KR100507963B1 - 컬러 필터 및 전기 광학 장치 - Google Patents
컬러 필터 및 전기 광학 장치 Download PDFInfo
- Publication number
- KR100507963B1 KR100507963B1 KR10-2003-7000967A KR20037000967A KR100507963B1 KR 100507963 B1 KR100507963 B1 KR 100507963B1 KR 20037000967 A KR20037000967 A KR 20037000967A KR 100507963 B1 KR100507963 B1 KR 100507963B1
- Authority
- KR
- South Korea
- Prior art keywords
- pixel
- layer
- pixels
- color filter
- substrate
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims abstract description 91
- 238000005192 partition Methods 0.000 claims abstract description 49
- 239000004973 liquid crystal related substance Substances 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 36
- 230000001681 protective effect Effects 0.000 claims description 18
- 230000015572 biosynthetic process Effects 0.000 claims description 16
- 230000005540 biological transmission Effects 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 8
- 229910010272 inorganic material Inorganic materials 0.000 claims description 5
- 239000011147 inorganic material Substances 0.000 claims description 5
- 239000011368 organic material Substances 0.000 claims description 3
- 230000000903 blocking effect Effects 0.000 claims description 2
- 238000002161 passivation Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 205
- 239000010408 film Substances 0.000 description 68
- 238000001035 drying Methods 0.000 description 23
- 230000008569 process Effects 0.000 description 21
- 239000000463 material Substances 0.000 description 19
- 239000011347 resin Substances 0.000 description 19
- 229920005989 resin Polymers 0.000 description 19
- 239000011159 matrix material Substances 0.000 description 17
- 239000002585 base Substances 0.000 description 16
- 238000002347 injection Methods 0.000 description 15
- 239000007924 injection Substances 0.000 description 15
- 239000011651 chromium Substances 0.000 description 13
- 239000002346 layers by function Substances 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 238000007789 sealing Methods 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 238000004040 coloring Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 7
- 229910052804 chromium Inorganic materials 0.000 description 7
- 230000010365 information processing Effects 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000011161 development Methods 0.000 description 6
- 238000007689 inspection Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 238000009832 plasma treatment Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000012780 transparent material Substances 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 210000004185 liver Anatomy 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- -1 polyhydroxystyrene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/88—Dummy elements, i.e. elements having non-functional features
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
- H10K59/353—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
Abstract
Description
Claims (15)
- 기판 상에 형성된 구획부에 의해 구획되고, 잉크에 의한 복수의 색요소로 이루어지는 화소를 구비하는 컬러 필터로서,각 화소에서의 광의 투과 특성이 화소 간에서 실질적으로 균일하고,상기 화소가 복수 형성된 영역의 외측에 더미 화소가 형성되고,상기 화소 1개당 부여되는 잉크 및 상기 더미 화소 1개당 부여되는 잉크는 실질적으로 같은 양인 것을 특징으로 하는 컬러 필터.
- 삭제
- 제1항에 있어서,상기 더미 화소는 상기 화소보다 개구부가 작게 형성된 것을 특징으로 하는 컬러 필터.
- 제1항에 있어서,상기 화소에 부여되는 잉크 및 상기 더미 화소에 부여되는 잉크는 상기 기판의 단위 면적당 실질적으로 같은 양인 것을 특징으로 하는 컬러 필터.
- 제1항에 있어서,상기 더미 화소는 상기 기판 상에 형성된 구획부에 의해 구획되어 있는 것을 특징으로 하는 컬러 필터.
- 기판 상에 형성된 구획부에 의해 구획되고, 잉크에 의한 복수의 색요소로 이루어지는 화소를 구비하는 컬러 필터로서,각 화소에서의 광의 투과 특성이 화소 간에서 실질적으로 균일하고,상기 화소가 복수 형성된 영역의 주위에 더미 화소가 형성되고,상기 화소 및 상기 더미 화소를 덮도록 보호막이 형성되어 있는 것을 특징으로 하는 컬러 필터.
