KR100843914B1 - 광 조사 장치 - Google Patents
광 조사 장치 Download PDFInfo
- Publication number
- KR100843914B1 KR100843914B1 KR1020070118209A KR20070118209A KR100843914B1 KR 100843914 B1 KR100843914 B1 KR 100843914B1 KR 1020070118209 A KR1020070118209 A KR 1020070118209A KR 20070118209 A KR20070118209 A KR 20070118209A KR 100843914 B1 KR100843914 B1 KR 100843914B1
- Authority
- KR
- South Korea
- Prior art keywords
- light
- lens
- integrator
- lens group
- light source
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
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- Epidemiology (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Microscoopes, Condenser (AREA)
Abstract
Description
Claims (1)
- 램프와 집광경을 사용한 광원으로부터 출사된 광을, 제1 평면경에서 반사시켜, 광 입사측의 렌즈군과 광 출사측의 렌즈군을 광축 방향으로 이간하여 배치한 인테그레이터 렌즈를 통해서, 피조사물에 조사하는 광 조사 장치에 있어서,광이 조사되는 조사 영역의 크기가 상이한 복수의 인테그레이터 렌즈와,상기 복수의 인테그레이터 렌즈를, 상기 광 조사 장치의 광로 중에 선택적으로 삽입하는 인테그레이터 렌즈 교환 수단과,상기 광원과 제1 평면경 사이의 광로 내에 삽입되어, 광원으로부터의 광을 차광하고, 상기 인테그레이터 렌즈의 광 입사측의 렌즈군에 입사하는 광의 집광각을 변경하는 차광 수단과,조사 영역이 좁은 인테그레이터 렌즈를 상기 광로 중에 삽입할 때에는, 상기 차광 수단을 상기 광원과 제1 평면경 사이의 광로 내인 집광경의 개구 주변부에 삽입하고, 조사 영역이 넓은 인테그레이터 렌즈를 상기 광로 중에 삽입할 때에는, 상기 차광 수단을 상기 광원과 제1 평면경 사이의 광로 내인 집광경의 개구 주변부로부터 퇴피시키는 수단을 구비한 것을 특징으로 하는 광 조사 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004104902A JP4470558B2 (ja) | 2004-03-31 | 2004-03-31 | 光照射装置 |
JPJP-P-2004-00104902 | 2004-03-31 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040111993A Division KR100828259B1 (ko) | 2004-03-31 | 2004-12-24 | 광 조사 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080005155A KR20080005155A (ko) | 2008-01-10 |
KR100843914B1 true KR100843914B1 (ko) | 2008-07-03 |
Family
ID=35325336
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040111993A KR100828259B1 (ko) | 2004-03-31 | 2004-12-24 | 광 조사 장치 |
KR1020070118210A KR100859400B1 (ko) | 2004-03-31 | 2007-11-20 | 광 조사 장치 |
KR1020070118209A KR100843914B1 (ko) | 2004-03-31 | 2007-11-20 | 광 조사 장치 |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040111993A KR100828259B1 (ko) | 2004-03-31 | 2004-12-24 | 광 조사 장치 |
KR1020070118210A KR100859400B1 (ko) | 2004-03-31 | 2007-11-20 | 광 조사 장치 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4470558B2 (ko) |
KR (3) | KR100828259B1 (ko) |
TW (1) | TWI276926B (ko) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4879085B2 (ja) * | 2007-05-17 | 2012-02-15 | 株式会社日立ハイテクノロジーズ | 露光装置 |
JP5057382B2 (ja) * | 2007-12-18 | 2012-10-24 | Nskテクノロジー株式会社 | 露光装置及び基板の製造方法 |
US8908151B2 (en) | 2008-02-14 | 2014-12-09 | Nikon Corporation | Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system |
JP5180677B2 (ja) * | 2008-05-14 | 2013-04-10 | 三洋電機株式会社 | 照明装置及びこれを用いた投写型映像表示装置 |
JP5604813B2 (ja) * | 2009-06-15 | 2014-10-15 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
JP5644101B2 (ja) * | 2009-12-22 | 2014-12-24 | 株式会社ブイ・テクノロジー | 露光装置 |
WO2012011497A1 (ja) * | 2010-07-22 | 2012-01-26 | Nskテクノロジー株式会社 | 露光装置用光照射装置、光照射装置の制御方法、露光装置及び露光方法 |
JP5799306B2 (ja) * | 2010-07-22 | 2015-10-21 | 株式会社ブイ・テクノロジー | 露光装置用光照射装置の制御方法、及び露光方法 |
KR101712299B1 (ko) * | 2012-10-27 | 2017-03-13 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 노광 장치의 조명 시스템 |
JP6362095B2 (ja) * | 2014-06-17 | 2018-07-25 | キヤノン株式会社 | 照明装置、露光装置、調整方法、及び、物品の製造方法 |
JP5756242B1 (ja) * | 2015-02-16 | 2015-07-29 | フェニックス電機株式会社 | 露光装置の設計方法 |
CN107807494B (zh) * | 2016-09-09 | 2021-05-11 | 佳能株式会社 | 照明光学系统、曝光装置以及物品制造方法 |
JP2018045060A (ja) * | 2016-09-13 | 2018-03-22 | キヤノン株式会社 | 照明装置、露光装置及び物品の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2759890B2 (ja) * | 1989-11-24 | 1998-05-28 | ウシオ電機株式会社 | 露光装置 |
KR20030077388A (ko) * | 2002-03-25 | 2003-10-01 | 우시오덴키 가부시키가이샤 | 광 조사 장치 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08305035A (ja) * | 1995-03-08 | 1996-11-22 | Matsushita Electric Ind Co Ltd | 照明装置およびこれを用いた露光方法 |
JP2001174910A (ja) | 1999-12-20 | 2001-06-29 | Fujitsu General Ltd | 液晶プロジェクタ装置 |
JP2003076030A (ja) | 2001-09-06 | 2003-03-14 | Hitachi Electronics Eng Co Ltd | 露光装置における光照射装置 |
US6577429B1 (en) | 2002-01-15 | 2003-06-10 | Eastman Kodak Company | Laser projection display system |
-
2004
- 2004-03-31 JP JP2004104902A patent/JP4470558B2/ja not_active Expired - Fee Related
- 2004-11-24 TW TW093136167A patent/TWI276926B/zh not_active IP Right Cessation
- 2004-12-24 KR KR1020040111993A patent/KR100828259B1/ko active IP Right Grant
-
2007
- 2007-11-20 KR KR1020070118210A patent/KR100859400B1/ko active IP Right Grant
- 2007-11-20 KR KR1020070118209A patent/KR100843914B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2759890B2 (ja) * | 1989-11-24 | 1998-05-28 | ウシオ電機株式会社 | 露光装置 |
KR20030077388A (ko) * | 2002-03-25 | 2003-10-01 | 우시오덴키 가부시키가이샤 | 광 조사 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR100828259B1 (ko) | 2008-05-07 |
JP4470558B2 (ja) | 2010-06-02 |
TWI276926B (en) | 2007-03-21 |
KR20080005156A (ko) | 2008-01-10 |
KR100859400B1 (ko) | 2008-09-22 |
JP2005292316A (ja) | 2005-10-20 |
KR20080005155A (ko) | 2008-01-10 |
TW200532255A (en) | 2005-10-01 |
KR20050096832A (ko) | 2005-10-06 |
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