WO2006064792A1 - 塗布装置、有機材料薄膜の形成方法、有機elパネル製造装置 - Google Patents
塗布装置、有機材料薄膜の形成方法、有機elパネル製造装置 Download PDFInfo
- Publication number
- WO2006064792A1 WO2006064792A1 PCT/JP2005/022853 JP2005022853W WO2006064792A1 WO 2006064792 A1 WO2006064792 A1 WO 2006064792A1 JP 2005022853 W JP2005022853 W JP 2005022853W WO 2006064792 A1 WO2006064792 A1 WO 2006064792A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating
- organic material
- laser irradiation
- coating apparatus
- ejector
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 129
- 238000000576 coating method Methods 0.000 title claims abstract description 129
- 239000011368 organic material Substances 0.000 title claims abstract description 76
- 239000010409 thin film Substances 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 238000010438 heat treatment Methods 0.000 abstract description 17
- 238000001816 cooling Methods 0.000 abstract description 13
- 239000000758 substrate Substances 0.000 description 20
- 230000005525 hole transport Effects 0.000 description 11
- 239000007788 liquid Substances 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000007723 transport mechanism Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
- H10K71/421—Thermal treatment, e.g. annealing in the presence of a solvent vapour using coherent electromagnetic radiation, e.g. laser annealing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
- B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
- B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
- B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
- H10K71/441—Thermal treatment, e.g. annealing in the presence of a solvent vapour in the presence of solvent vapors, e.g. solvent vapour annealing
Landscapes
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Coating Apparatus (AREA)
- Electroluminescent Light Sources (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006515469A JPWO2006064792A1 (ja) | 2004-12-14 | 2005-12-13 | 塗布装置、有機材料薄膜の形成方法、有機elパネル製造装置 |
CN2005800104156A CN1939095B (zh) | 2004-12-14 | 2005-12-13 | 涂敷装置、有机材料薄膜的形成方法、有机el面板制造装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004360720 | 2004-12-14 | ||
JP2004-360720 | 2004-12-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2006064792A1 true WO2006064792A1 (ja) | 2006-06-22 |
Family
ID=36587847
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/022853 WO2006064792A1 (ja) | 2004-12-14 | 2005-12-13 | 塗布装置、有機材料薄膜の形成方法、有機elパネル製造装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2006064792A1 (ja) |
KR (1) | KR20080110683A (ja) |
CN (1) | CN1939095B (ja) |
TW (1) | TWI400828B (ja) |
WO (1) | WO2006064792A1 (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008132472A (ja) * | 2006-10-27 | 2008-06-12 | Seiko Epson Corp | 液滴吐出装置の機能液加熱方法及び液滴吐出装置 |
JP2011136303A (ja) * | 2009-12-29 | 2011-07-14 | Seiko Epson Corp | 記録装置 |
JP2012079484A (ja) * | 2010-09-30 | 2012-04-19 | Toppan Printing Co Ltd | 有機エレクトロルミネッセンス素子及びその製造方法 |
CN102671822A (zh) * | 2011-03-07 | 2012-09-19 | 芝浦机械电子株式会社 | 膏涂敷装置以及膏涂敷方法 |
JP2013243334A (ja) * | 2012-04-26 | 2013-12-05 | Ricoh Co Ltd | 印刷パターン形成装置および印刷パターン形成方法 |
WO2014061493A1 (ja) | 2012-10-15 | 2014-04-24 | 住友化学株式会社 | 電子デバイスの製造方法 |
WO2016208597A1 (ja) * | 2015-06-22 | 2016-12-29 | 住友化学株式会社 | 有機電子素子の製造方法及び有機薄膜の形成方法 |
WO2016208596A1 (ja) * | 2015-06-22 | 2016-12-29 | 住友化学株式会社 | 有機電子素子の製造方法及び正孔注入層の形成方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101182226B1 (ko) | 2009-10-28 | 2012-09-12 | 삼성디스플레이 주식회사 | 도포 장치, 이의 도포 방법 및 이를 이용한 유기막 형성 방법 |
CN103154303B (zh) * | 2010-10-20 | 2016-01-06 | 株式会社爱发科 | 有机膜形成装置以及有机膜形成方法 |
JP5864141B2 (ja) * | 2011-06-16 | 2016-02-17 | 株式会社日立製作所 | 薄膜形成装置および薄膜形成方法 |
CN105501387A (zh) * | 2015-12-21 | 2016-04-20 | 李宏江 | 民用船艇节能提速方法和其实用装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003347049A (ja) * | 2002-05-30 | 2003-12-05 | Sharp Corp | 薄膜製造装置およびそれを用いて製造された有機エレクトロルミネッセンス素子 |
