KR100810547B1 - 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법 - Google Patents

캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법 Download PDF

Info

Publication number
KR100810547B1
KR100810547B1 KR1020027017108A KR20027017108A KR100810547B1 KR 100810547 B1 KR100810547 B1 KR 100810547B1 KR 1020027017108 A KR1020027017108 A KR 1020027017108A KR 20027017108 A KR20027017108 A KR 20027017108A KR 100810547 B1 KR100810547 B1 KR 100810547B1
Authority
KR
South Korea
Prior art keywords
optical member
optical
delete delete
multiphoton
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020027017108A
Other languages
English (en)
Korean (ko)
Other versions
KR20030017995A (ko
Inventor
데보로버트제이.
레더데일캐서린앤
플록쟈크제프리엠.
플레밍패트릭알.
포츠존이.
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 캄파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 캄파니
Publication of KR20030017995A publication Critical patent/KR20030017995A/ko
Application granted granted Critical
Publication of KR100810547B1 publication Critical patent/KR100810547B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/30—Optical coupling means for use between fibre and thin-film device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/121—Channel; buried or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/12102—Lens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/12107—Grating
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12133—Functions
    • G02B2006/12147—Coupler
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12133—Functions
    • G02B2006/1215—Splitter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0484—Arranged to produce three-dimensional fringe pattern
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Integrated Circuits (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Graft Or Block Polymers (AREA)
  • Printing Plates And Materials Therefor (AREA)
KR1020027017108A 2000-06-15 2001-06-14 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법 Expired - Fee Related KR100810547B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21170900P 2000-06-15 2000-06-15
US60/211,709 2000-06-15
PCT/US2001/019243 WO2001096917A2 (en) 2000-06-15 2001-06-14 Multiphoton curing to provide encapsulated optical elements

Publications (2)

Publication Number Publication Date
KR20030017995A KR20030017995A (ko) 2003-03-04
KR100810547B1 true KR100810547B1 (ko) 2008-03-18

Family

ID=22788034

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027017108A Expired - Fee Related KR100810547B1 (ko) 2000-06-15 2001-06-14 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법

Country Status (6)

Country Link
US (3) US7014988B2 (enExample)
EP (1) EP1295179B1 (enExample)
JP (3) JP4786858B2 (enExample)
KR (1) KR100810547B1 (enExample)
AU (1) AU2001268465A1 (enExample)
WO (1) WO2001096917A2 (enExample)

