于压印预处理的涂覆材料及其固化物
CN108339885B (zh) * 2018-01-16 2019-06-11 杭州电子科技大学 拉刀后刀面微纳表面形貌单点增量压印方法及其装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000061859A (ko) * 1999-03-31 2000-10-25 김충섭 광학 코팅용 혼성 조성물 및 그것을 함유한 광변색 박막용 조성물
JP2005290286A (ja) 2004-04-02 2005-10-20 Asahi Kasei Chemicals Corp 透明ハイブリッドシート

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3381945B2 (ja) * 1992-10-05 2003-03-04 日本板硝子株式会社 基板上に微細な凹凸パターンを形成する方法
JP2001100026A (ja) * 1999-09-30 2001-04-13 Minolta Co Ltd 液晶光学デバイス及び液晶偏光デバイス
JP4208447B2 (ja) * 2001-09-26 2009-01-14 独立行政法人科学技術振興機構 Sogを用いた室温ナノ−インプリント−リソグラフィー
JP4090374B2 (ja) * 2003-03-20 2008-05-28 株式会社日立製作所 ナノプリント装置、及び微細構造転写方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000061859A (ko) * 1999-03-31 2000-10-25 김충섭 광학 코팅용 혼성 조성물 및 그것을 함유한 광변색 박막용 조성물
JP2005290286A (ja) 2004-04-02 2005-10-20 Asahi Kasei Chemicals Corp 透明ハイブリッドシート

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101302350B1 (ko) * 2012-02-10 2013-08-30 노바테크인더스트리 주식회사 광 추출용 투명기판의 제조방법

Also Published As

Publication number Publication date
CN100557467C (zh) 2009-11-04
JP2006168147A (ja) 2006-06-29
HK1091905A1 (en) 2007-01-26
CN1790064A (zh) 2006-06-21
TW200633845A (en) 2006-10-01
KR20060067875A (ko) 2006-06-20

Similar Documents

Publication Publication Date Title
KR100955018B1 (ko) 유기 무기 하이브리드 재료 및 나노임프린트 기술을 이용한미세 구조체의 제조 방법 및 이 방법으로부터 제조된 미세구조체
KR102079537B1 (ko) 유리-세라믹 제품 및 제조 방법
KR102127748B1 (ko) 구조화된 라미네이션 전사 필름 및 방법
KR20100016245A (ko) 졸-겔층을 갖는 제품의 표면구조화 방법 및 구조화된 졸-겔층을 갖는 제품
CN101479031B (zh) 单粒子膜蚀刻掩模及其制造方法、使用该单粒子膜蚀刻掩模的微细结构体的制造方法及通过该制造方法得到的微细结构体
JP2006168147A5 (zh)
Verschuuren et al. 3D photonic structures by sol-gel imprint lithography
JP2013517196A (ja) 複合材料及びその生産方法
DE102010044133B4 (de) Ätzverfahren zur Oberflächenstrukturierung und Ätzmaske
US20150217532A1 (en) Method of manufacturing a laminate provided with a concave-convex structure and transfer film
US6847773B2 (en) Optical waveguide and method for manufacturing the same
WO2013191089A1 (ja) 反射防止フィルムの製造方法
WO2001019587A1 (fr) Procede de production d'un article ayant une forme de surface predefinie et element pour guide d'onde optique
CN101213084A (zh) 用于提供带有装饰的器具的方法
US6721485B1 (en) Echelon diffraction grating and optical waveguide element
TWI536036B (zh) 光學膜的製備方法
WO2003086958A3 (de) Verfahren zur herstellung eines erzeugnisses mit einer strukturierten oberfläche
Gvishi et al. UV-curable glassy material for the manufacture of bulk and nano-structured elements
KR101299359B1 (ko) 광추출 효율이 향상된 2차원 광결정 구조체 및 이의 제조방법
JP2012144395A (ja) 多孔質膜の製造方法
KR20200133098A (ko) 세포 배양 용기, 이의 제조 방법 및 이의 사용 방법
JP2005053006A (ja) 微小成形体の製造方法
EP1364812A1 (en) Manufacturing a decorative article comprising a laminar substrate with a resin coating
JP2000187125A (ja) 光導波路
JP2002240057A (ja) 複合光学素子の製造方法

Legal Events

Date Code Title Description
A201 Request for examination
N231 Notification of change of applicant
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20130404

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20140401

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20160318

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20170317

Year of fee payment: 8