KR100918165B1 - 기판 처리시스템 - Google Patents

기판 처리시스템 Download PDF

Info

Publication number
KR100918165B1
KR100918165B1 KR1020020076482A KR20020076482A KR100918165B1 KR 100918165 B1 KR100918165 B1 KR 100918165B1 KR 1020020076482 A KR1020020076482 A KR 1020020076482A KR 20020076482 A KR20020076482 A KR 20020076482A KR 100918165 B1 KR100918165 B1 KR 100918165B1
Authority
KR
South Korea
Prior art keywords
substrate
substrate processing
unit
processing system
processing unit
Prior art date
Application number
KR1020020076482A
Other languages
English (en)
Korean (ko)
Other versions
KR20030047746A (ko
Inventor
시마이후토시
다카세신지
구마자와히로쯔구
Original Assignee
도쿄 오카 고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄 오카 고교 가부시키가이샤 filed Critical 도쿄 오카 고교 가부시키가이샤
Publication of KR20030047746A publication Critical patent/KR20030047746A/ko
Application granted granted Critical
Publication of KR100918165B1 publication Critical patent/KR100918165B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3064—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the transport means or means for confining the different units, e.g. to avoid the overflow
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Environmental & Geological Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning By Liquid Or Steam (AREA)
KR1020020076482A 2001-12-11 2002-12-04 기판 처리시스템 KR100918165B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2001-00376695 2001-12-11
JP2001376695A JP3850281B2 (ja) 2001-12-11 2001-12-11 基板処理システム

Publications (2)

Publication Number Publication Date
KR20030047746A KR20030047746A (ko) 2003-06-18
KR100918165B1 true KR100918165B1 (ko) 2009-09-17

Family

ID=19184835

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020076482A KR100918165B1 (ko) 2001-12-11 2002-12-04 기판 처리시스템

Country Status (3)

Country Link
JP (1) JP3850281B2 (ja)
KR (1) KR100918165B1 (ja)
TW (1) TWI281599B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4407970B2 (ja) * 2006-11-28 2010-02-03 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP7097759B2 (ja) * 2018-06-22 2022-07-08 東京エレクトロン株式会社 基板処理装置および基板処理方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07108159A (ja) * 1993-10-07 1995-04-25 Ebara Corp 搬送装置
JPH07231028A (ja) * 1994-02-18 1995-08-29 Ebara Corp 搬送装置および搬送方法
JPH0817723A (ja) * 1994-06-30 1996-01-19 Dainippon Screen Mfg Co Ltd 基板表面処理装置
JPH11121344A (ja) * 1997-10-21 1999-04-30 Nec Yamagata Ltd スピン塗布装置
JPH11156771A (ja) * 1997-11-28 1999-06-15 Dainippon Screen Mfg Co Ltd 基板搬送装置および基板搬送方法
JP2000012642A (ja) * 1998-06-18 2000-01-14 Dainippon Screen Mfg Co Ltd 基板処理装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07108159A (ja) * 1993-10-07 1995-04-25 Ebara Corp 搬送装置
JPH07231028A (ja) * 1994-02-18 1995-08-29 Ebara Corp 搬送装置および搬送方法
JPH0817723A (ja) * 1994-06-30 1996-01-19 Dainippon Screen Mfg Co Ltd 基板表面処理装置
JPH11121344A (ja) * 1997-10-21 1999-04-30 Nec Yamagata Ltd スピン塗布装置
JPH11156771A (ja) * 1997-11-28 1999-06-15 Dainippon Screen Mfg Co Ltd 基板搬送装置および基板搬送方法
JP2000012642A (ja) * 1998-06-18 2000-01-14 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
JP2003178949A (ja) 2003-06-27
TW200300875A (en) 2003-06-16
JP3850281B2 (ja) 2006-11-29
KR20030047746A (ko) 2003-06-18
TWI281599B (en) 2007-05-21

Similar Documents

Publication Publication Date Title
US5711646A (en) Substrate transfer apparatus
US4985722A (en) Apparatus for coating a photo-resist film and/or developing it after being exposed
US5177514A (en) Apparatus for coating a photo-resist film and/or developing it after being exposed
KR100574303B1 (ko) 기판처리장치
KR101355278B1 (ko) 기판 처리 장치 및 기판 처리 방법
KR100664344B1 (ko) 도포장치
TWI281704B (en) Substrate processing system
JP3165435B2 (ja) 洗浄装置
JP3236742B2 (ja) 塗布装置
KR100918165B1 (ko) 기판 처리시스템
JP3930278B2 (ja) 液処理装置および液処理方法
KR100871893B1 (ko) 인쇄회로기판의 이송장치 및 그에 사용되는 인쇄회로기판
KR100292322B1 (ko) 기판처리장치및기판반송방법
KR102340454B1 (ko) 기판 처리장치
KR102222263B1 (ko) 기판 처리 장치
KR101149455B1 (ko) 기판의 처리 장치, 반송 장치 및 처리 방법
KR100525730B1 (ko) 습식 식각 장비 및 습식 식각 방법
JP2926703B2 (ja) 基板処理方法及び装置
JP3822745B2 (ja) 洗浄装置
KR0120379Y1 (ko) 감광액 롤 코팅 장치
KR20020054872A (ko) 패널 연마장치 및 그에 따른 연마방법
JP2926214B2 (ja) 被処理基板の製造装置及び製造方法
KR19980063704A (ko) 기판반송장치
JP2002313699A (ja) 処理装置
JP3418824B2 (ja) 平面被加工物の移送保持装置

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20120903

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20130822

Year of fee payment: 5

LAPS Lapse due to unpaid annual fee