KR100891181B1 - 레티클을 취급하기 위한 엔드 이펙터 및 레티클을 이송하고 로딩하는 방법 - Google Patents

레티클을 취급하기 위한 엔드 이펙터 및 레티클을 이송하고 로딩하는 방법 Download PDF

Info

Publication number
KR100891181B1
KR100891181B1 KR1020030000923A KR20030000923A KR100891181B1 KR 100891181 B1 KR100891181 B1 KR 100891181B1 KR 1020030000923 A KR1020030000923 A KR 1020030000923A KR 20030000923 A KR20030000923 A KR 20030000923A KR 100891181 B1 KR100891181 B1 KR 100891181B1
Authority
KR
South Korea
Prior art keywords
reticle
plate
abandoned
payment
vacuum
Prior art date
Application number
KR1020030000923A
Other languages
English (en)
Korean (ko)
Other versions
KR20030080180A (ko
Inventor
프리드맨글렌엠.
코처스퍼거피터
래간자조세프
Original Assignee
에이에스엠엘 유에스, 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에이에스엠엘 유에스, 인크. filed Critical 에이에스엠엘 유에스, 인크.
Publication of KR20030080180A publication Critical patent/KR20030080180A/ko
Application granted granted Critical
Publication of KR100891181B1 publication Critical patent/KR100891181B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manipulator (AREA)
KR1020030000923A 2002-01-09 2003-01-08 레티클을 취급하기 위한 엔드 이펙터 및 레티클을 이송하고 로딩하는 방법 KR100891181B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/040,375 2002-01-09
US10/040,375 US7004715B2 (en) 2002-01-09 2002-01-09 Apparatus for transferring and loading a reticle with a robotic reticle end-effector

Publications (2)

Publication Number Publication Date
KR20030080180A KR20030080180A (ko) 2003-10-11
KR100891181B1 true KR100891181B1 (ko) 2009-04-01

Family

ID=21910641

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030000923A KR100891181B1 (ko) 2002-01-09 2003-01-08 레티클을 취급하기 위한 엔드 이펙터 및 레티클을 이송하고 로딩하는 방법

Country Status (7)

Country Link
US (2) US7004715B2 (ja)
EP (1) EP1327913A3 (ja)
JP (1) JP2003243301A (ja)
KR (1) KR100891181B1 (ja)
CN (1) CN1295121C (ja)
SG (1) SG102066A1 (ja)
TW (1) TWI283799B (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7004715B2 (en) * 2002-01-09 2006-02-28 Asml Holding N.V. Apparatus for transferring and loading a reticle with a robotic reticle end-effector
US6862817B1 (en) * 2003-11-12 2005-03-08 Asml Holding N.V. Method and apparatus for kinematic registration of a reticle
JP5160541B2 (ja) * 2006-06-19 2013-03-13 インテグリス・インコーポレーテッド レチクル保管庫をパージするためのシステム
NL1036673A1 (nl) * 2008-04-09 2009-10-12 Asml Holding Nv Robot Position Calibration Tool (RPCT).
NL1036785A1 (nl) * 2008-04-18 2009-10-20 Asml Netherlands Bv Rapid exchange device for lithography reticles.
US8145349B2 (en) * 2008-05-14 2012-03-27 Formfactor, Inc. Pre-aligner search
US8336188B2 (en) * 2008-07-17 2012-12-25 Formfactor, Inc. Thin wafer chuck
CN102365590B (zh) * 2009-04-06 2014-07-16 Asml控股股份有限公司 用于掩模板的快速交换装置中的共享的顺应性和掩模板平台
CN102320472B (zh) * 2011-06-03 2013-07-10 深圳市华星光电技术有限公司 基板传送系统及传送方法
KR102270563B1 (ko) * 2015-03-16 2021-06-30 주식회사 탑 엔지니어링 기판 이송 시스템
CN116088283B (zh) * 2023-04-12 2023-06-30 深圳市龙图光罩股份有限公司 掩模版预校准方法、系统、电子设备以及可读存储介质