Families Citing this family (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
KR100811017B1 (ko) * 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중방향성 광반응성 흡수 방법
AU2001268465A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
WO2001096961A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Multipass multiphoton absorption method and apparatus
US7217375B2 (en) * 2001-06-04 2007-05-15 Ophthonix, Inc. Apparatus and method of fabricating a compensating element for wavefront correction using spatially localized curing of resin mixtures
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US8119041B2 (en) * 2001-09-05 2012-02-21 Fujifilm Corporation Non-resonant two-photon absorption induction method and process for emitting light thereby
US7001708B1 (en) * 2001-11-28 2006-02-21 University Of Central Florida Research Foundation, Inc. Photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
US7582390B2 (en) * 2003-05-23 2009-09-01 Fujifilm Corporation Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method
US7771915B2 (en) * 2003-06-27 2010-08-10 Fujifilm Corporation Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method
JP2005092177A (ja) * 2003-09-12 2005-04-07 Rohm & Haas Electronic Materials Llc 光学部品形成方法
US7655376B2 (en) * 2003-12-05 2010-02-02 3M Innovative Properties Company Process for producing photonic crystals and controlled defects therein
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
AT413891B (de) 2003-12-29 2006-07-15 Austria Tech & System Tech Leiterplattenelement mit wenigstens einem licht-wellenleiter sowie verfahren zur herstellung eines solchen leiterplattenelements
US8071260B1 (en) * 2004-06-15 2011-12-06 Inphase Technologies, Inc. Thermoplastic holographic media
DE102004034975A1 (de) * 2004-07-16 2006-02-16 Carl Zeiss Jena Gmbh Verfahren zur Erfassung von Bildern einer Probe mit einem Mikroskop
US8597871B2 (en) 2005-06-18 2013-12-03 The Regents Of The University Of Colorado Three-dimensional direct-write lithography
US7583444B1 (en) * 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
JP4622878B2 (ja) * 2006-02-09 2011-02-02 株式会社豊田中央研究所 光導波路の製造方法
AT503585B1 (de) 2006-05-08 2007-11-15 Austria Tech & System Tech Leiterplattenelement sowie verfahren zu dessen herstellung
CN101448632B (zh) * 2006-05-18 2012-12-12 3M创新有限公司 用于制备具有提取结构的光导的方法以及由此方法生产的光导
EP2020656B1 (en) * 2006-05-24 2012-11-21 DIC Corporation Optical disk and ultraviolet-curable composition for optical disk
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US7960092B2 (en) * 2006-10-23 2011-06-14 Sony Corporation Method of recording in an optical information recording medium
US8376013B2 (en) 2008-03-11 2013-02-19 Duke University Plasmonic assisted systems and methods for interior energy-activation from an exterior source
JP4803609B2 (ja) * 2007-06-29 2011-10-26 株式会社豊田中央研究所 自己形成光導波路の製造方法
AT505834B1 (de) * 2007-09-21 2009-09-15 Austria Tech & System Tech Leiterplattenelement
KR100968490B1 (ko) 2008-07-31 2010-07-07 재단법인서울대학교산학협력재단 미세구조물 운반 방법 및 시스템
US8435701B2 (en) * 2007-11-27 2013-05-07 Southbourne Investments Ltd. Holographic recording medium
IL196690A0 (en) * 2008-05-29 2011-08-01 Plasan Sasa Ltd Interchangeable door
US20100221463A1 (en) * 2008-10-29 2010-09-02 Uti Limited Partnership Integrated Encapsulation for MEMS Devices
JP5162511B2 (ja) * 2009-03-25 2013-03-13 富士フイルム株式会社 非共鳴２光子吸収重合用組成物及びそれを用いた３次元光記録媒体
EP2243622A3 (en) * 2009-04-22 2015-06-03 Canon Kabushiki Kaisha Method for producing optical part
US20110021653A1 (en) * 2009-07-22 2011-01-27 Lixin Zheng Hydrogel compatible two-photon initiation system
