KR100379653B1 - 결정형산화제2세륨의제조방법 - Google Patents

결정형산화제2세륨의제조방법 Download PDF

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Publication number
KR100379653B1
KR100379653B1 KR1019950017864A KR19950017864A KR100379653B1 KR 100379653 B1 KR100379653 B1 KR 100379653B1 KR 1019950017864 A KR1019950017864 A KR 1019950017864A KR 19950017864 A KR19950017864 A KR 19950017864A KR 100379653 B1 KR100379653 B1 KR 100379653B1
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KR
South Korea
Prior art keywords
cerium
nitrate
particles
cerium oxide
oxide particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019950017864A
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English (en)
Korean (ko)
Other versions
KR960004213A (ko
Inventor
오따이사오
니시무라도오루
Original Assignee
닛산 가가쿠 고교 가부시키 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 닛산 가가쿠 고교 가부시키 가이샤 filed Critical 닛산 가가쿠 고교 가부시키 가이샤
Publication of KR960004213A publication Critical patent/KR960004213A/ko
Application granted granted Critical
Publication of KR100379653B1 publication Critical patent/KR100379653B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01D—COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM, RUBIDIUM, CAESIUM, OR FRANCIUM
    • C01D17/00—Rubidium, caesium or francium compounds
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/235—Cerium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S516/00—Colloid systems and wetting agents; subcombinations thereof; processes of
    • Y10S516/01—Wetting, emulsifying, dispersing, or stabilizing agents
    • Y10S516/02—Organic and inorganic agents containing, except water

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Geology (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
KR1019950017864A 1994-07-11 1995-06-28 결정형산화제2세륨의제조방법 Expired - Fee Related KR100379653B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP94-158479 1994-07-11
JP15847994 1994-07-11

Publications (2)

Publication Number Publication Date
KR960004213A KR960004213A (ko) 1996-02-23
KR100379653B1 true KR100379653B1 (ko) 2003-06-11

Family

ID=15672645

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950017864A Expired - Fee Related KR100379653B1 (ko) 1994-07-11 1995-06-28 결정형산화제2세륨의제조방법

Country Status (3)

Country Link
US (1) US5543126A (enExample)
KR (1) KR100379653B1 (enExample)
TW (1) TW311905B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100787346B1 (ko) 2005-08-31 2007-12-18 주식회사 엘지화학 산화세륨의 제조방법