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1052546A2 (en) 1999-04-21 2000-11-15 Asm Lithography B.V. Substrate handler for use in lithographic projection apparatus
WO2000068625A1 (en) * 1999-05-11 2000-11-16 Matrix Integrated Systems, Inc. End-effector with integrated cooling mechanism
US6183026B1 (en) 1999-04-07 2001-02-06 Gasonics International Corporation End effector
JP2001076998A (ja) * 1999-09-01 2001-03-23 Canon Inc 基板管理方法及び半導体露光装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4984953A (en) 1987-02-20 1991-01-15 Canon Kabushiki Kaisha Plate-like article conveying system
DE69123279T2 (de) 1990-04-06 1997-04-24 Canon K.K., Tokio/Tokyo Transportvorrichtung für Substrate und Verfahren zur Kontrolle
US5130747A (en) 1990-09-28 1992-07-14 Kabushiki Kaisha Toshiba Carrier apparatus
EP0634787B1 (en) * 1993-07-15 1997-05-02 Applied Materials, Inc. Subsrate tray and ceramic blade for semiconductor processing apparatus
US5980187A (en) 1997-04-16 1999-11-09 Kla-Tencor Corporation Mechanism for transporting semiconductor-process masks
JPH1174182A (ja) * 1997-08-28 1999-03-16 Nikon Corp マスク搬送装置及びマスクステージ
EP1052547A3 (en) * 1999-04-21 2002-07-31 Asm Lithography B.V. Mask-handling apparatus for lithographic projection apparatus
JP4689064B2 (ja) 2000-03-30 2011-05-25 キヤノン株式会社 露光装置およびデバイス製造方法
JP4560182B2 (ja) 2000-07-06 2010-10-13 キヤノン株式会社 減圧処理装置、半導体製造装置およびデバイス製造方法
JP2002050667A (ja) 2000-08-04 2002-02-15 Canon Inc 基板搬送装置、半導体製造装置および半導体デバイス製造方法
US6619903B2 (en) 2001-08-10 2003-09-16 Glenn M. Friedman System and method for reticle protection and transport
US7004715B2 (en) 2002-01-09 2006-02-28 Asml Holding N.V. Apparatus for transferring and loading a reticle with a robotic reticle end-effector

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6183026B1 (en) 1999-04-07 2001-02-06 Gasonics International Corporation End effector
EP1052546A2 (en) 1999-04-21 2000-11-15 Asm Lithography B.V. Substrate handler for use in lithographic projection apparatus
WO2000068625A1 (en) * 1999-05-11 2000-11-16 Matrix Integrated Systems, Inc. End-effector with integrated cooling mechanism
JP2001076998A (ja) * 1999-09-01 2001-03-23 Canon Inc 基板管理方法及び半導体露光装置

Also Published As

Publication number Publication date
EP1327913A2 (en) 2003-07-16
US20030129051A1 (en) 2003-07-10
CN1295121C (zh) 2007-01-17
EP1327913A3 (en) 2007-03-21
US7004715B2 (en) 2006-02-28
JP2003243301A (ja) 2003-08-29
TWI283799B (en) 2007-07-11
US20060182605A1 (en) 2006-08-17
SG102066A1 (en) 2004-02-27
TW200302955A (en) 2003-08-16
KR20030080180A (ko) 2003-10-11
CN1433940A (zh) 2003-08-06
US7278817B2 (en) 2007-10-09

Similar Documents

Publication Publication Date Title
US7278817B2 (en) Method for transferring and loading a reticle
US6239863B1 (en) Removable cover for protecting a reticle, system including and method of using the same
US7065894B2 (en) Apparatus for kinematic registration of a reticle
US5536559A (en) Stress-free mount for imaging mask
JP2001100169A (ja) 基板支持装置および基板処理装置
US6873402B2 (en) Reticle stop block apparatus and method
JP2003186199A (ja) 露光装置
JP3276477B2 (ja) 基板処理装置
US20100085554A1 (en) Adaptor of an aligner system
JP3004045B2 (ja) 露光装置
JP2020194007A (ja) 露光装置
JP2006073916A (ja) 位置調整方法、デバイス製造方法、位置調整装置及び露光装置
US7384228B2 (en) Insertion device, lithographic apparatus with said insertion device and device manufacturing method
JP2877377B2 (ja) 露光装置及び露光用マスク
JP2000182936A (ja) 露光装置およびデバイス製造方法
JP2001237167A (ja) 露光方法及びデバイス製造方法
JP2000306977A (ja) 搬送方法及び搬送装置、並びに露光装置
EP0475617B1 (en) Substrate transfer method
JP2001054890A (ja) 基板搬送装置及び基板処理装置
JP2023173758A (ja) 露光装置、露光方法、および物品製造方法
JP2000031019A (ja) マスクおよび露光装置
JP3499118B2 (ja) ウエハの位置出し方法
WO2000055686A1 (en) Passive shaped chuck for correcting field curvature
JPS6370420A (ja) 半導体焼付装置
JPH07101664B2 (ja) 露光装置の位置合せ方法

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E90F Notification of reason for final refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
LAPS Lapse due to unpaid annual fee