KR100816746B1 - 자기 메모리 셀 - Google Patents

자기 메모리 셀 Download PDF

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Publication number
KR100816746B1
KR100816746B1 KR1020020017756A KR20020017756A KR100816746B1 KR 100816746 B1 KR100816746 B1 KR 100816746B1 KR 1020020017756 A KR1020020017756 A KR 1020020017756A KR 20020017756 A KR20020017756 A KR 20020017756A KR 100816746 B1 KR100816746 B1 KR 100816746B1
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KR
South Korea
Prior art keywords
ferromagnetic
layer
cladding
read
write
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Expired - Fee Related
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KR1020020017756A
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English (en)
Korean (ko)
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KR20030009094A (ko
Inventor
안토니토마스씨
샤르마매니쉬
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삼성전자주식회사
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/14Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
    • G11C11/15Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Hall/Mr Elements (AREA)
  • Semiconductor Memories (AREA)
KR1020020017756A 2001-04-02 2002-04-01 자기 메모리 셀 Expired - Fee Related KR100816746B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/825,461 US6404674B1 (en) 2001-04-02 2001-04-02 Cladded read-write conductor for a pinned-on-the-fly soft reference layer
US09/825,461 2001-04-02

Publications (2)

Publication Number Publication Date
KR20030009094A KR20030009094A (ko) 2003-01-29
KR100816746B1 true KR100816746B1 (ko) 2008-03-26

Family

ID=25244051

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020017756A Expired - Fee Related KR100816746B1 (ko) 2001-04-02 2002-04-01 자기 메모리 셀

Country Status (6)

Country Link
US (1) US6404674B1 (enExample)
EP (1) EP1248265A3 (enExample)
JP (1) JP3942931B2 (enExample)
KR (1) KR100816746B1 (enExample)
CN (1) CN1329916C (enExample)
TW (1) TW541530B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101001742B1 (ko) * 2003-10-24 2010-12-15 삼성전자주식회사 자기 램 및 그 제조방법

