JP4470558B2 - 光照射装置 - Google Patents

光照射装置 Download PDF

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Publication number
JP4470558B2
JP4470558B2 JP2004104902A JP2004104902A JP4470558B2 JP 4470558 B2 JP4470558 B2 JP 4470558B2 JP 2004104902 A JP2004104902 A JP 2004104902A JP 2004104902 A JP2004104902 A JP 2004104902A JP 4470558 B2 JP4470558 B2 JP 4470558B2
Authority
JP
Japan
Prior art keywords
light
lens
integrator
lens group
side lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004104902A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005292316A (ja
Inventor
理 大澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP2004104902A priority Critical patent/JP4470558B2/ja
Priority to TW093136167A priority patent/TWI276926B/zh
Priority to KR1020040111993A priority patent/KR100828259B1/ko
Publication of JP2005292316A publication Critical patent/JP2005292316A/ja
Priority to KR1020070118209A priority patent/KR100843914B1/ko
Priority to KR1020070118210A priority patent/KR100859400B1/ko
Application granted granted Critical
Publication of JP4470558B2 publication Critical patent/JP4470558B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
JP2004104902A 2004-03-31 2004-03-31 光照射装置 Expired - Fee Related JP4470558B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004104902A JP4470558B2 (ja) 2004-03-31 2004-03-31 光照射装置
TW093136167A TWI276926B (en) 2004-03-31 2004-11-24 Light irradiating apparatus
KR1020040111993A KR100828259B1 (ko) 2004-03-31 2004-12-24 광 조사 장치
KR1020070118209A KR100843914B1 (ko) 2004-03-31 2007-11-20 광 조사 장치
KR1020070118210A KR100859400B1 (ko) 2004-03-31 2007-11-20 광 조사 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004104902A JP4470558B2 (ja) 2004-03-31 2004-03-31 光照射装置

Publications (2)

Publication Number Publication Date
JP2005292316A JP2005292316A (ja) 2005-10-20
JP4470558B2 true JP4470558B2 (ja) 2010-06-02

Family

ID=35325336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004104902A Expired - Fee Related JP4470558B2 (ja) 2004-03-31 2004-03-31 光照射装置

Country Status (3)

Country Link
JP (1) JP4470558B2 (ko)
KR (3) KR100828259B1 (ko)
TW (1) TWI276926B (ko)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4879085B2 (ja) * 2007-05-17 2012-02-15 株式会社日立ハイテクノロジーズ 露光装置
JP5057382B2 (ja) * 2007-12-18 2012-10-24 Ｎｓｋテクノロジー株式会社 露光装置及び基板の製造方法
US8908151B2 (en) 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
JP5180677B2 (ja) * 2008-05-14 2013-04-10 三洋電機株式会社 照明装置及びこれを用いた投写型映像表示装置
JP5604813B2 (ja) * 2009-06-15 2014-10-15 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP5644101B2 (ja) * 2009-12-22 2014-12-24 株式会社ブイ・テクノロジー 露光装置
JP5799306B2 (ja) * 2010-07-22 2015-10-21 株式会社ブイ・テクノロジー 露光装置用光照射装置の制御方法、及び露光方法
WO2012011497A1 (ja) * 2010-07-22 2012-01-26 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置、光照射装置の制御方法、露光装置及び露光方法
KR101712299B1 (ko) * 2012-10-27 2017-03-13 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 노광 장치의 조명 시스템
JP6362095B2 (ja) * 2014-06-17 2018-07-25 キヤノン株式会社 照明装置、露光装置、調整方法、及び、物品の製造方法
JP5756242B1 (ja) * 2015-02-16 2015-07-29 フェニックス電機株式会社 露光装置の設計方法
CN107807494B (zh) * 2016-09-09 2021-05-11 佳能株式会社 照明光学系统、曝光装置以及物品制造方法
JP2018045060A (ja) * 2016-09-13 2018-03-22 キヤノン株式会社 照明装置、露光装置及び物品の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2759890B2 (ja) * 1989-11-24 1998-05-28 ウシオ電機株式会社 露光装置
JPH08305035A (ja) * 1995-03-08 1996-11-22 Matsushita Electric Ind Co Ltd 照明装置およびこれを用いた露光方法
JP2001174910A (ja) 1999-12-20 2001-06-29 Fujitsu General Ltd 液晶プロジェクタ装置
JP2003076030A (ja) 2001-09-06 2003-03-14 Hitachi Electronics Eng Co Ltd 露光装置における光照射装置
US6577429B1 (en) 2002-01-15 2003-06-10 Eastman Kodak Company Laser projection display system
JP2003282412A (ja) * 2002-03-25 2003-10-03 Ushio Inc 光照射装置

Also Published As

Publication number Publication date
KR20050096832A (ko) 2005-10-06
TWI276926B (en) 2007-03-21
JP2005292316A (ja) 2005-10-20
KR20080005156A (ko) 2008-01-10
TW200532255A (en) 2005-10-01
KR100843914B1 (ko) 2008-07-03
KR100828259B1 (ko) 2008-05-07
KR20080005155A (ko) 2008-01-10
KR100859400B1 (ko) 2008-09-22

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