KR100882520B1 - 해상도를 개선하기 위한 미세 증착 제어 시스템에서의오버-클록킹 - Google Patents
해상도를 개선하기 위한 미세 증착 제어 시스템에서의오버-클록킹 Download PDFInfo
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- KR100882520B1 KR100882520B1 KR1020037015744A KR20037015744A KR100882520B1 KR 100882520 B1 KR100882520 B1 KR 100882520B1 KR 1020037015744 A KR1020037015744 A KR 1020037015744A KR 20037015744 A KR20037015744 A KR 20037015744A KR 100882520 B1 KR100882520 B1 KR 100882520B1
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/04—Heads using conductive ink
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/09—Ink jet technology used for manufacturing optical filters
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0266—Marks, test patterns or identification means
- H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09918—Optically detected marks used for aligning tool relative to the PCB, e.g. for mounting of components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Electroluminescent Light Sources (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Optical Filters (AREA)
- Physical Vapour Deposition (AREA)
- Piezo-Electric Transducers For Audible Bands (AREA)
- Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
- Networks Using Active Elements (AREA)
- Ultra Sonic Daignosis Equipment (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Gripping On Spindles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Control Of High-Frequency Heating Circuits (AREA)
- Radiation-Therapy Devices (AREA)
- Electrophonic Musical Instruments (AREA)
- Lining Or Joining Of Plastics Or The Like (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Ink Jet (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Telephone Function (AREA)
- Air Bags (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Abstract
Description
Claims (23)
- 기판상에 정확한 양의 유체 물질을 증착하기 위한 미세 증착 장치에 있어서,기판 상에 증착되었을 때 폭(width)을 가지는 방울을 발화하는 복수개의 이격된 노즐을 포함하는 미세 증착 헤드와,상기 기판에 관해 상기 미세 증착 헤드를 헤드 스피드로 이동시키는 위치 설정 장치와,상기 위치 설정 장치를 위한 위치 제어 신호들을 발생시키는 위치 설정 모듈과, 상기 기판상에 피처를 정의하는 방울을 형성하기 위하여 상기 노즐을 발화시키기 위해서 오버-클록킹 속도에 근거한 노즐 발화 명령들을 발생시키는 노즐 발화 모듈을 포함하고, 상기 방울 폭에 의하여 분리되는 상기 헤드 스피드보다 더 큰 속도로 오버-클록킹 신호를 발생시키는 콘트롤러를 포함하는 미세 증착 장치.
- 제 1 항에 있어서, 상기 오버-클록킹 신호는 상기 방울 폭에 의하여 분리되는 상기 헤드 스피드의 세배보다 더 큰 미세 증착 장치.
- 제 1 항에 있어서, 상기 미세 증착 시스템이 전기 장치의 한 층의 일부를 형성하며 상기 방울이 광 방출기, 전기적 도전체, 레지스트, 전기적 트레이스, 절연체, 캐패시터 및 저항기 중 적어도 하나를 형성하는 미세 증착 장치.
- 제 1 항에 있어서, 상기 헤드에 접속된 헤드 어셈블리를 더 포함하며, 상기 위치 설정 모듈은 상기 헤드 어셈블리를 회전시킴으로써 상기 헤드의 피치를 조정하고, 상기 노즐 발화 모듈은 상기 피치의 변화를 보상하기 위해 상기 오버-클록킹 신호를 이용하여 상기 노즐 발화 명령들의 타이밍을 조정하는 미세 증착 장치.
- 제 4 항에 있어서, 상기 오버-클록킹 신호는 상기 방울 폭에 의하여 분리되는 상기 헤드 스피드의 열배인 미세 증착 장치.
- 삭제
- 제 1 항에 있어서,상기 방울의 디지털 이미지를 생성하는 제 1 카메라와,상기 방울의 형태, 크기, 위치 및 속도 중 적어도 하나를 분석하기 위하여 광학 문자 인식(optical character recognition)을 이용하며 적어도 하나의 노즐 발화 파라미터를 조정하는 방울 분석 모듈을 더 포함하는 미세 증착 장치.
- 제 7 항에 있어서, 상기 노즐 발화 파라미터는 타이밍, 진폭, 지속기간, 상승 기울기 및 하강 기울기 중 적어도 하나를 포함하는 미세 증착 장치.
- 제 7 항에 있어서, 상기 미세 증착 헤드는 열 미세 증착 헤드, 버블 미세 증착 헤드, 연속 방울 미세 증착 헤드, 압변환기 밸브 및 마이크로 전자기계 밸브로 이루어진 그룹으로부터 선택되는 미세 증착 장치.
- 제 7 항에 있어서, 상기 노즐 각각에 대한 적어도 하나의 노즐 발화 파형을 조정하게 하는 파형 발생기를 더 포함하고 상기 파형 발생기는 상기 노즐의 동작 상태에 근거하여 상기 노즐 각각에 대한 복수개의 노즐 발화 파형중 하나를 선택하는 선택기를 포함하는 미세 증착 장치.
