KR0169985B1 - 반도체 패키지 검사방법 - Google Patents
반도체 패키지 검사방법 Download PDFInfo
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- KR0169985B1 KR0169985B1 KR1019910000242A KR910000242A KR0169985B1 KR 0169985 B1 KR0169985 B1 KR 0169985B1 KR 1019910000242 A KR1019910000242 A KR 1019910000242A KR 910000242 A KR910000242 A KR 910000242A KR 0169985 B1 KR0169985 B1 KR 0169985B1
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 27
- 238000007689 inspection Methods 0.000 title claims abstract description 15
- 238000013461 design Methods 0.000 claims description 11
- 238000012360 testing method Methods 0.000 claims description 5
- 238000004458 analytical method Methods 0.000 claims description 3
- 230000002547 anomalous effect Effects 0.000 abstract description 8
- 230000002596 correlated effect Effects 0.000 abstract description 5
- 230000000007 visual effect Effects 0.000 abstract description 5
- 230000000877 morphologic effect Effects 0.000 description 8
- 238000004364 calculation method Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000010191 image analysis Methods 0.000 description 3
- 238000012937 correction Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000008451 emotion Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/0006—Industrial image inspection using a design-rule based approach
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/20—Special algorithmic details
- G06T2207/20172—Image enhancement details
- G06T2207/20192—Edge enhancement; Edge preservation
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Quality & Reliability (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Theoretical Computer Science (AREA)
- Image Processing (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Image Analysis (AREA)
Abstract
Description
Claims (3)
- 반도체 패키지를 자동적으로 검사하는 방법으로서, 패키지의 영상을 입수하는 단계; 다수의 패키지 방향 에지를 결정하기 위해 방향 에지 증진을 실시하는 단계; 패키지 방향 에지의 포인트 위치의 리스트를 형성하는 단계; 포인트 위치를 소정의 허용가능한 포인트 위치의 리스트에 대해 비교하는 단계; 및 포인트 위치의 리스트를 만들기 이전에 상기 패키지 방향 에지를 형태학적으로(morphologically) 확대시키는 단계를 포함하는 것을 특징으로 하는 반도체 패키지 검사방법.
- 반도체 패키지를 자동적으로 검사하는 방법으로서, 샘플 패키지의 영상을 입수하는 단계; 상기 샘플 패키지에 대한 방향 에지 모양을 결정하는 단계; 상기 샘플 패키지로부터 연장하는 리드에 대한 방향 에지 모양을 결정하는 단계; 상기 샘플 패키지 및 리드에 대한 상기 방향 에지 모양을 기억하는 단계; 검사되는 패키지의 영상을 입수하는 단계; 상기 검사되는 패키지에 대한 방향 에지 모양을 결정하는 단계; 상기 검사되는 패키지의 방향 에지 모양을 상기 샘플 패키지의 상기 기억된 패키지 모양과 비교하는 단계; 상기 검사되는 패키지 리드의 방향 에지 모양을 결정하는 단계; 상기 검사되는 패키지 리드의 방향 에지 모양을 상기 샘플 리드의 방향 에지 모양 및 상기 검사되는 패키지의 방향 에지 모양과 비교하는 단계; 상기 샘플 패키지의 방향 에지 모양과 매칭되지 않는 검사되는 패키지의 임의의 방향 에지에 대한 방향 에지 포인트 리스트를 결정하고 상기 방향 에지 포인트 리스트의 면적 및 도심 분석을 실시하는 단계를 포함하는 것을 특징으로 하는 반도체 패키지 검사방법.
- 반도체 패키지를 검사하는 방법으로서, 패키지의 영상을 입수하는 단계; 방향 에지 모양을 형성하도록 방향 에지 증진을 실시하는 단계; 방향 에지 모양을 확대하는 단계; 앞서 기억되어 있는 소정의 모양과 상관시키기 위해 상기 확대된 방향 에지 모양을 테스트하는 단계; 상단 및 하단 패키지 에지 모양의 위치로부터 동일거리에 놓여진 x-축 상의 위치를 계산하는 단계; 좌측 및 우측 패키지 에지 모양의 위치로부터 동일거리에 놓여진 y-축 상의 위치를 계산하는 단계; 리드에 대응하는 각각의 방향 에지 모양에 대한 리드 모양 중심의 위치를 계산하는 단계; 각각의 리드 모양 중심의 위치와 x-축 간의 차이를 계산하는 단계; 각각의 리드 모양 중심 위치와 y-축 간의 차이를 계산하는 단계; 상기 리드 모양 중심 위치를 이용하여 가장 적합한 라인의 위치를 계산하는 단계; 각각의 리드에 대한 동일평면성 에러(coplanarity error)를 결정하기 위해 가장 적합한 라인으로부터 리드 모양 중심 위치를 감산하는 단계; 및 상기 반도체 패키지의 허용가능성*acceptability)을 결정하기 위해 각각의 차이 및 동일평면성 에러를 소정의 설계명세 한계치와 비교하는 단계를 포함하는 것을 특징으로 하는 반도체 패키지 검사방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/498,776 US5137362A (en) | 1990-03-26 | 1990-03-26 | Automatic package inspection method |
US498,776 | 1990-03-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910017199A KR910017199A (ko) | 1991-11-05 |
KR0169985B1 true KR0169985B1 (ko) | 1999-03-30 |
Family
ID=23982448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910000242A KR0169985B1 (ko) | 1990-03-26 | 1991-01-10 | 반도체 패키지 검사방법 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5137362A (ko) |
JP (1) | JP2515630B2 (ko) |
KR (1) | KR0169985B1 (ko) |
MY (1) | MY104790A (ko) |
Families Citing this family (29)
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CA2054705C (en) * | 1990-02-23 | 2001-08-14 | Hidehiko Kouno | Device and method for measuring angles of a workpiece |
