KR100803264B1 - 횡형 절연 게이트 바이폴라 트랜지스터 - Google Patents

횡형 절연 게이트 바이폴라 트랜지스터 Download PDF

Info

Publication number
KR100803264B1
KR100803264B1 KR1020060078350A KR20060078350A KR100803264B1 KR 100803264 B1 KR100803264 B1 KR 100803264B1 KR 1020060078350 A KR1020060078350 A KR 1020060078350A KR 20060078350 A KR20060078350 A KR 20060078350A KR 100803264 B1 KR100803264 B1 KR 100803264B1
Authority
KR
South Korea
Prior art keywords
single crystal
crystal silicon
collector
stripe
region
Prior art date
Application number
KR1020060078350A
Other languages
English (en)
Korean (ko)
Other versions
KR20070032905A (ko
Inventor
도모유키 우츠미
다카히로 시부야
쇼이치 오제키
히로유키 하세가와
Original Assignee
가부시끼가이샤 히다치 세이사꾸쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시끼가이샤 히다치 세이사꾸쇼 filed Critical 가부시끼가이샤 히다치 세이사꾸쇼
Publication of KR20070032905A publication Critical patent/KR20070032905A/ko
Application granted granted Critical
Publication of KR100803264B1 publication Critical patent/KR100803264B1/ko

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Thin Film Transistor (AREA)
  • Element Separation (AREA)
KR1020060078350A 2005-09-20 2006-08-18 횡형 절연 게이트 바이폴라 트랜지스터 KR100803264B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00271283 2005-09-20
JP2005271283A JP5061443B2 (ja) 2005-09-20 2005-09-20 横型絶縁ゲートバイポーラトランジスタ

Publications (2)

Publication Number Publication Date
KR20070032905A KR20070032905A (ko) 2007-03-23
KR100803264B1 true KR100803264B1 (ko) 2008-02-14

Family

ID=37954624

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060078350A KR100803264B1 (ko) 2005-09-20 2006-08-18 횡형 절연 게이트 바이폴라 트랜지스터

Country Status (3)

Country Link
JP (1) JP5061443B2 (ja)
KR (1) KR100803264B1 (ja)
CN (1) CN100456480C (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7932581B2 (en) * 2009-05-12 2011-04-26 Mediatek Inc. Lateral bipolar junction transistor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745699A (ja) * 1993-07-27 1995-02-14 Toshiba Corp 誘電体分離型半導体装置
JP2000058821A (ja) 1998-08-10 2000-02-25 Hitachi Ltd 半導体装置
KR20000014740A (ko) * 1998-08-24 2000-03-15 김덕중 수평형 절연 게이트 바이폴라 트랜지스터

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0716009B2 (ja) * 1988-12-02 1995-02-22 株式会社日立製作所 横型絶縁ゲートバイポーラトランジスタ
JP4292595B2 (ja) * 1998-06-02 2009-07-08 株式会社デンソー 半導体装置
JP4206543B2 (ja) * 1999-02-02 2009-01-14 株式会社デンソー 半導体装置
JP3382172B2 (ja) * 1999-02-04 2003-03-04 株式会社日立製作所 横型絶縁ゲートバイポーラトランジスタ
JP4040229B2 (ja) * 1999-02-14 2008-01-30 矢崎総業株式会社 交流用スイッチングデバイス

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745699A (ja) * 1993-07-27 1995-02-14 Toshiba Corp 誘電体分離型半導体装置
JP2000058821A (ja) 1998-08-10 2000-02-25 Hitachi Ltd 半導体装置
KR20000014740A (ko) * 1998-08-24 2000-03-15 김덕중 수평형 절연 게이트 바이폴라 트랜지스터

Also Published As

Publication number Publication date
KR20070032905A (ko) 2007-03-23
JP2007087984A (ja) 2007-04-05
CN1937230A (zh) 2007-03-28
JP5061443B2 (ja) 2012-10-31
CN100456480C (zh) 2009-01-28

Similar Documents

Publication Publication Date Title
US9559195B2 (en) Semiconductor device
KR100272057B1 (ko) 절연 게이트형 반도체 장치의 제조방법
US9543421B2 (en) Trench-type insulated gate semiconductor device including an emitter trench and an overlapped floating region
CN100452428C (zh) 沟槽栅极场效应器件
EP1033757B1 (en) Insulated gate bipolar transistor
KR20160136366A (ko) 전력용 반도체 장치
CN102804385A (zh) 半导体器件
JP4940535B2 (ja) 半導体装置
US9013005B2 (en) Semiconductor device and method for manufacturing same
WO2011118512A1 (ja) 絶縁ゲート型バイポーラトランジスタ
CN105706241A (zh) Mos双极器件
US11810958B2 (en) Transistor component having gate electrodes and field electrodes
TWI596768B (zh) Semiconductor device
WO1999056323A1 (fr) Dispositif semi-conducteur et son procede de fabrication
JP5774422B2 (ja) 半導体装置
KR100803264B1 (ko) 횡형 절연 게이트 바이폴라 트랜지스터
KR20170114703A (ko) 게이트 전극 구조물 및 이를 포함하는 고전압 반도체 소자
US11133393B2 (en) Semiconductor device and method of manufacturing the same
US11101373B2 (en) Insulated gate bipolar transistor and manufacturing method thereof
CN112820771A (zh) 半导体器件
US10700185B2 (en) Semiconductor device
JP2007081252A (ja) 半導体装置
JP2022164607A (ja) 半導体装置
KR20240059627A (ko) 다수의 게이트 본드 패드들을 포함하는 전력 반도체 디바이스들
KR20230129764A (ko) 전력 반도체 소자, 이를 포함하는 전력 반도체 칩 및 이의 제조 방법

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
G170 Publication of correction
FPAY Annual fee payment

Payment date: 20130118

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20140120

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20150120

Year of fee payment: 8

FPAY Annual fee payment

Payment date: 20160105

Year of fee payment: 9

FPAY Annual fee payment

Payment date: 20170103

Year of fee payment: 10

FPAY Annual fee payment

Payment date: 20180119

Year of fee payment: 11