- 삭제
- 기판상에 정확한 양의 유체 물질을 증착하기 위한 방법에 있어서,노즐을 포함하는 헤드를 제공하는 단계와,상기 기판에 관해 상기 미세 증착 헤드를 헤드 스피드로 이동시키는 단계와,증착된 방울 폭에 의하여 분리되는 상기 헤드 스피드보다 더 큰 속도로 오버-클록킹 신호를 발생시키는 단계와,상기 노즐을 발화시키기 위하여 오버-클록킹 속도에 근거해서 노즐 발화 명령들을 발생시키는 단계와,상기 기판상에 피처를 형성하는 단계를 포함하는 증착 방법.
- 제 12 항에 있어서, 상기 오버-클록킹 신호는 상기 방울 폭에 의하여 분리되는 상기 헤드 스피드의 세배보다 더 큰 증착 방법.
- 제 12 항에 있어서, 상기 미세 증착 시스템이 전기 장치의 부분을 형성하며 상기 방울이 광 방출기, 전기적 도전체, 레지스트, 전기적 트레이스, 절연체, 캐패시터 및 저항기 중 적어도 하나를 형성하는 증착 방법.
- 제 12 항에 있어서, 상기 헤드의 피치를 조정하는 단계를 더 포함하고, 상기 노즐 발화 모듈은 상기 피치의 변화를 보상하기 위해 상기 오버-클록킹 신호를 이용하여 상기 노즐 발화 명령들의 타이밍을 조정하는 증착 방법.
- 제 12 항에 있어서, 상기 오버-클록킹 신호가 피처 해상도를 증가시키는 증착 방법.
- 삭제
- 제 12 항에 있어서,상기 방울의 디지털 이미지를 생성하는 단계와,상기 방울의 형태, 크기, 위치 및 속도 중 적어도 하나를 분석하기 위하여 광학 문자 인식을 이용하는 단계와,적어도 하나의 노즐 발화 파라미터를 조정하는 단계를 더 포함하는 증착 방법.
- 제 16 항에 있어서, 상기 노즐 발화 파라미터는 타이밍, 진폭, 지속기간, 상승 기울기 및 하강 기울기 중 적어도 하나를 포함하는 증착 방법.
- 제 16 항에 있어서, 상기 미세 증착 헤드는 열 미세 증착 헤드, 버블 미세 증착 헤드, 연속 방울 미세 증착 헤드, 압변환기 밸브 및 마이크로 전자기계 밸브로 이루어진 그룹으로부터 선택되는 증착 방법.
- 제 12 항에 있어서, 상기 노즐의 적어도 하나의 노즐 발화 파형을 조정하는 단계를 더 포함하는 증착 방법.
- 제 21 항에 있어서, 상기 노즐의 동작 상태에 근거하여 상기 노즐 각각에 대한 복수개의 노즐 발화 파형중 하나를 선택하는 단계를 더 포함하는 미세 증착 방법.
- 제 21 항에 있어서, 상기 오버-클록킹 신호는 상기 방울 폭에 의해 분리되는 상기 헤드 스피드의 열배인 증착 방법.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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US29511801P | 2001-06-01 | 2001-06-01 | |
US29510001P | 2001-06-01 | 2001-06-01 | |
US60/295,100 | 2001-06-01 | ||
US60/295,118 | 2001-06-01 | ||
PCT/US2002/017521 WO2002098575A1 (en) | 2001-06-01 | 2002-05-31 | Over-clocking in a microdeposition control system to improve resolution |
Publications (2)
Publication Number | Publication Date |
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KR20040029997A KR20040029997A (ko) | 2004-04-08 |
KR100882520B1 true KR100882520B1 (ko) | 2009-02-06 |
Family
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Application Number | Title | Priority Date | Filing Date |
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KR1020097020246A KR100998171B1 (ko) | 2001-06-01 | 2002-05-31 | 미세 증착 제어 장치를 위한 파형 발생기 |
KR1020037015744A KR100882520B1 (ko) | 2001-06-01 | 2002-05-31 | 해상도를 개선하기 위한 미세 증착 제어 시스템에서의오버-클록킹 |
KR10-2003-7015752A KR20040024558A (ko) | 2001-06-01 | 2002-05-31 | 압전 미세증착을 이용한 인쇄회로보드 구조물의 형성 |
KR1020037015742A KR100924002B1 (ko) | 2001-06-01 | 2002-05-31 | 폴리머 발광 다이오드 디스플레이, 인쇄 회로 기판 등을 위한 산업용 미세 증착 장치 |
KR10-2003-7015748A KR20040026659A (ko) | 2001-06-01 | 2002-05-31 | 교환가능 미세증착 헤드 장치 및 방법 |
KR1020037015750A KR100938810B1 (ko) | 2001-06-01 | 2002-05-31 | 미세 증착 제어 장치를 위한 파형 발생기 |
KR10-2003-7015754A KR20040038915A (ko) | 2001-06-01 | 2002-05-31 | 복수의 유체 물질의 미세증착을 위한 장치 |
KR1020037015746A KR100912008B1 (ko) | 2001-06-01 | 2002-05-31 | 미세증착 장치 |
Family Applications Before (1)
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KR1020097020246A KR100998171B1 (ko) | 2001-06-01 | 2002-05-31 | 미세 증착 제어 장치를 위한 파형 발생기 |
Family Applications After (6)
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KR10-2003-7015752A KR20040024558A (ko) | 2001-06-01 | 2002-05-31 | 압전 미세증착을 이용한 인쇄회로보드 구조물의 형성 |
KR1020037015742A KR100924002B1 (ko) | 2001-06-01 | 2002-05-31 | 폴리머 발광 다이오드 디스플레이, 인쇄 회로 기판 등을 위한 산업용 미세 증착 장치 |
KR10-2003-7015748A KR20040026659A (ko) | 2001-06-01 | 2002-05-31 | 교환가능 미세증착 헤드 장치 및 방법 |
KR1020037015750A KR100938810B1 (ko) | 2001-06-01 | 2002-05-31 | 미세 증착 제어 장치를 위한 파형 발생기 |
KR10-2003-7015754A KR20040038915A (ko) | 2001-06-01 | 2002-05-31 | 복수의 유체 물질의 미세증착을 위한 장치 |