ES2381808T3 (es) * 2009-11-03 2012-05-31 Bayer Materialscience Ag Formulaciones de fotopolímeros con módulo mecánico ajustable Guv
JP5308398B2 (ja) * 2010-05-11 2013-10-09 日東電工株式会社 光導波路形成用樹脂組成物およびそれを用いた光導波路
DE102010020158A1 (de) 2010-05-11 2011-11-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung sowie Verfahren zur Erzeugung dreidimensionaler Strukturen
US8882956B2 (en) * 2010-09-01 2014-11-11 The Boeing Company Composite structures using interpenetrating polymer network adhesives
WO2013002013A1 (ja) * 2011-06-27 2013-01-03 学校法人 慶應義塾 光導波路及びその製造方法
DE102012018635A1 (de) * 2012-09-21 2014-03-27 BIAS - Bremer Institut für angewandte Strahltechnik GmbH Verfahren zum Herstellen einer 3D-Struktur
EP2943830A1 (en) 2013-01-11 2015-11-18 Multiphoton Optics Gmbh Optical package and a process for its preparation
DE102013005565A1 (de) * 2013-03-28 2014-10-02 Karlsruher Institut für Technologie Herstellung von 3D-Freiform-Wellenleiterstrukturen
US9052597B2 (en) * 2013-04-04 2015-06-09 Humboldt-Universität Zu Berlin Methods and fabrication tools for fabricating optical devices
DE102013015933A1 (de) * 2013-09-19 2015-03-19 Carl Zeiss Microscopy Gmbh Hochauflösende Scanning-Mikroskopie
EP3077421B1 (en) 2013-12-06 2018-01-31 3M Innovative Properties Company Liquid photoreactive composition and method of fabricating structures
DE102014215061A1 (de) * 2014-07-31 2016-02-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Mikromechanische Komponente und Verfahren zu ihrer Herstellung
US9488789B1 (en) 2015-05-27 2016-11-08 Stmicroelectronics S.R.L. Electro-optic device with dichroic mirror and related methods
MX2017017030A (es) 2015-06-30 2018-05-17 Gillette Co Llc Estructuras polimericas de borde cortante y metodo de fabricacion de las mismas.
HK1220859A2 (zh) * 2016-02-29 2017-05-12 Master Dynamic Limited Liga制作工艺
US10562200B2 (en) 2016-06-28 2020-02-18 The Gillette Company Llc Polymeric cutting edge structures and method of manufacturing polymeric cutting edge structures
US10780599B2 (en) 2016-06-28 2020-09-22 The Gillette Company Llc Polymeric cutting edge structures and method of manufacturing polymeric cutting edge structures
JP6786332B2 (ja) 2016-09-29 2020-11-18 キヤノン株式会社 光造形装置、光造形方法および光造形プログラム
JP6833431B2 (ja) * 2016-09-29 2021-02-24 キヤノン株式会社 光造形装置、光造形方法および光造形プログラム
JP6849365B2 (ja) * 2016-09-29 2021-03-24 キヤノン株式会社 光造形装置、光造形方法および光造形プログラム
US10933579B2 (en) * 2017-03-10 2021-03-02 Prellis Biologics, Inc. Methods and systems for printing biological material
US11085018B2 (en) 2017-03-10 2021-08-10 Prellis Biologics, Inc. Three-dimensional printed organs, devices, and matrices
CN111032687A (zh) 2017-05-25 2020-04-17 普瑞利思生物制品公司 三维打印的器官、设备和基质
US10914901B2 (en) * 2017-10-17 2021-02-09 International Business Machines Corporation Lateral mounting of optoelectronic chips on organic substrate
CN108176570B (zh) * 2018-03-07 2022-12-06 浙江同梦通讯科技有限公司 用于光纤接头的固化机
WO2020028436A1 (en) 2018-07-31 2020-02-06 Prellis Biologics, Inc. Optically-induced auto-encapsulation
KR102644098B1 (ko) * 2019-03-12 2024-03-07 한국전자통신연구원 광 연결 장치 및 이를 이용한 광 연결 방법
PL237684B1 (pl) * 2019-05-21 2021-05-17 Politechnika Warszawska Wzorzec rozkładu współczynnika załamania
FR3099479B1 (fr) * 2019-07-30 2021-07-02 Centre Nat Rech Scient Procédé de fabrication d’un objet tridimensionnel, ou de modification de l’état de surface d’un objet préformé, par photo-polymérisation
CN112764159B (zh) * 2019-10-21 2023-06-16 杭州光粒科技有限公司 光波导元件及其制备方法以及全息光波导显示设备
NL2036255B1 (en) 2023-11-13 2025-05-23 Phix B V Method for adjusting the electromagnetic field distribution of an optical fiber, optical fiber and connectors obtained accordingly