- 제6항에 있어서,상기 더미 화소는 상기 화소보다 개구부가 작게 형성된 것을 특징으로 하는 컬러 필터.
- 제6항에 있어서,상기 보호막은 상기 구획부의 형성 영역으로부터 외측의 영역까지 덮도록 형성되어 있는 것을 특징으로 하는 컬러 필터.
- 제6항에 있어서,상기 보호막은 상기 구획부의 형성 영역으로부터 외측의 영역에 노출되는 기판에 밀착하도록 형성되어 있는 것을 특징으로 하는 컬러 필터.
- 기판 상에 형성된 구획부에 의해 구획되고, 잉크에 의한 복수의 색요소로 이루어지는 화소를 구비하는 컬러 필터로서,각 화소에서의 광의 투과 특성이 화소 간에서 실질적으로 균일하고,상기 구획부는 무기물의 차광층 및 그 위에 형성된 유기물의 뱅크층을 구비하고, 상기 뱅크층 중 가장 외측의 부분은 상기 차광층 중 가장 외측의 부분의 바깥 둘레부터 외측까지 형성되고, 상기 기판에 접하고 있는 것을 특징으로 하는 컬러 필터.
- 청구항 제1항에 기재한 컬러 필터를 구비한 것을 특징으로 하는 전기 광학 장치.
- 제11항에 있어서,상기 컬러 필터에 광을 선택적으로 투과시키는 액정층을 더 구비한 것을 특징으로 하는 전기 광학 장치.
- 제11항에 있어서,상기 컬러 필터에 광을 선택적으로 투과시키는 방전 표시부를 더 구비한 것을 특징으로 하는 전기 광학 장치.
- 기판 상에 형성된 구획부에 의해 구획되고, 액체 방울 토출에 의해 형성된 발광층을 갖는 복수의 화소를 구비하는 전기 광학 장치로서,각 화소에서의 발광 특성이 화소 간에서 실질적으로 균일하고,상기 화소가 복수 형성된 영역의 주위에 더미 화소가 형성되고,상기 화소 및 상기 더미 화소를 덮도록 보호막이 형성되어 있는 것을 특징으로 하는 전기 광학 장치.
- 청구항 제11항 또는 제14항에 기재한 전기 광학 장치를 구비한 것을 특징으로 하는 전자 기기.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001167484 | 2001-06-01 | ||
JP2001167483 | 2001-06-01 | ||
JPJP-P-2001-00167483 | 2001-06-01 | ||
JPJP-P-2001-00167484 | 2001-06-01 | ||
PCT/JP2002/005376 WO2002099477A1 (en) | 2001-06-01 | 2002-05-31 | Color filter and electro-optical device |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030029631A KR20030029631A (ko) | 2003-04-14 |
KR100507963B1 true KR100507963B1 (ko) | 2005-08-18 |
Family
ID=26616246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2003-7000967A KR100507963B1 (ko) | 2001-06-01 | 2002-05-31 | 컬러 필터 및 전기 광학 장치 |
Country Status (6)
Country | Link |
---|---|
US (2) | US6887631B2 (ko) |
JP (2) | JP4431958B2 (ko) |
KR (1) | KR100507963B1 (ko) |
CN (1) | CN1229655C (ko) |
TW (1) | TW200528766A (ko) |
WO (1) | WO2002099477A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160148113A (ko) * | 2015-06-15 | 2016-12-26 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
Families Citing this family (66)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3628997B2 (ja) | 2000-11-27 | 2005-03-16 | セイコーエプソン株式会社 | 有機エレクトロルミネッセンス装置の製造方法 |
WO2002099477A1 (en) * | 2001-06-01 | 2002-12-12 | Seiko Epson Corporation | Color filter and electro-optical device |
JP2003022892A (ja) | 2001-07-06 | 2003-01-24 | Semiconductor Energy Lab Co Ltd | 発光装置の製造方法 |
US6949883B2 (en) * | 2001-12-06 | 2005-09-27 | Seiko Epson Corporation | Electro-optical device and an electronic apparatus |