KR1020037015746A KR100912008B1 (ko) | 2001-06-01 | 2002-05-31 | 미세증착 장치 |
Country Status (9)
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US (1) | US7270712B2 (ko) |
EP (7) | EP1569757A4 (ko) |
JP (9) | JP4328614B2 (ko) |
KR (8) | KR100998171B1 (ko) |
CN (7) | CN1635949A (ko) |
AT (3) | ATE486662T1 (ko) |
AU (4) | AU2002346735A1 (ko) |
DE (3) | DE60235458D1 (ko) |
WO (8) | WO2002098576A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109890619A (zh) * | 2016-07-27 | 2019-06-14 | 哈佛学院院长及董事 | 用于声泳打印的设备和方法 |
Families Citing this family (98)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4971560B2 (ja) * | 2001-08-06 | 2012-07-11 | キヤノン株式会社 | インクジェット記録装置、ヘッドユニット及びカラーフィルタ製造装置 |
AU2003266690A1 (en) * | 2002-09-27 | 2004-05-04 | Shimadzu Corporation | Liquid portioning method and device |
US7964237B2 (en) * | 2003-08-21 | 2011-06-21 | International Business Machines Corporation | Fully automated paste dispense process for dispensing small dots and lines |
TWI220076B (en) * | 2003-08-27 | 2004-08-01 | Au Optronics Corp | Light-emitting device |
KR101026935B1 (ko) | 2003-12-10 | 2011-04-04 | 엘지디스플레이 주식회사 | 디스펜서 정렬장치 및 그 방법 |
JP4195366B2 (ja) | 2003-12-19 | 2008-12-10 | シャープ株式会社 | 薬液塗布方法および薬液塗布装置 |
US7271940B2 (en) * | 2004-02-10 | 2007-09-18 | Zebra Imaging, Inc. | Deposition of photosensitive media for digital hologram recording |
US7354845B2 (en) | 2004-08-24 | 2008-04-08 | Otb Group B.V. | In-line process for making thin film electronic devices |
NL1026013C2 (nl) | 2004-04-23 | 2005-10-25 | Otb Group Bv | Werkwijze en inrichting voor het nauwkeurig aanbrengen van structuren op een substraat. |
US8101244B2 (en) * | 2004-06-09 | 2012-01-24 | Smithkline Beecham Corporation | Apparatus and method for producing or processing a product or sample |
TWI356036B (en) * | 2004-06-09 | 2012-01-11 | Smithkline Beecham Corp | Apparatus and method for pharmaceutical production |
US20060092218A1 (en) * | 2004-11-04 | 2006-05-04 | Applied Materials, Inc. | Methods and apparatus for inkjet printing |
JP2006137124A (ja) * | 2004-11-15 | 2006-06-01 | Konica Minolta Holdings Inc | 液体吐出装置及び液体吐出方法 |
WO2006064792A1 (ja) * | 2004-12-14 | 2006-06-22 | Ulvac, Inc. | 塗布装置、有機材料薄膜の形成方法、有機elパネル製造装置 |
JP2006175727A (ja) * | 2004-12-22 | 2006-07-06 | Konica Minolta Holdings Inc | 液滴吐出制御装置 |
WO2006074016A2 (en) | 2004-12-30 | 2006-07-13 | Fujifilm Dimatix, Inc. | Ink jet printing |
TW200640596A (en) | 2005-01-14 | 2006-12-01 | Cabot Corp | Production of metal nanoparticles |
US8167393B2 (en) | 2005-01-14 | 2012-05-01 | Cabot Corporation | Printable electronic features on non-uniform substrate and processes for making same |
US20060176350A1 (en) * | 2005-01-14 | 2006-08-10 | Howarth James J | Replacement of passive electrical components |
US20060158478A1 (en) * | 2005-01-14 | 2006-07-20 | Howarth James J | Circuit modeling and selective deposition |
US8383014B2 (en) | 2010-06-15 | 2013-02-26 | Cabot Corporation | Metal nanoparticle compositions |
US7824466B2 (en) | 2005-01-14 | 2010-11-02 | Cabot Corporation | Production of metal nanoparticles |
WO2006076606A2 (en) | 2005-01-14 | 2006-07-20 | Cabot Corporation | Optimized multi-layer printing of electronics and displays |
WO2006076608A2 (en) * | 2005-01-14 | 2006-07-20 | Cabot Corporation | A system and process for manufacturing custom electronics by combining traditional electronics with printable electronics |
US20060160373A1 (en) * | 2005-01-14 | 2006-07-20 | Cabot Corporation | Processes for planarizing substrates and encapsulating printable electronic features |
