KR100624542B1 - 막 두께 측정 방법 및 장치 - Google Patents

막 두께 측정 방법 및 장치 Download PDF

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Publication number
KR100624542B1
KR100624542B1 KR1020050012395A KR20050012395A KR100624542B1 KR 100624542 B1 KR100624542 B1 KR 100624542B1 KR 1020050012395 A KR1020050012395 A KR 1020050012395A KR 20050012395 A KR20050012395 A KR 20050012395A KR 100624542 B1 KR100624542 B1 KR 100624542B1
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KR
South Korea
Prior art keywords
film thickness
spectral reflectance
spectral
measured
transparent thin
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KR1020050012395A
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English (en)
Korean (ko)
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KR20060041959A (ko
Inventor
나리아키 후지와라
Original Assignee
다이니폰 스크린 세이조우 가부시키가이샤
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Publication of KR20060041959A publication Critical patent/KR20060041959A/ko
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C01B13/11—Preparation of ozone by electric discharge
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/20—Electrodes used for obtaining electrical discharge
    • C01B2201/22—Constructional details of the electrodes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/20—Electrodes used for obtaining electrical discharge
    • C01B2201/24—Composition of the electrodes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/60—Feed streams for electrical dischargers
    • C01B2201/62—Air
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/60—Feed streams for electrical dischargers
    • C01B2201/64—Oxygen

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020050012395A 2004-03-04 2005-02-15 막 두께 측정 방법 및 장치 KR100624542B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004060867A JP4216209B2 (ja) 2004-03-04 2004-03-04 膜厚測定方法および装置
JPJP-P-2004-00060867 2004-03-04

Publications (2)

Publication Number Publication Date
KR20060041959A KR20060041959A (ko) 2006-05-12
KR100624542B1 true KR100624542B1 (ko) 2006-09-19

Family

ID=35030208

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050012395A KR100624542B1 (ko) 2004-03-04 2005-02-15 막 두께 측정 방법 및 장치

Country Status (4)

Country Link
JP (1) JP4216209B2 (ja)
KR (1) KR100624542B1 (ja)
CN (1) CN100392349C (ja)
TW (1) TWI275772B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010110535A2 (ko) * 2009-03-23 2010-09-30 에스엔유 프리시젼 주식회사 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계

Families Citing this family (24)

