KR930013877A - 후막 레지스터 조성물 - Google Patents

후막 레지스터 조성물 Download PDF

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Publication number
KR930013877A
KR930013877A KR1019920025499A KR920025499A KR930013877A KR 930013877 A KR930013877 A KR 930013877A KR 1019920025499 A KR1019920025499 A KR 1019920025499A KR 920025499 A KR920025499 A KR 920025499A KR 930013877 A KR930013877 A KR 930013877A
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South Korea
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weight
pbo
sio
thick film
glass
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KR1019920025499A
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KR970005085B1 (ko
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버랜드 윌리암
하야까와 게이이찌로
마쓰노 히사시
사또 다께시
데이비드 스미쓰 제로메
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원본미기재
이. 아이. 듀우판 드 네모아 앤드 캄파니
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06573—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder
    • H01C17/0658—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder composed of inorganic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07—Glass compositions containing silica with less than 40% silica by weight containing lead
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07—Glass compositions containing silica with less than 40% silica by weight containing lead
    • C03C3/072—Glass compositions containing silica with less than 40% silica by weight containing lead containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07—Glass compositions containing silica with less than 40% silica by weight containing lead
    • C03C3/072—Glass compositions containing silica with less than 40% silica by weight containing lead containing boron
    • C03C3/074—Glass compositions containing silica with less than 40% silica by weight containing lead containing boron containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/108—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/10—Frit compositions, i.e. in a powdered or comminuted form containing lead
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/10—Frit compositions, i.e. in a powdered or comminuted form containing lead
    • C03C8/12—Frit compositions, i.e. in a powdered or comminuted form containing lead containing titanium or zirconium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/22—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions containing two or more distinct frits having different compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06513—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
    • H01C17/06533—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component composed of oxides
    • H01C17/0654—Oxides of the platinum group

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Non-Adjustable Resistors (AREA)
  • Glass Compositions (AREA)
  • Conductive Materials (AREA)

Abstract

내용 없음

Description

후막 레지스터 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따라 제조된 실시예 1-7의 레지스터의 TCR에 대한 길이의 효과를 나타낸 그래프.

Claims (3)

  1. (a) 산화루테늄 기재 화합물 10-50중량%.(b) 30-60중량%의 SiO2, 5-30중량%의 CaO, 1-40중량%의 B2O3, 0-50중량%의 PbO 및 0-20중량%의 Al2O3를 함유하고, SiO2, CaO, B2O3, PbO 및 Al2O3가 전체의 95중량% 이상을 차지하는제1유리 5-35중량%및(c) 50중량% 이상의 PbO를 함유하는 규산납 유리인 제2유리 5-40중량%의 미세하게 분쇄된 입자로 이루어지고, 상기 (a)내지(c)가 유기 액체 매질 중에 분산되어 있는 후막 레지스터 조성물.
  2. 제1항에 있어서, 제2유리가 50-80중량%의 PbO, 10-35중량%의 SiO2, 1-10중량%의 Al2O3,1-10중량%의 B2O3, 1-10중량%의 CuO 및 1-10중량%의 ZnO로 이루어지고, PbO, SiO2,Al2O3. B2O3, CuO 및 ZnO,RK 유리 전체의 95중량% 이상을 차지하는 것인 조성물.
  3. 제1항에 있어서, 성분(a)가 Pb2Ru2O6인 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개되는 것임.
KR1019920025499A 1991-12-25 1992-12-24 후막 레지스터 조성물 KR970005085B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP91-343610 1991-12-25
JP3343610A JP2970713B2 (ja) 1991-12-25 1991-12-25 厚膜抵抗体組成物

Publications (2)

Publication Number Publication Date
KR930013877A true KR930013877A (ko) 1993-07-22
KR970005085B1 KR970005085B1 (ko) 1997-04-12

Family

ID=18362870

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920025499A KR970005085B1 (ko) 1991-12-25 1992-12-24 후막 레지스터 조성물

Country Status (6)

Country Link
EP (1) EP0548865B1 (ko)
JP (1) JP2970713B2 (ko)
KR (1) KR970005085B1 (ko)
CN (1) CN1044296C (ko)
DE (1) DE69205557T2 (ko)
TW (1) TW208083B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100693896B1 (ko) * 2004-09-01 2007-03-12 티디케이가부시기가이샤 후막저항체 페이스트 및 후막저항체

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3611160B2 (ja) * 1997-02-10 2005-01-19 株式会社村田製作所 厚膜抵抗体ペースト
JP2007103594A (ja) * 2005-10-03 2007-04-19 Shoei Chem Ind Co 抵抗体組成物並びに厚膜抵抗体
JP2009088368A (ja) * 2007-10-02 2009-04-23 Kamaya Denki Kk 低抵抗チップ抵抗器の製造方法
EP2274250A1 (en) * 2008-04-18 2011-01-19 E. I. du Pont de Nemours and Company Resistor compositions using a cu-containing glass frit
CN103021602A (zh) * 2012-12-27 2013-04-03 青岛艾德森能源科技有限公司 一种电阻组合物
JP2017045906A (ja) * 2015-08-28 2017-03-02 住友金属鉱山株式会社 厚膜抵抗体ペースト
CN110634637B (zh) * 2017-10-23 2021-06-22 潮州三环（集团）股份有限公司 一种阻值范围为1mω/□～10mω/□的厚膜电阻浆料及其制备方法
CN109215884B (zh) * 2018-08-22 2020-06-26 湖南海曙科技有限公司 一种提高厚膜电阻浆料高温烧结稳定性的方法
JP7215334B2 (ja) * 2019-05-30 2023-01-31 住友金属鉱山株式会社 ルテニウム酸鉛粉末の製造方法
CN114049986B (zh) * 2021-12-28 2022-04-19 西安宏星电子浆料科技股份有限公司 一种无铅无铋的介质浆料
CN115290232A (zh) * 2022-06-20 2022-11-04 无锡盛赛传感科技有限公司 环状超小型力敏陶瓷张力传感器

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3583931A (en) * 1969-11-26 1971-06-08 Du Pont Oxides of cubic crystal structure containing bismuth and at least one of ruthenium and iridium
US4476039A (en) * 1983-01-21 1984-10-09 E. I. Du Pont De Nemours And Company Stain-resistant ruthenium oxide-based resistors
US4537703A (en) * 1983-12-19 1985-08-27 E. I. Du Pont De Nemours And Company Borosilicate glass compositions
US4814107A (en) * 1988-02-12 1989-03-21 Heraeus Incorporated Cermalloy Division Nitrogen fireable resistor compositions
US4961999A (en) * 1988-07-21 1990-10-09 E. I. Du Pont De Nemours And Company Thermistor composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100693896B1 (ko) * 2004-09-01 2007-03-12 티디케이가부시기가이샤 후막저항체 페이스트 및 후막저항체

Also Published As

Publication number Publication date
EP0548865A2 (en) 1993-06-30
DE69205557D1 (de) 1995-11-23
DE69205557T2 (de) 1996-04-11
CN1075816A (zh) 1993-09-01
CN1044296C (zh) 1999-07-21
EP0548865A3 (ko) 1994-02-09
JPH05175005A (ja) 1993-07-13
TW208083B (ko) 1993-06-21
EP0548865B1 (en) 1995-10-18
KR970005085B1 (ko) 1997-04-12
JP2970713B2 (ja) 1999-11-02

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