JP2006195863A (ja) * | 2005-01-17 | 2006-07-27 | Fujitsu Ten Ltd | エラー検出装置 |
US20060163563A1 (en) * | 2005-01-24 | 2006-07-27 | Kurt Ulmer | Method to form a thin film resistor |
US8136911B2 (en) | 2005-07-05 | 2012-03-20 | Konica Minolta Holdings, Inc. | Patterning apparatus, method for making organic electroluminescent element, organic electroluminescent element, and organic electroluminescent display |
JP5509509B2 (ja) * | 2005-09-30 | 2014-06-04 | コニカミノルタ株式会社 | 液滴吐出装置、液滴速度調整方法、液滴速度検出装置、液滴速度検出方法、プログラム及び記録媒体 |
WO2007042966A2 (en) * | 2005-10-07 | 2007-04-19 | Koninklijke Philips Electronics N.V. | Inkjet device and method for the controlled positioning of droplets of a substance onto a substrate |
TWI287828B (en) * | 2005-12-30 | 2007-10-01 | Ind Tech Res Inst | Method for printing a pattern and data processing method thereof |
JP4058453B2 (ja) * | 2006-05-08 | 2008-03-12 | シャープ株式会社 | 液滴塗布装置 |
TWI318176B (en) | 2006-11-08 | 2009-12-11 | Ind Tech Res Inst | Printing method |
TWI320754B (en) | 2006-11-10 | 2010-02-21 | Ind Tech Res Inst | A print data processing mothod and device therefor |
US7988247B2 (en) | 2007-01-11 | 2011-08-02 | Fujifilm Dimatix, Inc. | Ejection of drops having variable drop size from an ink jet printer |
JP2008201018A (ja) * | 2007-02-21 | 2008-09-04 | Toppan Printing Co Ltd | インクジェットヘッドのアライメント装置 |
JP5391524B2 (ja) * | 2007-03-23 | 2014-01-15 | 凸版印刷株式会社 | インクジェットヘッド管理装置 |
US8186790B2 (en) * | 2008-03-14 | 2012-05-29 | Purdue Research Foundation | Method for producing ultra-small drops |
DE102008057005A1 (de) * | 2008-11-11 | 2010-05-12 | Jonas & Redmann Automationstechnik Gmbh | Verfahren zum Positionieren und/oder Führen mindestens eines beliebigen Prozesskopfes für die Metallisierung von dünnen Substraten in einem definierten Abstand über der Substratoberfläche |
CN101462414B (zh) * | 2008-11-28 | 2011-03-23 | 江苏康众数字医疗设备有限公司 | 用于电子元件集成的印刷装置及印刷方法 |
EP2199065B1 (en) | 2008-12-19 | 2012-03-21 | Agfa Graphics N.V. | Image processing method for three-dimensional printing |
US20100156768A1 (en) * | 2008-12-22 | 2010-06-24 | Fletcher Ii James Douglas | Display media, method of forming display media, and printer for printing on display media |
JP5401163B2 (ja) * | 2009-04-30 | 2014-01-29 | パナソニック株式会社 | インクジェット印刷装置 |
US20100300355A1 (en) * | 2009-06-01 | 2010-12-02 | Moser Baer India Limited | Printing material profiles onto substrates |
US20130099666A1 (en) * | 2011-10-21 | 2013-04-25 | Almax Rp Corp. | Selectively controlling the resistance of resistive traces printed on a substrate to supply equal current to an array of light sources |
JP6057406B2 (ja) * | 2012-01-06 | 2017-01-11 | 住友重機械工業株式会社 | 薄膜形成装置及び薄膜形成方法 |
FR2990055B1 (fr) * | 2012-04-30 | 2014-12-26 | Total Sa | Matrice de depot d'au moins un fluide conducteur sur un substrat, ainsi que dispositif comprenant cette matrice et procede de depot |
JP5750414B2 (ja) * | 2012-08-27 | 2015-07-22 | 東芝テック株式会社 | インクジェットヘッド駆動装置 |
CN102862402B (zh) * | 2012-10-17 | 2015-07-22 | 佛山市智巢电子科技有限公司 | 一种阵列式精密喷印设备的喷印控制方法与系统 |
US9352561B2 (en) | 2012-12-27 | 2016-05-31 | Kateeva, Inc. | Techniques for print ink droplet measurement and control to deposit fluids within precise tolerances |
US9700908B2 (en) | 2012-12-27 | 2017-07-11 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
US9832428B2 (en) | 2012-12-27 | 2017-11-28 | Kateeva, Inc. | Fast measurement of droplet parameters in industrial printing system |