JP2004057928A (ja) * | 2002-07-29 | 2004-02-26 | Pioneer Electronic Corp | パターン形成材料の射出塗布装置及びパターン形成材料の射出塗布方法 |
JP2004237724A (ja) * | 2003-01-17 | 2004-08-26 | Konica Minolta Holdings Inc | 液体吐出装置 |
JP2004327357A (ja) * | 2003-04-28 | 2004-11-18 | Dainippon Printing Co Ltd | 機能性素子の製造方法およびその製造装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2764844B1 (fr) * | 1997-06-23 | 1999-08-06 | Gemplus Card Int | Reticulation d'encre u.v. |
JP3835111B2 (ja) * | 2000-04-07 | 2006-10-18 | セイコーエプソン株式会社 | 膜の形成方法および有機エレクトロルミネッセンス素子の製造方法 |
JP4810032B2 (ja) * | 2000-09-29 | 2011-11-09 | セーレン株式会社 | 着色立体模様形成装置、着色立体模様形成方法、および着色立体模様形成物 |
EP1399268B1 (en) * | 2001-06-01 | 2012-10-31 | Ulvac, Inc. | Industrial microdeposition system for polymer light emitting diode displays, printed circuit boards and the like |
JP4413535B2 (ja) * | 2002-09-19 | 2010-02-10 | 大日本印刷株式会社 | インクジェット法による有機el表示装置及びカラーフィルターの製造方法、製造装置 |
JP4309688B2 (ja) * | 2003-03-20 | 2009-08-05 | セーレン株式会社 | 紫外線硬化型インクジェット記録装置 |
KR101115291B1 (ko) * | 2003-04-25 | 2012-03-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 액적 토출 장치, 패턴의 형성 방법, 및 반도체 장치의 제조 방법 |
TWI225008B (en) * | 2003-12-31 | 2004-12-11 | Ritdisplay Corp | Ink-jet printing apparatus |
-
2005
- 2005-12-13 WO PCT/JP2005/022853 patent/WO2006064792A1/ja active Application Filing
- 2005-12-13 KR KR1020087028043A patent/KR20080110683A/ko active Search and Examination
- 2005-12-13 JP JP2006515469A patent/JPWO2006064792A1/ja active Pending
- 2005-12-13 CN CN2005800104156A patent/CN1939095B/zh not_active Expired - Fee Related
- 2005-12-14 TW TW094144354A patent/TWI400828B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003347049A (ja) * | 2002-05-30 | 2003-12-05 | Sharp Corp | 薄膜製造装置およびそれを用いて製造された有機エレクトロルミネッセンス素子 |
JP2004057928A (ja) * | 2002-07-29 | 2004-02-26 | Pioneer Electronic Corp | パターン形成材料の射出塗布装置及びパターン形成材料の射出塗布方法 |
JP2004237724A (ja) * | 2003-01-17 | 2004-08-26 | Konica Minolta Holdings Inc | 液体吐出装置 |
JP2004327357A (ja) * | 2003-04-28 | 2004-11-18 | Dainippon Printing Co Ltd | 機能性素子の製造方法およびその製造装置 |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008132472A (ja) * | 2006-10-27 | 2008-06-12 | Seiko Epson Corp | 液滴吐出装置の機能液加熱方法及び液滴吐出装置 |
US8360562B2 (en) | 2006-10-27 | 2013-01-29 | Seiko Epson Corporation | Droplet discharging device and method for heating functional liquid thereof |
JP2011136303A (ja) * | 2009-12-29 | 2011-07-14 | Seiko Epson Corp | 記録装置 |
JP2012079484A (ja) * | 2010-09-30 | 2012-04-19 | Toppan Printing Co Ltd | 有機エレクトロルミネッセンス素子及びその製造方法 |
CN102671822A (zh) * | 2011-03-07 | 2012-09-19 | 芝浦机械电子株式会社 | 膏涂敷装置以及膏涂敷方法 |
JP2013243334A (ja) * | 2012-04-26 | 2013-12-05 | Ricoh Co Ltd | 印刷パターン形成装置および印刷パターン形成方法 |
WO2014061493A1 (ja) | 2012-10-15 | 2014-04-24 | 住友化学株式会社 | 電子デバイスの製造方法 |
US9437821B2 (en) | 2012-10-15 | 2016-09-06 | Sumitomo Chemical Company, Limited | Method for manufacturing electronic device |
WO2016208597A1 (ja) * | 2015-06-22 | 2016-12-29 | 住友化学株式会社 | 有機電子素子の製造方法及び有機薄膜の形成方法 |
WO2016208596A1 (ja) * | 2015-06-22 | 2016-12-29 | 住友化学株式会社 | 有機電子素子の製造方法及び正孔注入層の形成方法 |
JPWO2016208597A1 (ja) * | 2015-06-22 | 2018-04-05 | 住友化学株式会社 | 有機電子素子の製造方法及び有機薄膜の形成方法 |
JPWO2016208596A1 (ja) * | 2015-06-22 | 2018-04-05 | 住友化学株式会社 | 有機電子素子の製造方法及び正孔注入層の形成方法 |
US10333067B2 (en) | 2015-06-22 | 2019-06-25 | Sumitomo Chemical Company, Limited | Method for manufacturing organic electronic element, and method for forming electron hole injection layer |
Also Published As
Publication number | Publication date |
---|---|
TWI400828B (zh) | 2013-07-01 |
CN1939095B (zh) | 2010-12-08 |
JPWO2006064792A1 (ja) | 2008-06-12 |
KR20080110683A (ko) | 2008-12-18 |
CN1939095A (zh) | 2007-03-28 |
TW200633589A (en) | 2006-09-16 |
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