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588664A (en) * 1983-08-24 1986-05-13 Polaroid Corporation Photopolymerizable compositions used in holograms

Family Cites Families (143)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2004A (en) * 1841-03-12 Improvement in the manner of constructing and propelling steam-vessels
US2007A (en) * 1841-03-16 Improvement in the mode of harvesting grain
US2003A (en) * 1841-03-12 Improvement in horizontal windivhlls
US3018262A (en) * 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
NL298323A (enExample) * 1959-12-24
US3758186A (en) * 1966-11-30 1973-09-11 Battelle Development Corp Method of copying holograms
US3635545A (en) * 1967-04-14 1972-01-18 Eastman Kodak Co Multiple beam generation
US4041476A (en) * 1971-07-23 1977-08-09 Wyn Kelly Swainson Method, medium and apparatus for producing three-dimensional figure product
US4238840A (en) * 1967-07-12 1980-12-09 Formigraphic Engine Corporation Method, medium and apparatus for producing three dimensional figure product
US3677634A (en) 1968-12-23 1972-07-18 Ibm Contactless mask pattern exposure process and apparatus system having virtual extended depth of focus
US3806221A (en) * 1969-11-26 1974-04-23 Siemens Ag Holographic method of recording and reproducing etching masks
US3720921A (en) * 1970-07-14 1973-03-13 Ibm Recording in reversible, photochromic medium
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3729313A (en) * 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3808006A (en) * 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) * 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4333165A (en) * 1975-01-27 1982-06-01 Formigraphic Engine Corporation Three-dimensional pattern making methods
US4466080A (en) * 1975-01-27 1984-08-14 Formigraphic Engine Corporation Three-dimensional patterned media
US4078229A (en) * 1975-01-27 1978-03-07 Swanson Wyn K Three dimensional systems
DE2546079A1 (de) 1975-10-15 1977-05-05 Leitz Ernst Gmbh Spiegelkondensor fuer mikroskope
US4471470A (en) * 1977-12-01 1984-09-11 Formigraphic Engine Corporation Method and media for accessing data in three dimensions
US4288861A (en) * 1977-12-01 1981-09-08 Formigraphic Engine Corporation Three-dimensional systems
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4228861A (en) * 1979-08-02 1980-10-21 Hart Thomas E Folding track removing implement
US4279717A (en) * 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4394433A (en) * 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4547037A (en) * 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
DE3204686A1 (de) 1982-02-11 1983-08-18 Fa. Carl Zeiss, 7920 Heidenheim Optisches system zur durchlichtmikroskopie bei auflichtbeleuchtung
US4458345A (en) * 1982-03-31 1984-07-03 International Business Machines Corporation Process for optical information storage
US4666236A (en) * 1982-08-10 1987-05-19 Omron Tateisi Electronics Co. Optical coupling device and method of producing same
JPS5929210A (ja) * 1982-08-10 1984-02-16 Omron Tateisi Electronics Co 光伝送結合装置の製造方法
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4496216A (en) * 1982-12-30 1985-01-29 Polaroid Corporation Method and apparatus for exposing photosensitive material
JPS60502125A (ja) * 1983-08-24 1985-12-05 ポラロイド　コ−ポレ−シヨン 光重合性組成物
JPS60247515A (ja) * 1984-05-23 1985-12-07 Oosakafu 光学的造形法
US4642126A (en) * 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) * 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
JPS6297791A (ja) 1985-10-25 1987-05-07 Nec Corp レ−ザマ−キング装置
CA1294470C (en) * 1986-07-26 1992-01-21 Toshihiro Suzuki Process for the production of optical elements
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4775754A (en) * 1987-10-07 1988-10-04 Minnesota Mining And Manufacturing Company Preparation of leuco dyes
CN1035213A (zh) * 1987-12-29 1989-08-30 精工电子工业株式会社 行波电机
US5434196A (en) 1988-02-19 1995-07-18 Asahi Denka Kogyo K.K. Resin composition for optical molding
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
US5098804A (en) * 1989-01-13 1992-03-24 E. I. Du Pont De Nemours And Company Multiplexer-demultiplexer for integrated optic circuit
GB8911454D0 (en) * 1989-05-18 1989-07-05 Pilkington Plc Hologram construction
US5037917A (en) * 1989-06-09 1991-08-06 The Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US5159038A (en) * 1989-06-09 1992-10-27 Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US5159037A (en) * 1989-06-09 1992-10-27 The Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US4963471A (en) * 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
US5034613A (en) * 1989-11-14 1991-07-23 Cornell Research Foundation, Inc. Two-photon laser microscopy
JPH03265804A (ja) * 1990-03-16 1991-11-26 Nippon Telegr & Teleph Corp <Ntt> 光導波路と光ファイバとの接続方法