KR101733904B1 (ko) | 2012-12-27 | 2017-05-08 | 카티바, 인크. | 정밀 공차 내로 유체를 증착하기 위한 인쇄 잉크 부피 제어를 위한 기법 |
US11141752B2 (en) | 2012-12-27 | 2021-10-12 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
US11673155B2 (en) | 2012-12-27 | 2023-06-13 | Kateeva, Inc. | Techniques for arrayed printing of a permanent layer with improved speed and accuracy |
EP3003692A1 (en) * | 2013-05-31 | 2016-04-13 | Johnson Controls Technology Company | System and method for forming a vehicle trim component via additive manufacturing, and vehicle trim component |
WO2015088592A1 (en) | 2013-12-12 | 2015-06-18 | Kateeva, Inc. | Ink-based layer fabrication using halftoning to control thickness |
US20150197062A1 (en) * | 2014-01-12 | 2015-07-16 | Zohar SHINAR | Method, device, and system of three-dimensional printing |
EP2902206B1 (en) * | 2014-01-31 | 2021-06-09 | HP Scitex Ltd | Printhead arrangement on a printbar beam member |
US10391705B2 (en) * | 2014-05-09 | 2019-08-27 | Nike, Inc. | System and method for forming three-dimensional structures |
US9387671B2 (en) | 2014-05-14 | 2016-07-12 | Ricoh Company, Ltd. | Head driving device, recording head unit, and image forming apparatus |
US9147875B1 (en) | 2014-09-10 | 2015-09-29 | Cellink Corporation | Interconnect for battery packs |
US10211443B2 (en) | 2014-09-10 | 2019-02-19 | Cellink Corporation | Battery interconnects |
CN104385592B (zh) * | 2014-10-14 | 2016-12-07 | 秦皇岛天秦三维数字化技术有限公司 | 3d打印机机电控制系统及方法 |
JP6296960B2 (ja) * | 2014-10-31 | 2018-03-20 | 株式会社東芝 | インクジェットヘッド、及び、印刷装置 |
CN105643921B (zh) * | 2014-11-11 | 2018-09-25 | 三纬国际立体列印科技股份有限公司 | 立体打印装置与立体打印方法 |
EP3254308B1 (en) * | 2015-02-03 | 2022-04-13 | CelLink Corporation | Systems for combined thermal and electrical energy transfer |
US10029425B2 (en) * | 2015-04-07 | 2018-07-24 | Sartorius Stedim Biotech Gmbh | Container for accommodating at least one of at least one biologically active fluid and at least one preparatory fluid, and a method therefor |
JP6479555B2 (ja) * | 2015-04-27 | 2019-03-06 | 住友重機械工業株式会社 | 膜形成装置 |
WO2017108071A1 (de) * | 2015-12-21 | 2017-06-29 | Wacker Chemie Ag | Verfahren und vorrichtung zur herstellung eines objekts unter einsatz einer 3d-druckvorrichtung |
JP6387955B2 (ja) * | 2015-12-25 | 2018-09-12 | セイコーエプソン株式会社 | ヘッドユニット制御回路 |
CN107952958B (zh) * | 2016-10-16 | 2020-01-10 | 北京煜鼎增材制造研究院有限公司 | 沉积轴、增材制造设备及对沉积轴行程进行调节的方法 |
DE102016014944A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Beschichtungsverfahren und entsprechende Beschichtungseinrichtung |
DE102016014953A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Lackieranlage und entsprechendes Lackierverfahren |
DE102016014920A1 (de) * | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Druckkopf mit Verschiebe- und/oder Drehmechanik für zumindest eine Düsenreihe |
DE102016014947A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Druckkopf zur Applikation eines Beschichtungsmittels |
DE102016014946A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Druckkopf zur Applikation eines Beschichtungsmittels auf ein Bauteil |
DE102016014943A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Druckkopf mit Temperiereinrichtung |
DE102016014919A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Applikationsvorrichtung und Verfahren zum Applizieren eines Beschichtungsmittels |
DE102016014948A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Druckkopf und zugehöriges Betriebsverfahren |
