HK1091905A1 - A manufacturing method of the microstructure body using a nanoimprint technology with a organic/inorganic hybrid material, and a microstructure body manufactured by this method - Google Patents

A manufacturing method of the microstructure body using a nanoimprint technology with a organic/inorganic hybrid material, and a microstructure body manufactured by this method

Info

Publication number
HK1091905A1
HK1091905A1 HK06113604.5A HK06113604A HK1091905A1 HK 1091905 A1 HK1091905 A1 HK 1091905A1 HK 06113604 A HK06113604 A HK 06113604A HK 1091905 A1 HK1091905 A1 HK 1091905A1
Authority
HK
Hong Kong
Prior art keywords
microstructure body
organic
manufacturing
inorganic hybrid
hybrid material
Prior art date
Application number
HK06113604.5A
Inventor
Tsutomu Morimoto
Nobuhito Miura
Naganori Tsutsui
Kazuhiko Fujii
Kenji Kozaki
Yongchun Luo
Naomi Nagai
Original Assignee
Kaneka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaneka Corp filed Critical Kaneka Corp
Publication of HK1091905A1 publication Critical patent/HK1091905A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0009—Forming specific nanostructures
    • B82B3/0038—Manufacturing processes for forming specific nanostructures not provided for in groups B82B3/0014 - B82B3/0033
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V3/00—Globes; Bowls; Cover glasses
    • F21V3/04—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Micromachines (AREA)
  • Surface Treatment Of Glass (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
HK06113604.5A 2004-12-15 2006-12-12 A manufacturing method of the microstructure body using a nanoimprint technology with a organic/inorganic hybrid material, and a microstructure body manufactured by this method HK1091905A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004362858A JP2006168147A (en) 2004-12-15 2004-12-15 Manufacturing method of fine structure using organic/inorganic hybrid material and nano-imprinting technique and fine structure

Publications (1)

Publication Number Publication Date
HK1091905A1 true HK1091905A1 (en) 2007-01-26

Family

ID=36669397

Family Applications (1)

Application Number Title Priority Date Filing Date
HK06113604.5A HK1091905A1 (en) 2004-12-15 2006-12-12 A manufacturing method of the microstructure body using a nanoimprint technology with a organic/inorganic hybrid material, and a microstructure body manufactured by this method

Country Status (5)

Country Link
JP (1) JP2006168147A (en)
KR (1) KR100955018B1 (en)
CN (1) CN100557467C (en)
HK (1) HK1091905A1 (en)
TW (1) TW200633845A (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
JP5189772B2 (en) 2007-02-09 2013-04-24 昭和電工株式会社 Fine pattern transfer material
JP5261817B2 (en) * 2008-08-30 2013-08-14 国立大学法人長岡技術科学大学 Ceramic fired body having fine uneven pattern on its surface and manufacturing method thereof
JP2010069730A (en) * 2008-09-18 2010-04-02 Osaka Univ Highly durable replica mold for nanoimprint lithography and method for fabricating the same
JP2010129507A (en) * 2008-12-01 2010-06-10 Asahi Kasei Corp Lighting apparatus
JP5349419B2 (en) * 2009-08-04 2013-11-20 エージェンシー フォー サイエンス，テクノロジー アンド リサーチ Method for reducing the size of an imprint structure on a substrate
KR100974288B1 (en) * 2010-01-13 2010-08-05 한국기계연구원 Patterning method of metal oxide thin film using nanoimprint and manufacturing method of light emitting diode
KR101302350B1 (en) * 2012-02-10 2013-08-30 노바테크인더스트리 주식회사 Manufacturing Method of Transparent Substrate for Light Extraction
KR20140031514A (en) * 2012-09-03 2014-03-13 포항공과대학교 산학협력단 Light emitting diode comprising refractive index control layer and method of fabricating the same
CN104101923B (en) * 2014-07-08 2016-05-18 淮安信息职业技术学院 There is the preparation method of the light diffusing sheet of random micrometer/nanometer mixed structure
CN105487151A (en) * 2016-01-22 2016-04-13 武汉理工大学 Grating preparation method through pattern transfer based on nano-imprint
TWI610804B (en) * 2016-05-23 2018-01-11 國立成功大學 Energy-saving Glass and Method of Manufacturing the Same
CN110546734B (en) * 2017-03-08 2024-04-02 佳能株式会社 Method for producing cured product pattern, optical component, circuit board, method for producing quartz mold replica, coating material for imprinting pretreatment, and cured product thereof
CN108339885B (en) * 2018-01-16 2019-06-11 杭州电子科技大学 Broaching tool flank micro nano surface pattern single-point increment method for stamping and its device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3381945B2 (en) * 1992-10-05 2003-03-04 日本板硝子株式会社 Method of forming fine uneven pattern on substrate
KR100316731B1 (en) * 1999-03-31 2001-12-12 김충섭 Hybrid Composition for Optical Coating And Photochromic Coating Composition Containing The Same
JP2001100026A (en) * 1999-09-30 2001-04-13 Minolta Co Ltd Liquid crystal optical device and liquid crystal polarizing device
JP4208447B2 (en) * 2001-09-26 2009-01-14 独立行政法人科学技術振興機構 Room temperature nano-imprint-lithography using SOG
JP4090374B2 (en) * 2003-03-20 2008-05-28 株式会社日立製作所 Nanoprint apparatus and fine structure transfer method
JP4639054B2 (en) 2004-04-02 2011-02-23 旭化成株式会社 Transparent hybrid sheet

Also Published As

Publication number Publication date
TW200633845A (en) 2006-10-01
CN100557467C (en) 2009-11-04
CN1790064A (en) 2006-06-21
JP2006168147A (en) 2006-06-29
KR100955018B1 (en) 2010-04-27
KR20060067875A (en) 2006-06-20

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20201214