CA2034400A1 (en) * 1990-04-30 1991-10-31 James Vincent Crivello Method for making triarylsulfonium hexafluorometal or metalloid salts
US5035476A (en) 1990-06-15 1991-07-30 Hamamatsu Photonics K.K. Confocal laser scanning transmission microscope
WO1992000185A1 (en) 1990-06-22 1992-01-09 Martin Russell Harris Optical waveguides
US5225918A (en) * 1990-07-18 1993-07-06 Sony Magnescale, Inc. Hologram scale, apparatus for making hologram scale, moving member having hologram scale assembled hologram scale and apparatus for making assembled hologram scale
US5145942A (en) * 1990-09-28 1992-09-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Methyl substituted polyimides containing carbonyl and ether connecting groups
US5633735A (en) 1990-11-09 1997-05-27 Litel Instruments Use of fresnel zone plates for material processing
US5235015A (en) * 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
JP2769393B2 (ja) * 1991-04-26 1998-06-25 直弘 丹野 立体光記録装置
US5289407A (en) * 1991-07-22 1994-02-22 Cornell Research Foundation, Inc. Method for three dimensional optical data storage and retrieval
JPH05113517A (ja) * 1991-10-22 1993-05-07 Nippon Telegr & Teleph Corp <Ntt> 光導波路と光フアイバとの接続構造
DE69213647T2 (de) * 1991-10-24 1997-02-06 Tosoh Corp Schutzüberzugsmaterial
DE4142327A1 (de) 1991-12-20 1993-06-24 Wacker Chemie Gmbh Jodoniumsalze und verfahren zu deren herstellung
JPH05288992A (ja) 1992-04-15 1993-11-05 Laser Tec Kk 透過型顕微鏡
US5377043A (en) 1992-05-11 1994-12-27 Cornell Research Foundation, Inc. Ti:sapphire-pumped high repetition rate femtosecond optical parametric oscillator
US5405733A (en) * 1992-05-12 1995-04-11 Apple Computer, Inc. Multiple beam laser exposure system for liquid crystal shutters
DE4219376A1 (de) 1992-06-12 1993-12-16 Wacker Chemie Gmbh Sulfoniumsalze und Verfahren zu deren Herstellung
JP3253083B2 (ja) * 1992-08-20 2002-02-04 イー・アイ・デユポン・ドウ・ヌムール・アンド・カンパニー レーザー放射線を使用して配向した重合体基質の微細構造表面を得る方法
US5415835A (en) * 1992-09-16 1995-05-16 University Of New Mexico Method for fine-line interferometric lithography
TW268969B (enExample) * 1992-10-02 1996-01-21 Minnesota Mining & Mfg
JP3186006B2 (ja) 1993-01-18 2001-07-11 キヤノン株式会社 回折格子
JPH06337320A (ja) * 1993-05-27 1994-12-06 Agency Of Ind Science & Technol 光導波路作製法および装置
DE4326473C2 (de) 1993-08-06 1997-05-15 European Molecular Biology Lab Embl Konfokales Mikroskop
US5422753A (en) * 1993-12-23 1995-06-06 Xerox Corporation Binary diffraction optical element for controlling scanning beam intensity in a raster output scanning (ROS) optical system
US5850300A (en) * 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
JP3265804B2 (ja) 1994-03-18 2002-03-18 富士通株式会社 バーコード読取り装置
DE4418645C1 (de) * 1994-05-27 1995-12-14 Sun Chemical Corp Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial
US5854868A (en) * 1994-06-22 1998-12-29 Fujitsu Limited Optical device and light waveguide integrated circuit
JPH08320422A (ja) * 1994-06-22 1996-12-03 Fujitsu Ltd 光導波路系の作製方法およびそれを用いた光デバイス
US5856373A (en) * 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
JPH08184718A (ja) 1994-12-28 1996-07-16 Hoechst Japan Ltd 光導波路素子およびその製造方法
JP3498869B2 (ja) * 1995-01-30 2004-02-23 富士写真フイルム株式会社 光重合性組成物を有する画像形成材料
US5759744A (en) * 1995-02-24 1998-06-02 University Of New Mexico Methods and apparatus for lithography of sparse arrays of sub-micrometer features
US5665522A (en) * 1995-05-02 1997-09-09 Minnesota Mining And Manufacturing Company Visible image dyes for positive-acting no-process printing plates
US5747550A (en) * 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5912257A (en) 1995-09-06 1999-06-15 The Research Foundation Of State University Of New York Two-photon upconverting dyes and applications
US5699175A (en) * 1995-09-08 1997-12-16 Quinta Corporation Multiphoton photorefractive holographic recording media
JP3604700B2 (ja) * 1995-10-06 2004-12-22 ポラロイド コーポレイション ホログラフィ媒体およびプロセス
AU717137B2 (en) * 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
WO1997027519A1 (en) 1996-01-29 1997-07-31 Foster-Miller, Inc. Optical components containing complex diffraction gratings and methods for the fabrication thereof
US5750641A (en) * 1996-05-23 1998-05-12 Minnesota Mining And Manufacturing Company Polyimide angularity enhancement layer
US5847812A (en) * 1996-06-14 1998-12-08 Nikon Corporation Projection exposure system and method
FR2751785A1 (fr) * 1996-07-29 1998-01-30 Commissariat Energie Atomique Procede et dispositif de formation de motifs dans une couche de resine photosensible par insolation laser continue, application a la fabrication de sources d'electrons a cathodes emissives a micropointes et d'ecrans plats
US5832931A (en) 1996-10-30 1998-11-10 Photogen, Inc. Method for improved selectivity in photo-activation and detection of molecular diagnostic agents
