KR100453777B1 - 반도체 제조 장치 및 그 동작 조건 파라미터의 관리 방법과, 컴퓨터 판독 가능한 기록 매체 - Google Patents

반도체 제조 장치 및 그 동작 조건 파라미터의 관리 방법과, 컴퓨터 판독 가능한 기록 매체 Download PDF

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Publication number
KR100453777B1
KR100453777B1 KR10-2001-7005297A KR20017005297A KR100453777B1 KR 100453777 B1 KR100453777 B1 KR 100453777B1 KR 20017005297 A KR20017005297 A KR 20017005297A KR 100453777 B1 KR100453777 B1 KR 100453777B1
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South Korea
Prior art keywords
operating condition
semiconductor manufacturing
condition parameters
memory
device operating
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Expired - Fee Related
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KR10-2001-7005297A
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English (en)
Korean (ko)
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KR20010080917A (ko
Inventor
나가타마사야
스가와라마사히로
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동경 엘렉트론 주식회사
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Application granted granted Critical
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/41835Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by programme execution
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/41845Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by system universality, reconfigurability, modularity
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/36Nc in input of data, input key till input tape
    • G05B2219/36088Machining parameters, overide
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/36Nc in input of data, input key till input tape
    • G05B2219/36089Machining parameters, modification during operation
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/36Nc in input of data, input key till input tape
    • G05B2219/36271Enter, edit workpiece data
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45026Circuit board, pcb
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45031Manufacturing semiconductor wafers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

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  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Quality & Reliability (AREA)
  • General Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Factory Administration (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Multi-Process Working Machines And Systems (AREA)
KR10-2001-7005297A 1999-09-01 2000-08-22 반도체 제조 장치 및 그 동작 조건 파라미터의 관리 방법과, 컴퓨터 판독 가능한 기록 매체 Expired - Fee Related KR100453777B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP99-247464 1999-09-01
JP24746499A JP4545252B2 (ja) 1999-09-01 1999-09-01 半導体製造装置

Publications (2)

Publication Number Publication Date
KR20010080917A KR20010080917A (ko) 2001-08-25
KR100453777B1 true KR100453777B1 (ko) 2004-10-20

Family

ID=17163847

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Application Number Title Priority Date Filing Date
KR10-2001-7005297A Expired - Fee Related KR100453777B1 (ko) 1999-09-01 2000-08-22 반도체 제조 장치 및 그 동작 조건 파라미터의 관리 방법과, 컴퓨터 판독 가능한 기록 매체

Country Status (6)

Country Link
US (1) US6514345B1 (enExample)
EP (1) EP1148402A4 (enExample)
JP (1) JP4545252B2 (enExample)
KR (1) KR100453777B1 (enExample)
TW (1) TW530428B (enExample)
WO (1) WO2001016659A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002252161A (ja) * 2001-02-23 2002-09-06 Hitachi Ltd 半導体製造システム
KR100395697B1 (ko) * 2001-04-07 2003-08-25 (주)지우텍 반도체 공정 파라미터를 이용한 반도체 공정 장비 제어 방법
JP4126189B2 (ja) * 2002-04-10 2008-07-30 株式会社日立ハイテクノロジーズ 検査条件設定プログラム、検査装置および検査システム
JP4277100B2 (ja) * 2002-11-14 2009-06-10 東京エレクトロン株式会社 搬送機構の基準位置補正装置及び基準位置補正方法
CN101283360B (zh) * 2005-02-25 2011-07-06 朗姆研究公司 用于群集工具的安全通用配置方法
US7353379B2 (en) * 2005-02-25 2008-04-01 Lam Research Corporation Methods for configuring a plasma cluster tool
US7162317B2 (en) * 2005-02-25 2007-01-09 Lam Research Corporation Methods and apparatus for configuring plasma cluster tools
US7536538B1 (en) 2005-03-31 2009-05-19 Lam Research Corporation Cluster tools for processing substrates using at least a key file
JP4841183B2 (ja) * 2005-06-28 2011-12-21 東京エレクトロン株式会社 基板処理装置,搬送装置,搬送装置の制御方法
TWI342058B (en) * 2005-12-20 2011-05-11 Applied Materials Inc Extended mainframe designs for semiconductor device manufacturing equipment
JP5091413B2 (ja) * 2006-03-08 2012-12-05 東京エレクトロン株式会社 基板処理装置および基板処理装置の制御方法
JP4697896B2 (ja) * 2007-03-24 2011-06-08 東京エレクトロン株式会社 半導体製造装置、装置動作パラメータの管理方法、およびプログラム
US20120016506A1 (en) * 2009-04-15 2012-01-19 Masahiro Yokogawa Manufacturing method and manufacturing system for product
JP6111980B2 (ja) 2013-10-29 2017-04-12 株式会社安川電機 産業機器管理システム、産業機器管理サーバ、産業機器管理方法、プログラム、及び情報記憶媒体
JP6806601B2 (ja) * 2017-03-17 2021-01-06 アズビル株式会社 機器情報管理システム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5844784A (ja) * 1981-09-11 1983-03-15 Nippon Sekigaisen Kogyo Kk レ−ザ装置
US4967381A (en) * 1985-04-30 1990-10-30 Prometrix Corporation Process control interface system for managing measurement data
US4951190A (en) * 1985-04-30 1990-08-21 Prometrix Corporation Multilevel menu and hierarchy for selecting items and performing tasks thereon in a computer system
US5469361A (en) * 1991-08-08 1995-11-21 The Board Of Regents Acting For And On Behalf Of The University Of Michigan Generic cell controlling method and apparatus for computer integrated manufacturing system
JPH06222819A (ja) * 1993-01-26 1994-08-12 Fanuc Ltd Nc装置の加工プログラム実行方法
JPH08129407A (ja) * 1994-10-28 1996-05-21 Tokyo Electron Ltd 制御装置、制御装置のプログラムのロード方法および処理装置
JPH08161013A (ja) * 1994-12-09 1996-06-21 Canon Inc デバイス製造装置および方法
JPH0962323A (ja) * 1995-08-24 1997-03-07 Mitsubishi Electric Corp 数値制御装置のシステムパラメータ設定方法および数値制御装置
JP3393035B2 (ja) * 1997-05-06 2003-04-07 東京エレクトロン株式会社 制御装置及び半導体製造装置
US5838565A (en) 1997-05-15 1998-11-17 Vanguard International Semiconductor Corporation Manufacturing control method for IC plant batch sequential machine
JPH113117A (ja) * 1997-06-10 1999-01-06 Dainippon Screen Mfg Co Ltd 処理システムにおけるアラーム装置

Also Published As

Publication number Publication date
KR20010080917A (ko) 2001-08-25
EP1148402A4 (en) 2002-08-14
EP1148402A1 (en) 2001-10-24
US6514345B1 (en) 2003-02-04
JP2001075628A (ja) 2001-03-23
WO2001016659A1 (en) 2001-03-08
TW530428B (en) 2003-05-01
JP4545252B2 (ja) 2010-09-15

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