DE102016014951A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Beschichtungseinrichtung und zugehöriges Betriebsverfahren |
DE102016014955A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Beschichtungseinrichtung und entsprechendes Beschichtungsverfahren |
DE102016014952A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Beschichtungseinrichtung zur Beschichtung von Bauteilen |
DE102016014956A1 (de) | 2016-12-14 | 2018-06-14 | Dürr Systems Ag | Beschichtungseinrichtung und zugehöriges Betriebsverfahren |
JP6999317B2 (ja) * | 2017-07-21 | 2022-01-18 | 東芝テック株式会社 | インクジェットヘッド及びインクジェットプリンタ |
US11504736B2 (en) * | 2017-10-27 | 2022-11-22 | Nordson Corporation | Systems and methods for closed loop fluid velocity control for jetting |
WO2019140423A1 (en) * | 2018-01-15 | 2019-07-18 | Tokyo Electron Limited | System and method for fluid dispense and coverage control |
FR3080998B1 (fr) * | 2018-05-14 | 2020-04-24 | Reydel Automotive B.V. | Procede de traitement de surface d'une piece et installation associee |
EP3588099A1 (en) * | 2018-06-26 | 2020-01-01 | Tecan Trading Ag | Positioning assembly for a laboratory apparatus |
CN110271288B (zh) * | 2019-07-05 | 2020-05-22 | 深圳市华星光电半导体显示技术有限公司 | Oled喷墨打印喷头及其打印装置 |
CN110424032A (zh) * | 2019-09-10 | 2019-11-08 | 江苏师范大学 | 一种用于压力机主轴修复的射流电沉积装置及其方法 |
CN111231316A (zh) * | 2020-03-02 | 2020-06-05 | 爱司达智能制造(江苏)有限公司 | 一种增材设备的流道结构 |
CN111286699B (zh) * | 2020-03-25 | 2022-04-05 | 中国工程物理研究院激光聚变研究中心 | 一种挡板修正方法、镀膜方法和装置 |
CN111653184B (zh) * | 2020-07-10 | 2022-05-10 | 宿迁市规划测绘院有限公司 | 一种拥有多功能放置台的3d地图批量喷绘控制系统 |
JP2024512188A (ja) | 2021-03-24 | 2024-03-19 | セルリンク コーポレーション | 多層フレキシブルバッテリー相互接続及びその製造方法 |
CN113245102B (zh) * | 2021-06-07 | 2022-02-25 | 苏州微知电子科技有限公司 | 一种纤维器件喷涂机 |
CN114161707A (zh) * | 2021-12-10 | 2022-03-11 | 苏州华星光电技术有限公司 | 打印设备及打印方法 |
CN114474718A (zh) * | 2021-12-28 | 2022-05-13 | 郭超 | 一种3d打印检测方法、装置、设备及3d打印系统 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5498444A (en) * | 1994-02-28 | 1996-03-12 | Microfab Technologies, Inc. | Method for producing micro-optical components |
US5505777A (en) * | 1992-11-19 | 1996-04-09 | Asymptotic Technologies, Inc. | Computer controlled viscous fluid dispensing system |
US5932012A (en) * | 1995-06-23 | 1999-08-03 | Hitachi Techno Engineering Co., Ltd. | Paste applicator having positioning means |
US6007631A (en) * | 1997-11-10 | 1999-12-28 | Speedline Technologies, Inc. | Multiple head dispensing system and method |
Family Cites Families (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3572400A (en) * | 1967-08-31 | 1971-03-23 | Western Electric Co | Dispensing of fluids to small areas |
US4037830A (en) * | 1976-09-07 | 1977-07-26 | International Business Machines Corporation | Wafer handler |
JPS5590806A (en) * | 1978-12-29 | 1980-07-09 | Ricoh Co Ltd | Apparatus for measuring diameter of ink jet particle |
US4795518A (en) * | 1984-02-17 | 1989-01-03 | Burr-Brown Corporation | Method using a multiple device vacuum chuck for an automatic microelectronic bonding apparatus |
US4575330A (en) * | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
US4835704A (en) * | 1986-12-29 | 1989-05-30 | General Electric Company | Adaptive lithography system to provide high density interconnect |
US5002008A (en) * | 1988-05-27 | 1991-03-26 | Tokyo Electron Limited | Coating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by state |
US5229016A (en) * | 1991-08-08 | 1993-07-20 | Microfab Technologies, Inc. | Method and apparatus for dispensing spherical-shaped quantities of liquid solder |
