HK1091905A1 - A manufacturing method of the microstructure body using a nanoimprint technology with a organic/inorganic hybrid material, and a microstructure body manufactured by this method - Google Patents

A manufacturing method of the microstructure body using a nanoimprint technology with a organic/inorganic hybrid material, and a microstructure body manufactured by this method

Info

Publication number
HK1091905A1
HK1091905A1 HK06113604.5A HK06113604A HK1091905A1 HK 1091905 A1 HK1091905 A1 HK 1091905A1 HK 06113604 A HK06113604 A HK 06113604A HK 1091905 A1 HK1091905 A1 HK 1091905A1
Authority
HK
Hong Kong
Prior art keywords
microstructure body
organic
manufacturing
inorganic hybrid
hybrid material
Prior art date
Application number
HK06113604.5A
Other languages
English (en)
Inventor
Tsutomu Morimoto
Nobuhito Miura
Naganori Tsutsui
Kazuhiko Fujii
Kenji Kozaki
Yongchun Luo
Naomi Nagai
Original Assignee
Kaneka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaneka Corp filed Critical Kaneka Corp
Publication of HK1091905A1 publication Critical patent/HK1091905A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0009—Forming specific nanostructures
    • B82B3/0038—Manufacturing processes for forming specific nanostructures not provided for in groups B82B3/0014 - B82B3/0033
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V3/00—Globes; Bowls; Cover glasses
    • F21V3/04—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Micromachines (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
HK06113604.5A 2004-12-15 2006-12-12 A manufacturing method of the microstructure body using a nanoimprint technology with a organic/inorganic hybrid material, and a microstructure body manufactured by this method HK1091905A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004362858A JP2006168147A (ja) 2004-12-15 2004-12-15 有機無機ハイブリッド材料とナノインプリント技術を用いた微細構造体の製造方法および微細構造体

Publications (1)

Publication Number Publication Date
HK1091905A1 true HK1091905A1 (en) 2007-01-26

Family

ID=36669397

Family Applications (1)

Application Number Title Priority Date Filing Date
HK06113604.5A HK1091905A1 (en) 2004-12-15 2006-12-12 A manufacturing method of the microstructure body using a nanoimprint technology with a organic/inorganic hybrid material, and a microstructure body manufactured by this method

Country Status (5)

Country Link
JP (1) JP2006168147A (xx)
KR (1) KR100955018B1 (xx)
CN (1) CN100557467C (xx)
HK (1) HK1091905A1 (xx)
TW (1) TW200633845A (xx)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8318253B2 (en) 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
JP5189772B2 (ja) * 2007-02-09 2013-04-24 昭和電工株式会社 微細パターン転写材料
JP5261817B2 (ja) * 2008-08-30 2013-08-14 国立大学法人長岡技術科学大学 表面に微細凹凸パターンを有したセラミックス焼成体及びその製造方法
JP2010069730A (ja) * 2008-09-18 2010-04-02 Osaka Univ ナノインプリントリソグラフィー用の高耐久性レプリカモールドおよびその作製方法
JP2010129507A (ja) * 2008-12-01 2010-06-10 Asahi Kasei Corp 照明器具
SG168513A1 (en) * 2009-08-04 2011-02-28 Agency Science Tech & Res A method of reducing the dimension of an imprint structure on a substrate
KR100974288B1 (ko) * 2010-01-13 2010-08-05 한국기계연구원 나노임프린트를 이용한 금속 산화박막 패턴 형성방법 및 이를 이용한 ｌｅｄ 소자의 제조방법
KR101302350B1 (ko) * 2012-02-10 2013-08-30 노바테크인더스트리 주식회사 광 추출용 투명기판의 제조방법
KR20140031514A (ko) * 2012-09-03 2014-03-13 포항공과대학교 산학협력단 굴절률 조절층을 포함하는 발광 다이오드 및 그 제조 방법
CN104101923B (zh) * 2014-07-08 2016-05-18 淮安信息职业技术学院 具有随机微米/纳米混合结构的光扩散片的制备方法
CN105487151A (zh) * 2016-01-22 2016-04-13 武汉理工大学 一种基于纳米压印的图形转移制备光栅的方法
TWI610804B (zh) * 2016-05-23 2018-01-11 國立成功大學 節能玻璃及其製造方法
CN110546734B (zh) * 2017-03-08 2024-04-02 佳能株式会社 固化物图案的制造方法和光学部件、电路板和石英模具复制品的制造方法以及用于压印预处理的涂覆材料及其固化物
CN108339885B (zh) * 2018-01-16 2019-06-11 杭州电子科技大学 拉刀后刀面微纳表面形貌单点增量压印方法及其装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3381945B2 (ja) * 1992-10-05 2003-03-04 日本板硝子株式会社 基板上に微細な凹凸パターンを形成する方法
KR100316731B1 (ko) * 1999-03-31 2001-12-12 김충섭 광학 코팅용 혼성 조성물 및 그것을 함유한 광변색 박막용 조성물
JP2001100026A (ja) * 1999-09-30 2001-04-13 Minolta Co Ltd 液晶光学デバイス及び液晶偏光デバイス
JP4208447B2 (ja) * 2001-09-26 2009-01-14 独立行政法人科学技術振興機構 Ｓｏｇを用いた室温ナノ−インプリント−リソグラフィー
JP4090374B2 (ja) * 2003-03-20 2008-05-28 株式会社日立製作所 ナノプリント装置、及び微細構造転写方法
JP4639054B2 (ja) 2004-04-02 2011-02-23 旭化成株式会社 透明ハイブリッドシート

Also Published As

Publication number Publication date
KR100955018B1 (ko) 2010-04-27
CN100557467C (zh) 2009-11-04
JP2006168147A (ja) 2006-06-29
CN1790064A (zh) 2006-06-21
TW200633845A (en) 2006-10-01
KR20060067875A (ko) 2006-06-20

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20201214