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US6545906B1 (en) 2001-10-16 2003-04-08 Motorola, Inc. Method of writing to scalable magnetoresistance random access memory element
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US6552554B1 (en) * 2001-12-06 2003-04-22 The United States Of America As Represented By The Secretary Of The Navy Testing current perpendicular to plane giant magnetoresistance multilayer devices
US6750491B2 (en) * 2001-12-20 2004-06-15 Hewlett-Packard Development Company, L.P. Magnetic memory device having soft reference layer
US6593608B1 (en) * 2002-03-15 2003-07-15 Hewlett-Packard Development Company, L.P. Magneto resistive storage device having double tunnel junction
US6728132B2 (en) * 2002-04-03 2004-04-27 Micron Technology, Inc. Synthetic-ferrimagnet sense-layer for high density MRAM applications
US6780653B2 (en) * 2002-06-06 2004-08-24 Micron Technology, Inc. Methods of forming magnetoresistive memory device assemblies
US6707087B2 (en) 2002-06-21 2004-03-16 Hewlett-Packard Development Company, L.P. Structure of chalcogenide memory element
US6683815B1 (en) * 2002-06-26 2004-01-27 Silicon Magnetic Systems Magnetic memory cell and method for assigning tunable writing currents
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US7095646B2 (en) 2002-07-17 2006-08-22 Freescale Semiconductor, Inc. Multi-state magnetoresistance random access cell with improved memory storage density
US6885576B2 (en) * 2002-08-13 2005-04-26 Micron Technology, Inc. Closed flux magnetic memory
US6924539B2 (en) * 2002-08-30 2005-08-02 Hewlett-Packard Development Company, L.P. Magnetic memory cell having an annular data layer and a soft reference layer
US6577529B1 (en) * 2002-09-03 2003-06-10 Hewlett-Packard Development Company, L.P. Multi-bit magnetic memory device
US6801451B2 (en) * 2002-09-03 2004-10-05 Hewlett-Packard Development Company, L.P. Magnetic memory devices having multiple bits per memory cell
JP3788964B2 (ja) * 2002-09-10 2006-06-21 株式会社東芝 磁気ランダムアクセスメモリ
JP4596230B2 (ja) * 2002-09-13 2010-12-08 Tdk株式会社 磁気メモリデバイスおよびその製造方法
JP4404182B2 (ja) * 2002-09-25 2010-01-27 Tdk株式会社 磁気メモリデバイスおよびその読出方法
JP2004153181A (ja) * 2002-10-31 2004-05-27 Toshiba Corp 磁気抵抗効果素子および磁気メモリ
US6740947B1 (en) * 2002-11-13 2004-05-25 Hewlett-Packard Development Company, L.P. MRAM with asymmetric cladded conductor
JP3906145B2 (ja) * 2002-11-22 2007-04-18 株式会社東芝 磁気ランダムアクセスメモリ
KR20050084340A (ko) * 2002-12-18 2005-08-26 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 집적 회로 장치, 집적 회로 메모리 장치 및 안티-탬퍼 장치
JP4365591B2 (ja) * 2003-01-17 2009-11-18 Tdk株式会社 磁気メモリデバイスおよび書込電流駆動回路、並びに書込電流駆動方法
JP4720067B2 (ja) * 2003-01-24 2011-07-13 Tdk株式会社 磁気記憶セルおよび磁気メモリデバイスならびに磁気メモリデバイスの製造方法
US6982901B1 (en) * 2003-01-31 2006-01-03 Hewlett-Packard Development Company, L.P. Memory device and method of use
US7056749B2 (en) * 2003-03-03 2006-06-06 Hewlett-Packard Development Company, L.P. Simplified magnetic memory cell
JP4419408B2 (ja) * 2003-03-14 2010-02-24 Tdk株式会社 磁気抵抗効果素子および磁気メモリデバイス
US20040184311A1 (en) * 2003-03-18 2004-09-23 Manish Sharma Magnetic sensor
US6950919B2 (en) * 2003-03-26 2005-09-27 Hewlett-Packard Development Company, L.P. Computer system with operating system to dynamically adjust the main memory
JP4729836B2 (ja) * 2003-03-28 2011-07-20 Tdk株式会社 磁気記憶セルおよび磁気メモリデバイスならびに磁気メモリデバイスの製造方法
AU2003219639A1 (en) * 2003-04-16 2004-11-04 Agency For Science, Technology And Research Magnetic memory device
US6785160B1 (en) 2003-04-29 2004-08-31 Hewlett-Packard Development Company, L.P. Method of providing stability of a magnetic memory cell
US7020009B2 (en) * 2003-05-14 2006-03-28 Macronix International Co., Ltd. Bistable magnetic device using soft magnetic intermediary material
US6865107B2 (en) * 2003-06-23 2005-03-08 Hewlett-Packard Development Company, L.P. Magnetic memory device
US6956763B2 (en) 2003-06-27 2005-10-18 Freescale Semiconductor, Inc. MRAM element and methods for writing the MRAM element