JPH05149769A (ja) * | 1991-11-29 | 1993-06-15 | Canon Inc | インクジエツト記録ヘツドのインク噴射体積測定方法および測定装置 |
US5738165A (en) * | 1993-05-07 | 1998-04-14 | Nikon Corporation | Substrate holding apparatus |
US5403617A (en) * | 1993-09-15 | 1995-04-04 | Mobium Enterprises Corporation | Hybrid pulsed valve for thin film coating and method |
US5736195A (en) * | 1993-09-15 | 1998-04-07 | Mobium Enterprises Corporation | Method of coating a thin film on a substrate |
JPH07101062A (ja) * | 1993-09-30 | 1995-04-18 | Canon Inc | インクジェット記録装置及びその記録方法 |
JPH07323550A (ja) * | 1994-05-31 | 1995-12-12 | Canon Inc | インクジェットプリント装置の制御方法およびインクジェットプリント装置 |
JP3241251B2 (ja) * | 1994-12-16 | 2001-12-25 | キヤノン株式会社 | 電子放出素子の製造方法及び電子源基板の製造方法 |
US5920331A (en) * | 1995-04-12 | 1999-07-06 | Eastman Kodak Company | Method and apparatus for accurate control of temperature pulses in printing heads |
JPH091797A (ja) * | 1995-06-15 | 1997-01-07 | Toyo Electric Mfg Co Ltd | インクの着弾位置制御方法 |
WO1997013586A1 (en) * | 1995-10-13 | 1997-04-17 | Nordson Corporation | Flip chip underfill system and method |
JP3627078B2 (ja) * | 1995-12-22 | 2005-03-09 | 富士写真フイルム株式会社 | インクジェット装置 |
US5906683A (en) * | 1996-04-16 | 1999-05-25 | Applied Materials, Inc. | Lid assembly for semiconductor processing chamber |
US5681757A (en) * | 1996-04-29 | 1997-10-28 | Microfab Technologies, Inc. | Process for dispensing semiconductor die-bond adhesive using a printhead having a microjet array and the product produced by the process |
US5779971A (en) * | 1996-06-07 | 1998-07-14 | Hewlett-Packard Company | Solder jet printhead |
JP3349891B2 (ja) * | 1996-06-11 | 2002-11-25 | 富士通株式会社 | 圧電型インクジェットヘッドの駆動方法 |
JPH1050769A (ja) * | 1996-07-30 | 1998-02-20 | Toshiba Corp | 半導体パッケージの製造装置および製造方法 |
US5756157A (en) * | 1996-10-02 | 1998-05-26 | Silicon Valley Group | Method for processing flat panel displays and large wafers |
US6132809A (en) * | 1997-01-16 | 2000-10-17 | Precision Valve & Automation, Inc. | Conformal coating using multiple applications |
US6224180B1 (en) * | 1997-02-21 | 2001-05-01 | Gerald Pham-Van-Diep | High speed jet soldering system |
JPH10260307A (ja) * | 1997-03-17 | 1998-09-29 | Seiko Epson Corp | カラーフィルタの製造装置およびその方法 |
JPH10284360A (ja) * | 1997-04-02 | 1998-10-23 | Hitachi Ltd | 基板温度制御装置及び方法 |
TW421818B (en) * | 1997-07-04 | 2001-02-11 | Tokyo Electron Ltd | Process solution supplying apparatus |
JP3695150B2 (ja) * | 1997-07-08 | 2005-09-14 | セイコーエプソン株式会社 | インクジェット記録装置及びその駆動波形制御方法 |
US6193346B1 (en) * | 1997-07-22 | 2001-02-27 | Ricoh Company, Ltd. | Ink-jet recording apparatus |
JPH1158735A (ja) * | 1997-08-18 | 1999-03-02 | Nec Niigata Ltd | インクジェット記録装置 |
JPH11138820A (ja) * | 1997-09-05 | 1999-05-25 | Ricoh Co Ltd | 液滴の噴射特性測定方法およびシステム |
JPH1177991A (ja) * | 1997-09-12 | 1999-03-23 | Seiko Epson Corp | インクジェット記録装置 |
EP1027723B1 (en) * | 1997-10-14 | 2009-06-17 | Patterning Technologies Limited | Method of forming an electric capacitor |
JPH11157055A (ja) * | 1997-11-28 | 1999-06-15 | Sony Corp | インクジェットプリンタ、ならびにインクジェットプリンタ用記録ヘッドの駆動装置および方法 |
US6019164A (en) * | 1997-12-31 | 2000-02-01 | Temptronic Corporation | Workpiece chuck |
GB9808182D0 (en) * | 1998-04-17 | 1998-06-17 | The Technology Partnership Plc | Liquid projection apparatus |
JP3381776B2 (ja) * | 1998-05-19 | 2003-03-04 | 東京エレクトロン株式会社 | 処理装置および処理方法 |
JP3611177B2 (ja) * | 1998-07-22 | 2005-01-19 | セイコーエプソン株式会社 | インクジェット式記録装置及び記録方法 |
US6129872A (en) * | 1998-08-29 | 2000-10-10 | Jang; Justin | Process and apparatus for creating a colorful three-dimensional object |