EP1843602A3 (en) * | 2002-12-12 | 2007-12-05 | Samsung Electronics Co., Ltd. | Method and apparatus for generating illumination characteristic data around image display device, and method and apparatus for compensating for color variation using the method and apparatus |
KR100500147B1 (ko) | 2002-12-31 | 2005-07-07 | 엘지.필립스 엘시디 주식회사 | 유기전계 발광소자와 그 제조방법 |
KR100538325B1 (ko) | 2002-12-31 | 2005-12-22 | 엘지.필립스 엘시디 주식회사 | 일렉트로 루미네센스 표시소자와 그 제조방법 및 장치 |
JP2004260133A (ja) * | 2003-02-04 | 2004-09-16 | Seiko Epson Corp | 配線基板及び電気光学装置並びにこれらの製造方法並びに電子機器 |
JP3791616B2 (ja) * | 2003-02-06 | 2006-06-28 | セイコーエプソン株式会社 | 配線基板、電気光学装置及びその製造方法並びに電子機器 |
KR100509763B1 (ko) * | 2003-03-11 | 2005-08-25 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널의 전면필터 |
JP2004306191A (ja) | 2003-04-07 | 2004-11-04 | Seiko Epson Corp | テーブル装置、成膜装置、光学素子、半導体素子及び電子機器 |
JP2005013986A (ja) | 2003-05-30 | 2005-01-20 | Seiko Epson Corp | デバイスとその製造方法、アクティブマトリクス基板の製造方法及び電気光学装置並びに電子機器 |
CN1802603A (zh) | 2003-07-17 | 2006-07-12 | 霍尼韦尔国际公司 | 用于高级微电子应用的平面化薄膜及其生产装置和方法 |
JP2005043718A (ja) * | 2003-07-23 | 2005-02-17 | Seiko Epson Corp | カラーフィルタ、カラーフィルタの製造方法、表示装置、電気光学装置および電子機器 |
JP4175299B2 (ja) | 2003-07-23 | 2008-11-05 | セイコーエプソン株式会社 | カラーフィルタおよび表示装置 |
JP4217564B2 (ja) * | 2003-08-08 | 2009-02-04 | キヤノン株式会社 | 近接場露光用のマスクの製造方法 |
JP3953053B2 (ja) | 2003-08-28 | 2007-08-01 | セイコーエプソン株式会社 | 吐出方法、カラーフィルタ基板の製造方法、液晶表示装置の製造方法、および電子機器の製造方法 |
US7012371B2 (en) * | 2003-11-07 | 2006-03-14 | Au Optronics Corporation | Plasma display panel structure with shielding layer |
KR100993826B1 (ko) * | 2003-11-19 | 2010-11-12 | 삼성전자주식회사 | 표시장치 및 이의 제조 방법 |
US7870176B2 (en) * | 2004-07-08 | 2011-01-11 | Asocs Ltd. | Method of and apparatus for implementing fast orthogonal transforms of variable size |
JP4529581B2 (ja) * | 2004-08-10 | 2010-08-25 | セイコーエプソン株式会社 | 成膜方法および成膜装置 |
KR100623449B1 (ko) * | 2004-09-09 | 2006-09-19 | 엘지전자 주식회사 | 유기 전계발광 표시소자 및 그 제조방법 |
KR100623451B1 (ko) * | 2004-09-14 | 2006-09-19 | 엘지전자 주식회사 | 유기 전계발광 표시소자 및 그 제조방법 |
US7292294B2 (en) * | 2004-11-03 | 2007-11-06 | Chunghwa Picture Tubes, Ltd. | Manufacturing method of color filter on TFT array and manufacturing method of LCD panel |
JP2006216297A (ja) * | 2005-02-02 | 2006-08-17 | Dainippon Screen Mfg Co Ltd | 有機el用基板およびその製造方法 |
KR20060091669A (ko) * | 2005-02-16 | 2006-08-21 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널 전면기판용 블랙매트릭스 조성물 |
US7537867B2 (en) * | 2005-06-17 | 2009-05-26 | Icf Technology Co., Ltd. | Method for manufacturing color filter |