US6906941B2 (en) * 2003-07-22 2005-06-14 Hewlett-Packard Development Company, L.P. Magnetic memory structure
US6967366B2 (en) 2003-08-25 2005-11-22 Freescale Semiconductor, Inc. Magnetoresistive random access memory with reduced switching field variation
US6925003B2 (en) * 2003-09-08 2005-08-02 Hewlett-Packard Development Company, L.P. Magnetic memory cell structure
US6990012B2 (en) * 2003-10-07 2006-01-24 Hewlett-Packard Development Company, L.P. Magnetic memory device
JP4868431B2 (ja) * 2003-10-10 2012-02-01 Tdk株式会社 磁気記憶セルおよび磁気メモリデバイス
US6911685B2 (en) * 2003-10-10 2005-06-28 Hewlett-Packard Development Company, L.P. Thermally-assisted magnetic memory structures
US7195927B2 (en) * 2003-10-22 2007-03-27 Hewlett-Packard Development Company, L.P. Process for making magnetic memory structures having different-sized memory cell layers
US6819586B1 (en) 2003-10-24 2004-11-16 Hewlett-Packard Development Company, L.P. Thermally-assisted magnetic memory structures
US7026673B2 (en) * 2003-12-11 2006-04-11 International Business Machines Corporation Low magnetization materials for high performance magnetic memory devices
US6956271B2 (en) * 2004-02-11 2005-10-18 Hewlett-Packard Development Company, L.P. Switching of soft reference layers of magnetic memory devices
US7193889B2 (en) * 2004-02-11 2007-03-20 Hewlett-Packard Development Company, Lp. Switching of MRAM devices having soft magnetic reference layers
JP3977816B2 (ja) * 2004-03-16 2007-09-19 株式会社東芝 磁気ランダムアクセスメモリ及びその磁気ランダムアクセスメモリのデータ書き込み方法
US7102920B2 (en) * 2004-03-23 2006-09-05 Hewlett-Packard Development Company, L.P. Soft-reference three conductor magnetic memory storage device
US7102921B2 (en) * 2004-05-11 2006-09-05 Hewlett-Packard Development Company, L.P. Magnetic memory device
CN100495567C (zh) * 2004-10-28 2009-06-03 中国科学院物理研究所 外围电路平衡驱动的磁随机存取存储器
US7129098B2 (en) 2004-11-24 2006-10-31 Freescale Semiconductor, Inc. Reduced power magnetoresistive random access memory elements
WO2007015358A1 (ja) 2005-08-02 2007-02-08 Nec Corporation 磁気ランダムアクセスメモリ及びその動作方法
WO2007040189A1 (ja) * 2005-10-03 2007-04-12 Nec Corporation 磁気ランダムアクセスメモリ及びその動作方法
US7352613B2 (en) * 2005-10-21 2008-04-01 Macronix International Co., Ltd. Magnetic memory device and methods for making a magnetic memory device
US7457149B2 (en) 2006-05-05 2008-11-25 Macronix International Co., Ltd. Methods and apparatus for thermally assisted programming of a magnetic memory device
US7760542B2 (en) 2008-04-21 2010-07-20 Seagate Technology Llc Spin-torque memory with unidirectional write scheme
US8233319B2 (en) 2008-07-18 2012-07-31 Seagate Technology Llc Unipolar spin-transfer switching memory unit
US7933146B2 (en) 2008-10-08 2011-04-26 Seagate Technology Llc Electronic devices utilizing spin torque transfer to flip magnetic orientation
US7933137B2 (en) 2008-10-08 2011-04-26 Seagate Teachnology Llc Magnetic random access memory (MRAM) utilizing magnetic flip-flop structures
US7940592B2 (en) 2008-12-02 2011-05-10 Seagate Technology Llc Spin-torque bit cell with unpinned reference layer and unidirectional write current
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WO2000010172A2 (de) * 1998-08-12 2000-02-24 Infineon Technologies Ag Speicherzellenanordnung und verfahren zu deren herstellung
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Cited By (1)

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Publication number Priority date Publication date Assignee Title
KR101001742B1 (ko) * 2003-10-24 2010-12-15 삼성전자주식회사 자기 램 및 그 제조방법

Also Published As

Publication number Publication date
EP1248265A2 (en) 2002-10-09
JP2003007985A (ja) 2003-01-10
KR20030009094A (ko) 2003-01-29
US6404674B1 (en) 2002-06-11
JP3942931B2 (ja) 2007-07-11
TW541530B (en) 2003-07-11
CN1329916C (zh) 2007-08-01
CN1379408A (zh) 2002-11-13
EP1248265A3 (en) 2003-07-30

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