JP2000071437A (ja) * | 1998-09-02 | 2000-03-07 | Ricoh Co Ltd | インクジェット記録装置及び記憶媒体並びに制御テーブル作成方法 |
US6190727B1 (en) * | 1998-10-30 | 2001-02-20 | Georgia-Pacific Corporation | Liquid coating spray applicator and method providing automatic spread rate control |
JP4468500B2 (ja) * | 1998-11-16 | 2010-05-26 | ブラザー工業株式会社 | 移動物体の検出方法及びその装置 |
US6318828B1 (en) * | 1999-02-19 | 2001-11-20 | Hewlett-Packard Company | System and method for controlling firing operations of an inkjet printhead |
US6209964B1 (en) * | 1999-03-03 | 2001-04-03 | Jose Pinto | Dump truck vibrator |
JP4208332B2 (ja) * | 1999-03-19 | 2009-01-14 | キヤノン株式会社 | インクジェットヘッドユニットの調整装置及び調整方法及びカラーフィルタの製造方法及び液晶表示パネルの製造方法 |
GB2350321A (en) * | 1999-05-27 | 2000-11-29 | Patterning Technologies Ltd | Method of forming a masking or spacer pattern on a substrate using inkjet droplet deposition |
US6849308B1 (en) * | 1999-05-27 | 2005-02-01 | Stuart Speakman | Method of forming a masking pattern on a surface |
ATE491576T1 (de) * | 1999-09-30 | 2011-01-15 | Seiko Epson Corp | Flüssigkeitsstrahlvorrichtung |
JP3446686B2 (ja) * | 1999-10-21 | 2003-09-16 | セイコーエプソン株式会社 | インクジェット式記録装置 |
US6420202B1 (en) * | 2000-05-16 | 2002-07-16 | Agere Systems Guardian Corp. | Method for shaping thin film resonators to shape acoustic modes therein |
US6596239B2 (en) * | 2000-12-12 | 2003-07-22 | Edc Biosystems, Inc. | Acoustically mediated fluid transfer methods and uses thereof |
-
2002
- 2002-05-31 EP EP02752022A patent/EP1569757A4/en not_active Withdrawn
- 2002-05-31 JP JP2003501605A patent/JP4328614B2/ja not_active Expired - Fee Related
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- 2002-05-31 JP JP2003502865A patent/JP2004528978A/ja active Pending
- 2002-05-31 WO PCT/US2002/017523 patent/WO2002098576A1/en active Application Filing
- 2002-05-31 AU AU2002346735A patent/AU2002346735A1/en not_active Abandoned
- 2002-05-31 CN CNA028133021A patent/CN1635949A/zh active Pending
- 2002-05-31 EP EP02739640A patent/EP1392449B1/en not_active Expired - Lifetime
- 2002-05-31 CN CNB028111397A patent/CN1289207C/zh not_active Expired - Fee Related
- 2002-05-31 CN CNB028148223A patent/CN1329130C/zh not_active Expired - Fee Related
- 2002-05-31 KR KR1020097020246A patent/KR100998171B1/ko active IP Right Grant
- 2002-05-31 KR KR1020037015744A patent/KR100882520B1/ko active IP Right Grant
- 2002-05-31 EP EP02756113A patent/EP1399269B1/en not_active Expired - Lifetime
- 2002-05-31 DE DE60235458T patent/DE60235458D1/de not_active Expired - Lifetime
- 2002-05-31 KR KR10-2003-7015752A patent/KR20040024558A/ko not_active Application Discontinuation
- 2002-05-31 KR KR1020037015742A patent/KR100924002B1/ko active IP Right Grant
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5505777A (en) * | 1992-11-19 | 1996-04-09 | Asymptotic Technologies, Inc. | Computer controlled viscous fluid dispensing system |
US5498444A (en) * | 1994-02-28 | 1996-03-12 | Microfab Technologies, Inc. | Method for producing micro-optical components |
US5932012A (en) * | 1995-06-23 | 1999-08-03 | Hitachi Techno Engineering Co., Ltd. | Paste applicator having positioning means |
US6007631A (en) * | 1997-11-10 | 1999-12-28 | Speedline Technologies, Inc. | Multiple head dispensing system and method |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109890619A (zh) * | 2016-07-27 | 2019-06-14 | 哈佛学院院长及董事 | 用于声泳打印的设备和方法 |
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