KR100687963B1 - 노르보르넨 설폰아미드 중합체를 제조하는 방법 - Google Patents

노르보르넨 설폰아미드 중합체를 제조하는 방법 Download PDF

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Publication number
KR100687963B1
KR100687963B1 KR1020017009927A KR20017009927A KR100687963B1 KR 100687963 B1 KR100687963 B1 KR 100687963B1 KR 1020017009927 A KR1020017009927 A KR 1020017009927A KR 20017009927 A KR20017009927 A KR 20017009927A KR 100687963 B1 KR100687963 B1 KR 100687963B1
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South Korea
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branched
alkyl
linear
norbornene
group
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Korean (ko)
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KR20010089637A (ko
Inventor
사이쿠마르 자야라만
리차드 비카리
래리 에프. 로데스
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스미토모 베이클라이트 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
    • C08G61/08—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds of carbocyclic compounds containing one or more carbon-to-carbon double bonds in the ring

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Polyethers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
KR1020017009927A 1999-02-05 2000-02-04 노르보르넨 설폰아미드 중합체를 제조하는 방법 Expired - Fee Related KR100687963B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11893699P 1999-02-05 1999-02-05
US60/118,936 1999-02-05
US09/497,356 2000-02-03
US09/497,356 US6235849B1 (en) 1999-02-05 2000-02-03 Method of preparing norbornene sulfonamide polymers

Publications (2)

Publication Number Publication Date
KR20010089637A KR20010089637A (ko) 2001-10-06
KR100687963B1 true KR100687963B1 (ko) 2007-02-27

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017009927A Expired - Fee Related KR100687963B1 (ko) 1999-02-05 2000-02-04 노르보르넨 설폰아미드 중합체를 제조하는 방법

Country Status (8)

