KR100693896B1 - 후막저항체 페이스트 및 후막저항체 - Google Patents

후막저항체 페이스트 및 후막저항체 Download PDF

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Publication number
KR100693896B1
KR100693896B1 KR1020050081181A KR20050081181A KR100693896B1 KR 100693896 B1 KR100693896 B1 KR 100693896B1 KR 1020050081181 A KR1020050081181 A KR 1020050081181A KR 20050081181 A KR20050081181 A KR 20050081181A KR 100693896 B1 KR100693896 B1 KR 100693896B1
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KR
South Korea
Prior art keywords
film resistor
thick film
mass
resistor paste
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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KR1020050081181A
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English (en)
Korean (ko)
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KR20060050917A (ko
Inventor
히로부미 다나카
가츠히코 이가라시
Original Assignee
티디케이가부시기가이샤
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Application filed by 티디케이가부시기가이샤 filed Critical 티디케이가부시기가이샤
Publication of KR20060050917A publication Critical patent/KR20060050917A/ko
Application granted granted Critical
Publication of KR100693896B1 publication Critical patent/KR100693896B1/ko
Assigned to 쇼에이 가가쿠 가부시키가이샤 reassignment 쇼에이 가가쿠 가부시키가이샤 권리의 전부이전등록 Assignors: 티디케이가부시기가이샤
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/004—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of particles or flakes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/20—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing titanium compounds; containing zirconium compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits or green body
    • H01C17/06513—Precursor compositions therefor, e.g. pastes, inks, glass frits or green body characterised by the resistive component
    • H01C17/06533—Precursor compositions therefor, e.g. pastes, inks, glass frits or green body characterised by the resistive component composed of oxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/003—Thick film resistors
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2214/00—Nature of the non-vitreous component
    • C03C2214/04—Particles; Flakes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/445—Organic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Composite Materials (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Non-Adjustable Resistors (AREA)
  • Glass Compositions (AREA)
  • Conductive Materials (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
KR1020050081181A 2004-09-01 2005-09-01 후막저항체 페이스트 및 후막저항체 Expired - Lifetime KR100693896B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004254199 2004-09-01
JPJP-P-2004-00254199 2004-09-01
JP2005067192 2005-03-10
JPJP-P-2005-00067192 2005-03-10

Publications (2)

Publication Number Publication Date
KR20060050917A KR20060050917A (ko) 2006-05-19
KR100693896B1 true KR100693896B1 (ko) 2007-03-12

Family

ID=35207722

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050081181A Expired - Lifetime KR100693896B1 (ko) 2004-09-01 2005-09-01 후막저항체 페이스트 및 후막저항체

Country Status (6)

Country Link
US (1) US7481953B2 (https=)
EP (1) EP1632961B1 (https=)
KR (1) KR100693896B1 (https=)
AT (1) ATE364233T1 (https=)
DE (1) DE602005001305T2 (https=)
TW (1) TW200612443A (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR0209453A (pt) * 2001-05-16 2004-07-06 Du Pont Composição dielétrica, pasta para impressão em tela de uma composição dielétrica e dispositivo de emissão de campo de elétrons
US7435361B2 (en) * 2005-04-14 2008-10-14 E.I. Du Pont De Nemours And Company Conductive compositions and processes for use in the manufacture of semiconductor devices
US7749592B2 (en) * 2007-02-06 2010-07-06 Tdk Corpoation Multilayer ceramic substrate
US8257619B2 (en) 2008-04-18 2012-09-04 E I Du Pont De Nemours And Company Lead-free resistive composition
DE102014102256A1 (de) * 2014-02-21 2015-08-27 Osram Oled Gmbh Glasware, Glasware mit Leuchtstoff-Partikeln, Vorrichtung zum Herstellen einer Glasware, Verfahren zum Herstellen einer Glasware und Verfahren zum Herstellen einer Glasware mit Leuchtstoff-Partikeln
US9805839B2 (en) 2014-09-12 2017-10-31 Shoei Chemical Inc. Resistive composition
KR101739744B1 (ko) * 2015-08-13 2017-05-25 대주전자재료 주식회사 무연 후막 저항 조성물, 무연 후막 저항체 및 이의 제조방법
KR101848694B1 (ko) * 2017-02-13 2018-04-16 대주전자재료 주식회사 무연 후막 저항체 및 이를 포함하는 전자부품
TWI722603B (zh) * 2019-10-16 2021-03-21 道登電子材料股份有限公司 低溫度係數電阻膏體材料及低溫度係數電阻膜體之製備方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR890017727A (ko) * 1988-05-13 1989-12-18 고바야시 요오다로 박막 저항체 및 그 제조방법
KR930013877A (ko) * 1991-12-25 1993-07-22 원본미기재 후막 레지스터 조성물
KR19990063475A (ko) 1997-12-26 1999-07-26 무라타 쥰이치 후막 저항체 및 그의 제조 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814721B2 (ja) 1979-03-30 1983-03-22 株式会社東芝 厚膜型正特性半導体素子の製造方法
JPS62119277A (ja) * 1985-11-18 1987-05-30 Copal Co Ltd 厚膜用印刷ペ−スト
US5277844A (en) 1993-03-29 1994-01-11 Rainey Clifford S Resistor composition
US5491118A (en) 1994-12-20 1996-02-13 E. I. Du Pont De Nemours And Company Cadmium-free and lead-free thick film paste composition
JP3019136B2 (ja) 1995-03-09 2000-03-13 株式会社住友金属エレクトロデバイス 厚膜ペースト及びそれを用いたセラミック回路基板
US6399230B1 (en) * 1997-03-06 2002-06-04 Sarnoff Corporation Multilayer ceramic circuit boards with embedded resistors
KR100369565B1 (ko) 1999-12-17 2003-01-29 대주정밀화학 주식회사 전기발열체용 저항 페이스트 조성물
JP2003197405A (ja) 2001-12-21 2003-07-11 Tdk Corp 抵抗体ペースト、抵抗体および電子部品
US7740899B2 (en) 2002-05-15 2010-06-22 Ferro Corporation Electronic device having lead and cadmium free electronic overglaze applied thereto

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR890017727A (ko) * 1988-05-13 1989-12-18 고바야시 요오다로 박막 저항체 및 그 제조방법
KR930013877A (ko) * 1991-12-25 1993-07-22 원본미기재 후막 레지스터 조성물
KR19990063475A (ko) 1997-12-26 1999-07-26 무라타 쥰이치 후막 저항체 및 그의 제조 방법

Also Published As

Publication number Publication date
KR20060050917A (ko) 2006-05-19
DE602005001305D1 (de) 2007-07-19
TW200612443A (en) 2006-04-16
ATE364233T1 (de) 2007-06-15
TWI307104B (https=) 2009-03-01
US20060043345A1 (en) 2006-03-02
EP1632961A1 (en) 2006-03-08
DE602005001305T2 (de) 2008-01-31
EP1632961B1 (en) 2007-06-06
US7481953B2 (en) 2009-01-27

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