WO1998021521A1 (en) 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6608228B1 (en) * 1997-11-07 2003-08-19 California Institute Of Technology Two-photon or higher-order absorbing optical materials for generation of reactive species
US6267913B1 (en) * 1996-11-12 2001-07-31 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
CA2688799C (en) 1996-11-15 2014-09-30 Marsupial Holdings, Inc. In-line holographic mask for micromachining
DE19653413C2 (de) 1996-12-22 2002-02-07 Stefan Hell Rastermikroskop, bei dem eine Probe in mehreren Probenpunkten gleichzeitig optisch angeregt wird
US6025406A (en) * 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US5998495A (en) * 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6001297A (en) * 1997-04-28 1999-12-14 3D Systems, Inc. Method for controlling exposure of a solidfiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom
CN1053118C (zh) * 1997-07-09 2000-06-07 天津市元亨医药保健品公司 强心卡及其制造方法
US6020591A (en) 1997-07-11 2000-02-01 Imra America, Inc. Two-photon microscopy with plane wave illumination
US5770737A (en) * 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
US5859251A (en) * 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
JP2001522119A (ja) 1997-10-31 2001-11-13 トリディー・ストア・アイピー・エルエルシー 多層フォトクロミック光データディスク
US6048911A (en) * 1997-12-12 2000-04-11 Borden Chemical, Inc. Coated optical fibers
US6103454A (en) * 1998-03-24 2000-08-15 Lucent Technologies Inc. Recording medium and process for forming medium
US6316153B1 (en) * 1998-04-21 2001-11-13 The University Of Connecticut Free-form fabricaton using multi-photon excitation
US6169631B1 (en) * 1998-05-19 2001-01-02 Seagate Technology Llc Laser-texturing data zone on a magnetic disk surface by using degenerative two wave mixing
US6115339A (en) 1998-06-17 2000-09-05 International Business Machines Corporation Method and system in an optical storage disc drive for conserving laser power
KR100450542B1 (ko) 1998-10-29 2004-10-01 가부시키가이샤 히타치세이사쿠쇼 조명 장치 및 이를 이용한 액정 표시 장치
US6327074B1 (en) 1998-11-25 2001-12-04 University Of Central Florida Display medium using emitting particles dispersed in a transparent host
US6107011A (en) * 1999-01-06 2000-08-22 Creo Srl Method of high resolution optical scanning utilizing primary and secondary masks
US6322933B1 (en) * 1999-01-12 2001-11-27 Siros Technologies, Inc. Volumetric track definition for data storage media used to record data by selective alteration of a format hologram
US6749814B1 (en) 1999-03-03 2004-06-15 Symyx Technologies, Inc. Chemical processing microsystems comprising parallel flow microreactors and methods for using same
US6703188B1 (en) * 1999-03-29 2004-03-09 Kabushiki Kaisha Toyota Chuo Kenkyusho Method of fabricating optical waveguide structure
US6100405A (en) * 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US6312876B1 (en) * 1999-07-08 2001-11-06 Taiwan Semiconductor Manufacturing Company Method for placing identifying mark on semiconductor wafer
US6322931B1 (en) * 1999-07-29 2001-11-27 Siros Technologies, Inc. Method and apparatus for optical data storage using non-linear heating by excited state absorption for the alteration of pre-formatted holographic gratings
US6624915B1 (en) * 2000-03-16 2003-09-23 Science Applications International Corporation Holographic recording and micro/nanofabrication via ultrafast holographic two-photon induced photopolymerization (H-TPIP)
US6855478B2 (en) 2000-06-15 2005-02-15 3M Innovative Properties Company Microfabrication of organic optical elements
WO2001096952A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
AU2001268465A1 (en) 2000-06-15 2001-12-24 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
WO2001096961A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Multipass multiphoton absorption method and apparatus
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
KR100811017B1 (ko) 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중방향성 광반응성 흡수 방법
US7060419B2 (en) 2000-06-15 2006-06-13 3M Innovative Properties Company Process for producing microfluidic articles
US6441356B1 (en) * 2000-07-28 2002-08-27 Optical Biopsy Technologies Fiber-coupled, high-speed, angled-dual-axis optical coherence scanning microscopes
JP3876281B2 (ja) * 2000-08-31 2007-01-31 独立行政法人産業技術総合研究所 情報記録方法
US6541591B2 (en) * 2000-12-21 2003-04-01 3M Innovative Properties Company High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers
AU2002306752B2 (en) 2001-03-30 2008-10-16 The Arizona Board Of Regents On Behalf Of The University Of Arizona Materials, methods, and uses for photochemical generation of acids and/or radical species
US20040012872A1 (en) 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US20030155667A1 (en) 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
US7378176B2 (en) 2004-05-04 2008-05-27 Angstrom Power Inc. Membranes and electrochemical cells incorporating such membranes