Country Link
US (1) US6235849B1 (https=)
EP (1) EP1157058B1 (https=)
JP (1) JP2003525311A (https=)
KR (1) KR100687963B1 (https=)
AT (1) ATE243719T1 (https=)
AU (1) AU2757300A (https=)
DE (1) DE60003529T2 (https=)
WO (1) WO2000046267A1 (https=)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6887956B2 (en) 2000-10-12 2005-05-03 Dow Global Technologies Inc. Catalyst system for high-cis polybutadiene
KR20020056602A (ko) * 2000-12-29 2002-07-10 노기호 황을 포함하는 고리형 올레핀 공중합체 및 그의 제조방법
JP5013033B2 (ja) * 2001-07-27 2012-08-29 Ｊｓｒ株式会社 環状オレフィン付加重合体の製造方法
JP4941621B2 (ja) * 2001-07-27 2012-05-30 Ｊｓｒ株式会社 環状オレフィン付加重合体の製造方法
US6583307B2 (en) * 2001-03-07 2003-06-24 University Of New Orleans Research And Technology Foundation, Inc. Convenient and efficient Suzuki-Miyaura cross-coupling catalyzed by a palladium/diazabutadiene system
WO2004037866A2 (en) 2002-10-21 2004-05-06 Shipley Company L.L.C. Photoresists containing sulfonamide component
US6677419B1 (en) 2002-11-13 2004-01-13 International Business Machines Corporation Preparation of copolymers
EP1589055A4 (en) * 2003-01-31 2010-06-02 Zeon Corp METHOD FOR THE PRODUCTION OF A CYCLOOLEFIN RESIN FILM AND METHOD FOR THE PRODUCTION OF A CYCLOOLEFIN RESIN FILM OR A CYCLOOLEFIN RESIN FILM
US6949325B2 (en) * 2003-09-16 2005-09-27 International Business Machines Corporation Negative resist composition with fluorosulfonamide-containing polymer
JP2005171234A (ja) * 2003-11-18 2005-06-30 Jsr Corp 新規な（共）重合体およびその製造方法並びにカルボキシル基含有（共）重合体の製造方法
US7063931B2 (en) * 2004-01-08 2006-06-20 International Business Machines Corporation Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
CA2462011A1 (en) * 2004-02-23 2005-08-23 Bayer Inc. Process for the preparation of low molecular weight nitrile rubber
ATE414118T1 (de) * 2004-07-07 2008-11-15 Promerus Llc Lichtempfindliche dielektrische harzzusammensetzungen und ihre verwendungen
JP4494161B2 (ja) * 2004-10-14 2010-06-30 東京応化工業株式会社 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法
EP2033978A1 (en) * 2004-12-15 2009-03-11 Nihon University Method for producing norbornene based addition (co)polymer
ATE517370T1 (de) * 2005-02-22 2011-08-15 Promerus Llc Norbornenpolymere und deren herstellungsverfahren
US7799883B2 (en) * 2005-02-22 2010-09-21 Promerus Llc Norbornene-type polymers, compositions thereof and lithographic process using such compositions
JP4887710B2 (ja) * 2005-09-28 2012-02-29 セントラル硝子株式会社 α−置換アクリル酸ノルボルナニル類の製造方法
CN100344656C (zh) * 2006-05-11 2007-10-24 复旦大学 聚降冰片烯的制备方法
US20080027246A1 (en) * 2006-07-26 2008-01-31 Andrew Bell Process for forming perfluorinated-alkyl sulfonamide substituted norbornene-type monomers
JP5076682B2 (ja) * 2006-07-26 2012-11-21 セントラル硝子株式会社 Ｎ−（ビシクロ［２，２，１］ヘプト−５−エン−２−イルメチル）−１，１，１−トリフルオロメタンスルホンアミドの製造方法
JP5314882B2 (ja) 2007-02-15 2013-10-16 東京応化工業株式会社 高分子化合物、レジスト組成物及びレジストパターン形成方法
WO2008099725A1 (ja) * 2007-02-15 2008-08-21 Tokyo Ohka Kogyo Co., Ltd. 高分子化合物、レジスト組成物及びレジストパターン形成方法
JP5236246B2 (ja) * 2007-10-18 2013-07-17 株式会社クラレ スルホニルハライド誘導体の製造方法
KR101610315B1 (ko) * 2008-09-02 2016-04-07 주식회사 쿠라레 설톤 유도체의 제조방법
JP5117484B2 (ja) * 2009-12-28 2013-01-16 東京応化工業株式会社 新規な化合物、及びその製造方法
US8541523B2 (en) * 2010-04-05 2013-09-24 Promerus, Llc Norbornene-type polymers, compositions thereof and lithographic process using such compositions
CN102702432B (zh) * 2012-05-30 2014-06-18 宁波工程学院 用于降冰片烯、马来酸酐与环己烯三元共聚的催化剂以及三元共聚方法
CN105218821A (zh) * 2015-10-19 2016-01-06 昆明理工大学 一种聚合单体与二氧化硫共聚物的制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3970133A (en) * 1974-12-16 1976-07-20 The Goodyear Tire & Rubber Company Chlorothio-sulfonamide-modified rubbery terpolymers and their blends
DE3720760A1 (de) 1987-06-24 1989-01-05 Bayer Ag Norbornan- und norbornensulfonamide, verfahren zu deren herstellung sowie ihre verwendung als arzneimittel
JP3221636B2 (ja) * 1993-03-15 2001-10-22 株式会社クラレ ３−フェニルスルホニルアミノ−ビシクロ［２，２，１］ヘプタン−２−カルボン酸アルキルエステルの製造方法
US5656412A (en) * 1995-03-07 1997-08-12 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
CA2154862A1 (en) * 1995-03-20 1996-09-21 Roger John Hopper Process for preparation of n-halothiosulfonamide modified terpolymers
JPH09124588A (ja) * 1995-11-07 1997-05-13 Mitsubishi Materials Corp 不飽和スルホン酸誘導体とその製造方法
WO1997033198A1 (en) 1996-03-07 1997-09-12 The B.F. Goodrich Company Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
JPH11184090A (ja) * 1997-10-13 1999-07-09 Fuji Photo Film Co Ltd 遠紫外線露光用ポジ型フォトレジスト組成物
JP3720970B2 (ja) * 1998-01-13 2005-11-30 株式会社東芝 感光性組成物、およびこれを用いたパターン形成方法、半導体装置の製造方法

Also Published As

Publication number Publication date
EP1157058A1 (en) 2001-11-28
KR20010089637A (ko) 2001-10-06
ATE243719T1 (de) 2003-07-15
US6235849B1 (en) 2001-05-22
DE60003529D1 (de) 2003-07-31
AU2757300A (en) 2000-08-25
DE60003529T2 (de) 2004-04-29
JP2003525311A (ja) 2003-08-26
EP1157058B1 (en) 2003-06-25
WO2000046267A1 (en) 2000-08-10

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