KR100803264B1 - 횡형 절연 게이트 바이폴라 트랜지스터 - Google Patents
횡형 절연 게이트 바이폴라 트랜지스터 Download PDFInfo
- Publication number
- KR100803264B1 KR100803264B1 KR1020060078350A KR20060078350A KR100803264B1 KR 100803264 B1 KR100803264 B1 KR 100803264B1 KR 1020060078350 A KR1020060078350 A KR 1020060078350A KR 20060078350 A KR20060078350 A KR 20060078350A KR 100803264 B1 KR100803264 B1 KR 100803264B1
- Authority
- KR
- South Korea
- Prior art keywords
- single crystal
- crystal silicon
- collector
- stripe
- region
- Prior art date
Links
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims abstract description 54
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 239000004065 semiconductor Substances 0.000 claims abstract description 9
- 238000000926 separation method Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 244000126211 Hericium coralloides Species 0.000 claims description 2
- 230000002265 prevention Effects 0.000 abstract description 5
- 238000009792 diffusion process Methods 0.000 description 22
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 7
- 239000002585 base Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000002955 isolation Methods 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Thin Film Transistor (AREA)
- Element Separation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00271283 | 2005-09-20 | ||
JP2005271283A JP5061443B2 (ja) | 2005-09-20 | 2005-09-20 | 横型絶縁ゲートバイポーラトランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070032905A KR20070032905A (ko) | 2007-03-23 |
KR100803264B1 true KR100803264B1 (ko) | 2008-02-14 |
Family
ID=37954624
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060078350A KR100803264B1 (ko) | 2005-09-20 | 2006-08-18 | 횡형 절연 게이트 바이폴라 트랜지스터 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5061443B2 (ja) |
KR (1) | KR100803264B1 (ja) |
CN (1) | CN100456480C (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7932581B2 (en) * | 2009-05-12 | 2011-04-26 | Mediatek Inc. | Lateral bipolar junction transistor |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0745699A (ja) * | 1993-07-27 | 1995-02-14 | Toshiba Corp | 誘電体分離型半導体装置 |
JP2000058821A (ja) | 1998-08-10 | 2000-02-25 | Hitachi Ltd | 半導体装置 |
KR20000014740A (ko) * | 1998-08-24 | 2000-03-15 | 김덕중 | 수평형 절연 게이트 바이폴라 트랜지스터 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0716009B2 (ja) * | 1988-12-02 | 1995-02-22 | 株式会社日立製作所 | 横型絶縁ゲートバイポーラトランジスタ |
JP4292595B2 (ja) * | 1998-06-02 | 2009-07-08 | 株式会社デンソー | 半導体装置 |
JP4206543B2 (ja) * | 1999-02-02 | 2009-01-14 | 株式会社デンソー | 半導体装置 |
JP3382172B2 (ja) * | 1999-02-04 | 2003-03-04 | 株式会社日立製作所 | 横型絶縁ゲートバイポーラトランジスタ |
JP4040229B2 (ja) * | 1999-02-14 | 2008-01-30 | 矢崎総業株式会社 | 交流用スイッチングデバイス |
-
2005
- 2005-09-20 JP JP2005271283A patent/JP5061443B2/ja active Active
-
2006
- 2006-08-18 KR KR1020060078350A patent/KR100803264B1/ko active IP Right Grant
- 2006-08-18 CN CNB2006101159383A patent/CN100456480C/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0745699A (ja) * | 1993-07-27 | 1995-02-14 | Toshiba Corp | 誘電体分離型半導体装置 |
JP2000058821A (ja) | 1998-08-10 | 2000-02-25 | Hitachi Ltd | 半導体装置 |
KR20000014740A (ko) * | 1998-08-24 | 2000-03-15 | 김덕중 | 수평형 절연 게이트 바이폴라 트랜지스터 |
Also Published As
Publication number | Publication date |
---|---|
KR20070032905A (ko) | 2007-03-23 |
JP2007087984A (ja) | 2007-04-05 |
CN1937230A (zh) | 2007-03-28 |
JP5061443B2 (ja) | 2012-10-31 |
CN100456480C (zh) | 2009-01-28 |
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