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588664A (en) * 1983-08-24 1986-05-13 Polaroid Corporation Photopolymerizable compositions used in holograms

Also Published As

Publication number Publication date
JP4786858B2 (ja) 2011-10-05
AU2001268465A1 (en) 2001-12-24
JP5491651B2 (ja) 2014-05-14
US7014988B2 (en) 2006-03-21
US20100027956A1 (en) 2010-02-04
JP5400090B2 (ja) 2014-01-29
KR20030017995A (ko) 2003-03-04
EP1295179A2 (en) 2003-03-26
JP2004503813A (ja) 2004-02-05
WO2001096917A3 (en) 2002-05-10
JP2011186493A (ja) 2011-09-22
EP1295179B1 (en) 2013-05-22
WO2001096917A2 (en) 2001-12-20
US20060078831A1 (en) 2006-04-13
JP2013109379A (ja) 2013-06-06
US20050208431A1 (en) 2005-09-22
US8530118B2 (en) 2013-09-10
US7601484B2 (en) 2009-10-13

Similar Documents

Publication Publication Date Title
KR100810547B1 (ko) 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법
KR100810546B1 (ko) 삼차원 광학 소자의 가공 방법
KR100754813B1 (ko) 다중통과 다광자 흡수 방법 및 장치
KR100813320B1 (ko) 다광자 감광 시스템
KR100811017B1 (ko) 다중방향성 광반응성 흡수 방법
EP2368155B1 (en) Three-dimensional articles using nonlinear thermal polymerization
CN101124520B (zh) 单光子和多光子可聚合的陶瓷前体聚合组合物
KR100811018B1 (ko) 물품에 구조를 형성 또는 추가하는 방법
KR100795762B1 (ko) 패턴화된 광을 이용한 다광자 흡수법
EP1635202B1 (en) Microfabrication of organic optical elements

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20130201

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20140204

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20150130

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20160127

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20170301

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20170301