CN100394221C (zh) * | 2005-07-08 | 2008-06-11 | 虹创科技股份有限公司 | 彩色滤光片制造方法 |
US20070001591A1 (en) * | 2005-06-29 | 2007-01-04 | Jun Tanaka | Organic electroluminescence display and manufacturing method thereof |
JP2007103349A (ja) * | 2005-09-08 | 2007-04-19 | Seiko Epson Corp | 膜パターンの形成方法、有機el装置の製造方法、カラーフィルタ基板の製造方法、液晶表示装置の製造方法 |
GB2432256B (en) * | 2005-11-14 | 2009-12-23 | Cambridge Display Tech Ltd | Organic optoelectrical device |
KR20070071293A (ko) * | 2005-12-29 | 2007-07-04 | 엘지.필립스 엘시디 주식회사 | 액정표시소자 및 그 제조방법 |
KR100737649B1 (ko) | 2006-01-10 | 2007-07-09 | 비오이 하이디스 테크놀로지 주식회사 | 액정표시소자 |
US8142850B2 (en) * | 2006-04-03 | 2012-03-27 | Molecular Imprints, Inc. | Patterning a plurality of fields on a substrate to compensate for differing evaporation times |
KR101236515B1 (ko) * | 2006-04-14 | 2013-02-21 | 엘지디스플레이 주식회사 | 액정 표시 장치용 컬러 필터 기판 및 그의 제조 방법 |
JP4935171B2 (ja) * | 2006-04-24 | 2012-05-23 | セイコーエプソン株式会社 | 膜形成方法、電気光学基板の製造方法、及び電気光学装置の製造方法、並びに機能膜、電気光学基板、電気光学装置、及び電子機器 |
WO2008149498A1 (ja) | 2007-05-31 | 2008-12-11 | Panasonic Corporation | 有機el素子、およびその製造方法 |
US8120731B2 (en) * | 2007-09-11 | 2012-02-21 | Toppan Printing Co., Ltd. | Color filter |
JP5338266B2 (ja) * | 2007-11-20 | 2013-11-13 | セイコーエプソン株式会社 | 有機エレクトロルミネッセンス装置および有機エレクトロルミネッセンス装置の製造方法 |
JP2009244296A (ja) * | 2008-03-28 | 2009-10-22 | Fuji Electric Holdings Co Ltd | 色変換フィルタ |
US8093803B2 (en) * | 2009-03-17 | 2012-01-10 | Seiko Epson Corporation | Electro-optical device, electronic device, and method for manufacturing electro-optical device |
US8283853B2 (en) * | 2010-03-31 | 2012-10-09 | General Electric Company | Light-emitting device and article |
KR101689336B1 (ko) | 2010-06-30 | 2016-12-26 | 삼성디스플레이 주식회사 | 유기 전계 발광 표시장치 |
CN102707352A (zh) * | 2011-04-19 | 2012-10-03 | 京东方科技集团股份有限公司 | 彩色滤光片和彩色滤光片的制造方法 |
KR101808300B1 (ko) * | 2011-06-21 | 2017-12-13 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
CN103176232B (zh) * | 2011-12-20 | 2015-05-20 | 深超光电(深圳)有限公司 | 彩色滤光片 |
KR101455312B1 (ko) * | 2012-06-21 | 2014-10-27 | 엘지디스플레이 주식회사 | 패턴드 리타더 방식의 입체영상 표시장치 및 그 제조 방법 |
WO2014030354A1 (ja) * | 2012-08-23 | 2014-02-27 | パナソニック株式会社 | 有機電子デバイスの製造方法および有機elデバイスの製造方法 |
US9012900B2 (en) * | 2012-12-26 | 2015-04-21 | Lg Display Co., Ltd. | Organic light emitting diode display device and method of fabricating the same |
KR102050383B1 (ko) * | 2012-12-28 | 2019-11-29 | 엘지디스플레이 주식회사 | 유기전계발광표시장치 |
JP2015050022A (ja) * | 2013-08-30 | 2015-03-16 | 株式会社ジャパンディスプレイ | 有機el表示装置 |