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US5962343A (en) 1996-07-30 1999-10-05 Nissan Chemical Industries, Ltd. Process for producing crystalline ceric oxide particles and abrasive
KR100775228B1 (ko) * 1996-09-30 2007-11-12 히다치 가세고교 가부시끼가이샤 산화세륨 연마제 및 기판의 연마법
JP3333699B2 (ja) * 1996-11-22 2002-10-15 仲道 山崎 連続水熱反応における原料粒子噴霧方法および装置
JP3359535B2 (ja) * 1997-04-25 2002-12-24 三井金属鉱業株式会社 半導体装置の製造方法
TW365563B (en) * 1997-04-28 1999-08-01 Seimi Chem Kk Polishing agent for semiconductor and method for its production
JPH11181403A (ja) * 1997-12-18 1999-07-06 Hitachi Chem Co Ltd 酸化セリウム研磨剤及び基板の研磨法
US6241586B1 (en) 1998-10-06 2001-06-05 Rodel Holdings Inc. CMP polishing slurry dewatering and reconstitution
US6572449B2 (en) 1998-10-06 2003-06-03 Rodel Holdings, Inc. Dewatered CMP polishing compositions and methods for using same
EP1155092A1 (en) 1998-10-21 2001-11-21 W.R. Grace & Co.-Conn. Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles
US6447693B1 (en) 1998-10-21 2002-09-10 W. R. Grace & Co.-Conn. Slurries of abrasive inorganic oxide particles and method for polishing copper containing surfaces
WO2001000744A1 (en) 1999-06-28 2001-01-04 Nissan Chemical Industries, Ltd. Abrasive compound for glass hard disk platter
US6204219B1 (en) * 1999-07-29 2001-03-20 W. R. Grace & Co.-Conn. Thermally stable support material and method for making the same
US6443811B1 (en) * 2000-06-20 2002-09-03 Infineon Technologies Ag Ceria slurry solution for improved defect control of silicon dioxide chemical-mechanical polishing
JP3960914B2 (ja) * 2000-10-02 2007-08-15 三井金属鉱業株式会社 セリウム系研摩材及びセリウム系研摩材の製造方法
KR100450522B1 (ko) * 2000-12-18 2004-10-01 주식회사 소디프신소재 초미분 산화 세륨 연마제의 제조 방법, 이에 의해 제조된연마제 및 이를 사용하여 기판을 연마하는 방법
US6596042B1 (en) * 2001-11-16 2003-07-22 Ferro Corporation Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process
AU2002359356A1 (en) * 2001-11-16 2003-06-10 Ferro Corporation Particles for use in cmp slurries and method for producing them
KR100477939B1 (ko) * 2002-04-15 2005-03-18 주식회사 엘지화학 단결정 산화세륨 분말의 제조방법
KR100511943B1 (ko) * 2003-05-22 2005-09-01 한화석유화학 주식회사 화학·기계 연마용 산화세륨 초미립자 농축액 및 이의제조방법
CN100357362C (zh) * 2005-12-26 2007-12-26 内蒙古科技大学 一种抛光用超细氧化铈的制备方法
WO2008082001A1 (ja) * 2006-12-28 2008-07-10 Dow Corning Toray Co., Ltd. 加熱硬化性シリコーンゴム組成物
US8349764B2 (en) 2007-10-31 2013-01-08 Molycorp Minerals, Llc Composition for treating a fluid
US8252087B2 (en) 2007-10-31 2012-08-28 Molycorp Minerals, Llc Process and apparatus for treating a gas containing a contaminant
KR20120094896A (ko) * 2009-07-06 2012-08-27 몰리코프 미네랄스, 엘엘씨 상처 드레싱에서 항균 장벽 및 살균제로 이용되는 세리아
US9233863B2 (en) 2011-04-13 2016-01-12 Molycorp Minerals, Llc Rare earth removal of hydrated and hydroxyl species
CN102730740B (zh) * 2012-07-06 2014-03-12 南京信息工程大学 一种制备立方晶系氧化铈纳米晶的方法
JP2015143332A (ja) 2013-12-24 2015-08-06 旭硝子株式会社 研磨剤、研磨方法および半導体集積回路装置の製造方法
BR112016020631A2 (pt) 2014-03-07 2018-05-15 Secure Natural Resources Llc óxido de cério (iv) com excepcionais propriedades de remoção de arsênico
WO2018179061A1 (ja) 2017-03-27 2018-10-04 日立化成株式会社 研磨液、研磨液セット及び研磨方法
KR102278257B1 (ko) 2017-03-27 2021-07-15 쇼와덴코머티리얼즈가부시끼가이샤 슬러리 및 연마 방법
CN111819263A (zh) 2018-03-22 2020-10-23 日立化成株式会社 研磨液、研磨液套剂和研磨方法
WO2020021680A1 (ja) 2018-07-26 2020-01-30 日立化成株式会社 スラリ及び研磨方法
CN112740366B (zh) 2018-09-25 2024-08-02 株式会社力森诺科 浆料及研磨方法
CN109022767A (zh) * 2018-09-28 2018-12-18 中国恩菲工程技术有限公司 稀土沉淀装置和稀土沉淀方法

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FR2617153B1 (fr) * 1987-06-26 1991-04-05 Rhone Poulenc Chimie Procede d'obtention d'un oxyde cerique et oxyde cerique a nouvelles caracteristiques morphologiques
FR2617154B1 (fr) * 1987-06-29 1990-11-30 Rhone Poulenc Chimie Procede d'obtention d'oxyde cerique et oxyde cerique a nouvelles caracteristiques morphologiques
JP2777044B2 (ja) * 1993-04-19 1998-07-16 日産化学工業株式会社 バリウムフェライト微粒子の製造方法
US5389352A (en) * 1993-07-21 1995-02-14 Rodel, Inc. Oxide particles and method for producing them

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100787346B1 (ko) 2005-08-31 2007-12-18 주식회사 엘지화학 산화세륨의 제조방법

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Publication number Publication date
KR960004213A (ko) 1996-02-23
TW311905B (enExample) 1997-08-01
US5543126A (en) 1996-08-06

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