TW200633589A - Coating apparatus, organic material thin film forming method and organic EL panel manufacturing apparatus - Google Patents

Coating apparatus, organic material thin film forming method and organic EL panel manufacturing apparatus

Info

Publication number
TW200633589A
TW200633589A TW094144354A TW94144354A TW200633589A TW 200633589 A TW200633589 A TW 200633589A TW 094144354 A TW094144354 A TW 094144354A TW 94144354 A TW94144354 A TW 94144354A TW 200633589 A TW200633589 A TW 200633589A
Authority
TW
Taiwan
Prior art keywords
thin film
organic
organic material
axis direction
film forming
Prior art date
Application number
TW094144354A
Other languages
Chinese (zh)
Other versions
TWI400828B (en
Inventor
Toshio Negishi
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of TW200633589A publication Critical patent/TW200633589A/en
Application granted granted Critical
Publication of TWI400828B publication Critical patent/TWI400828B/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/421—Thermal treatment, e.g. annealing in the presence of a solvent vapour using coherent electromagnetic radiation, e.g. laser annealing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J11/00—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
    • B41J11/0015—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
    • B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
    • B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/441—Thermal treatment, e.g. annealing in the presence of a solvent vapour in the presence of solvent vapors, e.g. solvent vapour annealing

Abstract

A coating apparatus which does not require a heating chamber nor a cooling chamber is provided. An object 14 to be coated moves in an X axis direction, and on the object, an ejector 31 and laser irradiation apparatuses (32a, 32b), which can be reciprocated in a Y axis direction, are arranged. An organic material ejected on a part of the surface of the object 14 from the ejector 31 is irradiated with laser beams, dried or polymerized by heating, and formed into a thin film. Moving of the ejector 31 and the laser irradiation apparatuses (32a, 32b) in the Y axis direction and moving of the object 14 in the X axis direction are repeatedly performed, and a thin film made of the organic material is formed on a specific region of the object 14. Since coating and laser beam irradiation can be performed synchronously, operation efficiency is high. Further, since the temperature of the object 14 does not become high, a cooling process is not required.
TW094144354A 2004-12-14 2005-12-14 Coating apparatus, a method of forming a thin film of an organic material, organic electroluminescent panel manufacturing apparatus TWI400828B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004360720 2004-12-14

Publications (2)

Publication Number Publication Date
TW200633589A true TW200633589A (en) 2006-09-16
TWI400828B TWI400828B (en) 2013-07-01

Family

ID=36587847

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094144354A TWI400828B (en) 2004-12-14 2005-12-14 Coating apparatus, a method of forming a thin film of an organic material, organic electroluminescent panel manufacturing apparatus

Country Status (5)

Country Link
JP (1) JPWO2006064792A1 (en)
KR (1) KR20080110683A (en)
CN (1) CN1939095B (en)
TW (1) TWI400828B (en)
WO (1) WO2006064792A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008132472A (en) * 2006-10-27 2008-06-12 Seiko Epson Corp Method of heating functional liquid in droplet ejection apparatus and droplet ejection apparatus
KR101182226B1 (en) 2009-10-28 2012-09-12 삼성디스플레이 주식회사 Coating apparatus, coating method thereof, and method for making organic film using the same
JP2011136303A (en) * 2009-12-29 2011-07-14 Seiko Epson Corp Recording apparatus
JP2012079484A (en) * 2010-09-30 2012-04-19 Toppan Printing Co Ltd Organic electroluminescent element and manufacturing method thereof
JP5619175B2 (en) * 2010-10-20 2014-11-05 株式会社アルバック Organic film formation method
KR101364661B1 (en) * 2011-03-07 2014-02-19 시바우라 메카트로닉스 가부시끼가이샤 Apparatus for applying paste and method of applying paste
JP5864141B2 (en) * 2011-06-16 2016-02-17 株式会社日立製作所 Thin film forming apparatus and thin film forming method
JP2013243334A (en) * 2012-04-26 2013-12-05 Ricoh Co Ltd Print pattern forming device and print pattern forming method
JP6296701B2 (en) 2012-10-15 2018-03-20 住友化学株式会社 Manufacturing method of electronic device
CN107710874A (en) * 2015-06-22 2018-02-16 住友化学株式会社 The manufacture method of organic electronic element and the forming method of organic film
CN107710876A (en) * 2015-06-22 2018-02-16 住友化学株式会社 The manufacture method of organic electronic element and the forming method of hole injection layer
CN105501387A (en) * 2015-12-21 2016-04-20 李宏江 Civil ship energy-efficient speed increasing methods and practical devices adopting methods

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2764844B1 (en) * 1997-06-23 1999-08-06 Gemplus Card Int U.V. INK CROSSLINKING
JP3835111B2 (en) * 2000-04-07 2006-10-18 セイコーエプソン株式会社 Film forming method and organic electroluminescent device manufacturing method
JP4810032B2 (en) * 2000-09-29 2011-11-09 セーレン株式会社 Colored three-dimensional pattern forming apparatus, colored three-dimensional pattern forming method, and colored three-dimensional pattern formed product
AU2002346740A1 (en) * 2001-06-01 2002-12-16 Litrex Corporation Interchangeable microdeposition head apparatus and method
JP4354674B2 (en) * 2002-05-30 2009-10-28 シャープ株式会社 Thin film manufacturing equipment
JP2004057928A (en) * 2002-07-29 2004-02-26 Pioneer Electronic Corp Injection coating device for pattern forming material and injection coating method of pattern forming material
JP4413535B2 (en) * 2002-09-19 2010-02-10 大日本印刷株式会社 Organic EL display device by inkjet method, color filter manufacturing method, manufacturing device
JP4586365B2 (en) * 2003-01-17 2010-11-24 コニカミノルタホールディングス株式会社 Liquid ejection device
JP4309688B2 (en) * 2003-03-20 2009-08-05 セーレン株式会社 UV curable inkjet recording device
JP4731913B2 (en) * 2003-04-25 2011-07-27 株式会社半導体エネルギー研究所 Pattern forming method and semiconductor device manufacturing method
JP4486316B2 (en) * 2003-04-28 2010-06-23 大日本印刷株式会社 Functional element manufacturing method and manufacturing apparatus thereof
TWI225008B (en) * 2003-12-31 2004-12-11 Ritdisplay Corp Ink-jet printing apparatus

Also Published As

Publication number Publication date
TWI400828B (en) 2013-07-01
JPWO2006064792A1 (en) 2008-06-12
CN1939095A (en) 2007-03-28
CN1939095B (en) 2010-12-08
WO2006064792A1 (en) 2006-06-22
KR20080110683A (en) 2008-12-18

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