CN103646852B (zh) * | 2013-12-12 | 2018-11-23 | 京东方科技集团股份有限公司 | 一种基板的制作方法 |
CN103943659B (zh) * | 2014-03-31 | 2017-02-08 | 京东方科技集团股份有限公司 | 显示基板及其制造方法和显示装置 |
KR102269134B1 (ko) * | 2014-09-29 | 2021-06-25 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 유기 발광 표시 장치용 증착 마스크 |
CN104362170B (zh) * | 2014-11-28 | 2017-04-12 | 京东方科技集团股份有限公司 | 一种有机电致发光显示器件、其驱动方法及相关装置 |
KR102364863B1 (ko) | 2015-03-10 | 2022-02-18 | 삼성디스플레이 주식회사 | 표시 장치 및 그 제조 방법 |
KR20180097808A (ko) * | 2017-02-23 | 2018-09-03 | 삼성디스플레이 주식회사 | 표시 장치 및 그것의 제조 방법 |
KR102282001B1 (ko) | 2017-03-10 | 2021-07-29 | 삼성디스플레이 주식회사 | 표시 장치 |
KR102230816B1 (ko) * | 2017-08-18 | 2021-03-23 | 주식회사 엘지화학 | 기판 |
CN107861284B (zh) * | 2017-11-21 | 2020-09-08 | 武汉华星光电技术有限公司 | 彩膜基板的制造方法 |
CN108010946B (zh) * | 2017-11-27 | 2022-02-25 | 京东方科技集团股份有限公司 | 一种像素界定层、阵列基板及显示装置 |
KR102423864B1 (ko) * | 2017-11-28 | 2022-07-21 | 엘지디스플레이 주식회사 | 발광 소자 및 컬러 필터를 포함하는 디스플레이 장치 |
WO2019187029A1 (ja) * | 2018-03-30 | 2019-10-03 | シャープ株式会社 | 表示装置 |
KR20200036451A (ko) * | 2018-09-28 | 2020-04-07 | 엘지디스플레이 주식회사 | 표시장치 |
US11502278B2 (en) | 2019-08-30 | 2022-11-15 | Joled Inc. | Display device including transparent partition wall and method of manufacturing same |
CN111584563B (zh) * | 2020-05-08 | 2023-05-09 | 武汉华星光电半导体显示技术有限公司 | 一种oled显示面板及显示装置 |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR930002921B1 (ko) | 1989-12-30 | 1993-04-15 | 삼성전자주식회사 | 액정 표시장치의 칼라필터 |
JPH06130218A (ja) | 1992-10-20 | 1994-05-13 | Toshiba Corp | カラ−フィルタおよび液晶表示装置 |
JPH06347637A (ja) * | 1993-06-14 | 1994-12-22 | Dainippon Ink & Chem Inc | 印刷方法 |
TW417034B (en) | 1993-11-24 | 2001-01-01 | Canon Kk | Color filter, method for manufacturing it, and liquid crystal panel |
JP3332515B2 (ja) | 1993-11-24 | 2002-10-07 | キヤノン株式会社 | カラーフィルタ、その製造方法及び液晶パネル |
JP2872594B2 (ja) | 1993-11-24 | 1999-03-17 | キヤノン株式会社 | カラーフィルターの製造方法及び液晶パネルの製造方法 |
JPH07294718A (ja) * | 1994-04-27 | 1995-11-10 | Toshiba Corp | カラーフィルタ |
US5684555A (en) | 1994-12-19 | 1997-11-04 | Kabushiki Kaisha Toshiba | Liquid crystal display panel |
JPH08201620A (ja) | 1995-01-25 | 1996-08-09 | Shinto Paint Co Ltd | カラーフィルターおよびカラー液晶表示装置 |
JP3059678B2 (ja) | 1995-07-14 | 2000-07-04 | キヤノン株式会社 | カラーフィルタの製造方法及び製造装置 |
JPH1010516A (ja) | 1996-06-20 | 1998-01-16 | Nec Corp | カラー液晶表示装置 |
JPH10332925A (ja) | 1997-06-02 | 1998-12-18 | Canon Inc | カラーフィルタ基板とその製造方法、該基板を用いた液晶素子 |
JP3738530B2 (ja) | 1997-06-30 | 2006-01-25 | ソニー株式会社 | カラー表示装置 |