* Cited by examiner, † Cited by third party
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JP4831814B2 (ja) * 2006-02-23 2011-12-07 三菱重工業株式会社 透明導電膜評価装置及び透明導電膜の評価方法
KR100833798B1 (ko) * 2006-10-31 2008-05-30 한국표준과학연구원 게이트 절연막의 두께 측정방법
TWI386617B (zh) * 2007-12-31 2013-02-21 Ind Tech Res Inst 反射式膜厚量測方法
KR100988454B1 (ko) * 2008-01-31 2010-10-18 에스엔유 프리시젼 주식회사 두께 측정방법
KR101010189B1 (ko) * 2008-06-30 2011-01-21 에스엔유 프리시젼 주식회사 두께 또는 표면형상 측정방법
WO2010013325A1 (ja) * 2008-07-30 2010-02-04 株式会社ニレコ 分光測光装置
JP5281335B2 (ja) * 2008-08-21 2013-09-04 三菱電機株式会社 膜厚測定装置及び膜厚測定方法
JP5294938B2 (ja) * 2009-03-27 2013-09-18 Ｈｏｙａ株式会社 膜厚測定方法およびガラス光学素子の製造方法
JP5410806B2 (ja) 2009-03-27 2014-02-05 浜松ホトニクス株式会社 膜厚測定装置及び測定方法
CN101893432B (zh) * 2009-05-21 2014-11-26 昆山善思光电科技有限公司 无损探伤测厚仪
DE112010004023B4 (de) 2009-10-13 2021-10-28 Hamamatsu Photonics K.K. Filmdickenmessvorrichtung und Filmdickenmessverfahren
JP2012063321A (ja) * 2010-09-17 2012-03-29 Hamamatsu Photonics Kk 反射率測定装置、反射率測定方法、膜厚測定装置及び膜厚測定方法
KR101150943B1 (ko) * 2011-09-07 2012-05-29 (주)엘립소테크놀러지 텍스처가 형성된 시료의 막 두께 측정방법
JP5660026B2 (ja) 2011-12-28 2015-01-28 信越半導体株式会社 膜厚分布測定方法
US8922790B2 (en) * 2012-02-15 2014-12-30 Shincron Co., Ltd. Optical film thickness measuring device and thin film forming apparatus using the optical film thickness measuring device
CN103575703B (zh) * 2012-08-09 2016-03-09 中国科学院微电子研究所 利用反射光谱测量单晶硅基太阳能表面增透膜的方法
CN103575223B (zh) * 2012-08-09 2016-09-21 北京智朗芯光科技有限公司 利用反射光谱测量硅基太阳能电池增透膜的方法
JP6145342B2 (ja) * 2013-07-12 2017-06-07 株式会社荏原製作所 膜厚測定装置、膜厚測定方法、および膜厚測定装置を備えた研磨装置
KR102401092B1 (ko) * 2015-11-11 2022-05-20 엘지디스플레이 주식회사 비 반사 필름의 검사 장비 및 이를 이용한 검사 방법
JP6285597B1 (ja) * 2017-06-05 2018-02-28 大塚電子株式会社 光学測定装置および光学測定方法
JP7092146B2 (ja) * 2017-11-01 2022-06-28 コニカミノルタ株式会社 膜厚測定方法、膜厚測定システム、光反射フィルムの製造方法及び光反射フィルムの製造システム
CN108180846B (zh) * 2017-11-30 2020-11-17 广州兴森快捷电路科技有限公司 有机保焊膜的工艺控制方法及膜厚获取方法
JP6956673B2 (ja) * 2018-04-09 2021-11-02 三菱電機株式会社 膜厚測定装置
CN111879709B (zh) * 2020-07-15 2023-05-30 中国科学院空天信息创新研究院 湖泊水体光谱反射率检验方法及装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04301506A (ja) * 1991-03-29 1992-10-26 Ulvac Seimaku Kk 真空蒸着装置に於ける光学定数と膜厚の測定方法及び測定装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06249620A (ja) * 1993-02-23 1994-09-09 Dainippon Screen Mfg Co Ltd 膜厚測定方法
US5564830A (en) * 1993-06-03 1996-10-15 Fraunhofer Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Method and arrangement for determining the layer-thickness and the substrate temperature during coating
JP2937004B2 (ja) * 1994-04-11 1999-08-23 東レ株式会社 薄膜の膜厚測定方法および測定装置ならびに光学フィルターの製造方法ならびに高分子フィルムの製造方法
JP3944693B2 (ja) * 2001-10-04 2007-07-11 オムロン株式会社 膜厚測定装置
JP2003287408A (ja) * 2002-03-28 2003-10-10 Shin Meiwa Ind Co Ltd 光学式膜厚モニタ装置及び膜厚モニタ方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04301506A (ja) * 1991-03-29 1992-10-26 Ulvac Seimaku Kk 真空蒸着装置に於ける光学定数と膜厚の測定方法及び測定装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010110535A2 (ko) * 2009-03-23 2010-09-30 에스엔유 프리시젼 주식회사 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계
WO2010110535A3 (ko) * 2009-03-23 2010-12-09 에스엔유 프리시젼 주식회사 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계

Also Published As

Publication number Publication date
CN1664493A (zh) 2005-09-07
TW200532164A (en) 2005-10-01
JP2005249602A (ja) 2005-09-15
TWI275772B (en) 2007-03-11
CN100392349C (zh) 2008-06-04
JP4216209B2 (ja) 2009-01-28
KR20060041959A (ko) 2006-05-12

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