JP3332822B2 (ja) * | 1997-09-05 | 2002-10-07 | キヤノン株式会社 | カラーフィルタ基板の製造方法 |
JPH1195019A (ja) * | 1997-09-25 | 1999-04-09 | Canon Inc | カラーフィルタ支持基板の再生方法 |
JP3328297B2 (ja) * | 1998-03-17 | 2002-09-24 | セイコーエプソン株式会社 | 表示装置の製造方法 |
JP3646510B2 (ja) * | 1998-03-18 | 2005-05-11 | セイコーエプソン株式会社 | 薄膜形成方法、表示装置およびカラーフィルタ |
TW369726B (en) | 1998-05-04 | 1999-09-11 | United Microelectronics Corp | Structure and producing method of microlens on color filter of sensor device |
US6712661B1 (en) * | 1998-09-17 | 2004-03-30 | Seiko Epson Corporation | Method for manufacturing electroluminescence device |
JP2000113982A (ja) * | 1998-10-08 | 2000-04-21 | Sony Corp | 有機elディスプレイの製造方法 |
KR100504253B1 (ko) * | 1998-12-21 | 2005-07-27 | 세이코 엡슨 가부시키가이샤 | 컬러필터 및 그 제조방법 |
JP3894261B2 (ja) * | 1999-08-24 | 2007-03-14 | セイコーエプソン株式会社 | カラーフィルタおよびその製造方法、電気光学装置、電子機器 |
JPH11271757A (ja) * | 1999-01-12 | 1999-10-08 | Asahi Glass Co Ltd | カラー液晶表示素子及びその製造方法 |
JP4196496B2 (ja) * | 1999-09-28 | 2008-12-17 | カシオ計算機株式会社 | 液晶表示装置 |
JP2001147316A (ja) * | 1999-11-22 | 2001-05-29 | Canon Inc | カラーフィルタとその製造方法、該カラーフィルタを用いた液晶素子 |
JP3988067B2 (ja) * | 1999-12-27 | 2007-10-10 | セイコーエプソン株式会社 | 電気光学装置部品の製造方法 |
JP2000352714A (ja) * | 2000-01-01 | 2000-12-19 | Canon Inc | 液晶表示装置 |
JP4618918B2 (ja) * | 2000-03-27 | 2011-01-26 | 株式会社半導体エネルギー研究所 | 自発光装置の作製方法 |
US6852994B2 (en) * | 2000-03-31 | 2005-02-08 | Seiko Epson Corporation | Organic EL device and method of manufacturing organic EL device |
JP2001291584A (ja) * | 2000-04-07 | 2001-10-19 | Seiko Epson Corp | 電気光学装置部品の製造方法 |
JP3922517B2 (ja) * | 2000-10-17 | 2007-05-30 | セイコーエプソン株式会社 | 機能性液体付与基板の製造方法、電気光学装置の製造方法、及び機能性液体付与基板の製造装置 |
WO2002099477A1 (en) * | 2001-06-01 | 2002-12-12 | Seiko Epson Corporation | Color filter and electro-optical device |
JP2003288030A (ja) * | 2002-03-27 | 2003-10-10 | Seiko Epson Corp | 電気光学装置とその製造方法及びデバイス並びに電子機器 |
-
2002
- 2002-05-31 WO PCT/JP2002/005376 patent/WO2002099477A1/ja active IP Right Grant
- 2002-05-31 KR KR10-2003-7000967A patent/KR100507963B1/ko active IP Right Grant
- 2002-05-31 JP JP2003502538A patent/JP4431958B2/ja not_active Expired - Fee Related
- 2002-05-31 CN CNB028019539A patent/CN1229655C/zh not_active Expired - Fee Related
- 2002-06-03 TW TW093135636A patent/TW200528766A/zh not_active IP Right Cessation
- 2002-06-03 US US10/158,797 patent/US6887631B2/en not_active Expired - Lifetime
-
2004
- 2004-12-06 US US11/004,124 patent/US7282843B2/en not_active Expired - Lifetime
-
2009
- 2009-11-05 JP JP2009253751A patent/JP5104843B2/ja not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160148113A (ko) * | 2015-06-15 | 2016-12-26 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
KR102547213B1 (ko) | 2015-06-15 | 2023-06-26 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
US6887631B2 (en) | 2005-05-03 |
JP2010061156A (ja) | 2010-03-18 |
JPWO2002099477A1 (ja) | 2004-09-16 |
US7282843B2 (en) | 2007-10-16 |
TWI312081B (ko) | 2009-07-11 |
KR20030029631A (ko) | 2003-04-14 |
WO2002099477A1 (en) | 2002-12-12 |
US20050174043A1 (en) | 2005-08-11 |
TW200528766A (en) | 2005-09-01 |
CN1229655C (zh) | 2005-11-30 |
US20030030766A1 (en) | 2003-02-13 |
CN1463371A (zh) | 2003-12-24 |
JP5104843B2 (ja) | 2012-12-19 |
JP4431958B2 (ja) | 2010-03-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100507963B1 (ko) | 컬러 필터 및 전기 광학 장치 | |
US6830855B2 (en) | System and methods for producing a color filter | |
KR100506068B1 (ko) | 컬러필터 및 그 제조방법 | |
US7182877B2 (en) | Method for manufacturing electro-optical device, electro-optical device, and electronic apparatus | |
KR100491589B1 (ko) | 전기 광학 장치와 그 제조 방법 및 디바이스와 전자 기기 | |
JP3969034B2 (ja) | カラーフィルタの製造方法 | |
JP3894261B2 (ja) | カラーフィルタおよびその製造方法、電気光学装置、電子機器 | |
KR100943264B1 (ko) | 액정표시장치 및 이의 제조방법 | |
JP4092574B2 (ja) | 発光用基板およびその製造方法、液滴材料着弾精度の測定方法、電気光学装置ならびに電子機器 | |
JP4257524B2 (ja) | 成膜方法および成膜装置 | |
JP2004004945A (ja) | カラーフィルタおよびその製造方法、電気光学装置、電子機器 | |
JP2003107238A (ja) | カラーフィルタおよびその製造方法、カラーフィルタ用液滴材料着弾精度試験基板およびその製造方法、発光用基板およびその製造方法、発光用基板用液滴材料着弾精度試験基板およびその製造方法、液滴材料着弾精度の測定方法、電気光学装置、電子機器、成膜方法並びに成膜装置 | |
JP4743437B2 (ja) | 発光用基板およびその製造方法、発光用基板用液滴材料着弾精度試験基板およびその製造方法、液滴材料着弾精度の測定方法、電気光学装置ならびに電子機器 | |
JP4174675B2 (ja) | カラーフィルタ用液滴材料着弾精度試験基板の製造方法 | |
KR100886229B1 (ko) | 액정표시장치 및 그 제조방법 | |
KR101943969B1 (ko) | 경량 박형의 액정표시장치 제조방법 | |
JPH11194335A (ja) | 液晶表示装置の製造方法 | |
KR20040024364A (ko) | 액정표시장치 및 그 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20120724 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20130722 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20140722 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20150716 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20160701 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20170802 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20180726 Year of fee payment: 14 |
|
FPAY | Annual fee payment |
Payment date: 20190724 Year of fee payment: 15 |