US5274713A (en) * | 1991-09-23 | 1993-12-28 | Industrial Technology Research Institute | Real-time apparatus for detecting surface defects on objects |
JP3199141B2 (ja) * | 1993-07-07 | 2001-08-13 | ソニー株式会社 | ドラムリード測定装置と測定方法 |
EP0638801B1 (en) * | 1993-08-12 | 1998-12-23 | International Business Machines Corporation | Method of inspecting the array of balls of an integrated circuit module |
JP2941617B2 (ja) * | 1993-10-21 | 1999-08-25 | 株式会社テンリュウテクニックス | 電子部品の部品データ記録装置およびそれを用いた電子部品の搬送組み付け装置 |
US6201892B1 (en) | 1997-02-26 | 2001-03-13 | Acuity Imaging, Llc | System and method for arithmetic operations for electronic package inspection |
US5926557A (en) * | 1997-02-26 | 1999-07-20 | Acuity Imaging, Llc | Inspection method |
US6118524A (en) * | 1997-02-26 | 2000-09-12 | Acuity Imaging, Llc | Arc illumination apparatus and method |
US6236747B1 (en) | 1997-02-26 | 2001-05-22 | Acuity Imaging, Llc | System and method for image subtraction for ball and bumped grid array inspection |
US5828449A (en) * | 1997-02-26 | 1998-10-27 | Acuity Imaging, Llc | Ring illumination reflective elements on a generally planar surface |
US5943125A (en) * | 1997-02-26 | 1999-08-24 | Acuity Imaging, Llc | Ring illumination apparatus for illuminating reflective elements on a generally planar surface |
JP3961657B2 (ja) * | 1998-03-03 | 2007-08-22 | 株式会社東芝 | パターン寸法測定方法 |
USD423360S (en) * | 1999-06-22 | 2000-04-25 | Shiseido Co., Ltd. | Combined perfume bottle and cap |
US7796801B2 (en) * | 1999-08-26 | 2010-09-14 | Nanogeometry Research Inc. | Pattern inspection apparatus and method |
US6868175B1 (en) * | 1999-08-26 | 2005-03-15 | Nanogeometry Research | Pattern inspection apparatus, pattern inspection method, and recording medium |
US7817844B2 (en) * | 1999-08-26 | 2010-10-19 | Nanogeometry Research Inc. | Pattern inspection apparatus and method |
US6603873B1 (en) * | 1999-11-12 | 2003-08-05 | Applied Materials, Inc. | Defect detection using gray level signatures |
EP1146481A3 (en) * | 2000-03-21 | 2003-10-15 | Nanogeometry Research | Pattern inspection apparatus, pattern inspection method, and recording medium |
JP2002374098A (ja) | 2001-04-13 | 2002-12-26 | Yamaha Corp | 半導体パッケージ及び半導体パッケージの実装方法 |
US7382494B2 (en) * | 2003-06-27 | 2008-06-03 | Xerox Corporation | Method for tag plane growth and contraction for improving object edge rendering |
DE10344409A1 (de) * | 2003-09-25 | 2005-04-28 | Marconi Comm Gmbh | Verfahren zum Fertigen einer Hochfrequenzbaugruppe |
US20050276508A1 (en) * | 2004-06-15 | 2005-12-15 | Lockheed Martin Corporation | Methods and systems for reducing optical noise |
JP4943304B2 (ja) | 2006-12-05 | 2012-05-30 | 株式会社 Ngr | パターン検査装置および方法 |
JP5429869B2 (ja) * | 2008-12-22 | 2014-02-26 | 株式会社 Ngr | パターン検査装置および方法 |
US8150140B2 (en) * | 2008-12-22 | 2012-04-03 | Ngr Inc. | System and method for a semiconductor lithographic process control using statistical information in defect identification |
JP5495934B2 (ja) * | 2010-05-18 | 2014-05-21 | キヤノン株式会社 | 画像処理装置、その処理方法及びプログラム |
US9560808B2 (en) * | 2011-04-19 | 2017-02-07 | Cnh Industrial America Llc | System for controlling bale forming and wrapping operations |
CN109190696A (zh) * | 2018-08-28 | 2019-01-11 | 江苏科技大学苏州理工学院 | 一种物流包裹分类方法、装置、设备及可读存储介质 |
WO2023203400A1 (en) * | 2022-04-19 | 2023-10-26 | 3M Innovative Properties Company | Visual recognition tool for package inspection |
Family Cites Families (17)
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US2629936A (en) * | 1947-09-19 | 1953-03-03 | United Aircraft Corp | Method and apparatus to establish locating points on workpieces |
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JPS6332302A (ja) * | 1986-07-25 | 1988-02-12 | Mitsubishi Electric Corp | リ−ド位置認識装置 |
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JPH077446B2 (ja) * | 1986-11-12 | 1995-01-30 | 松下電器産業株式会社 | 部品認識方法 |
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US4878125A (en) * | 1987-01-08 | 1989-10-31 | Canon Kabushiki Kaisha | Method and apparatus for image processing with fed-back error correction |
JPS6465405A (en) * | 1987-09-04 | 1989-03-10 | Toshiba Corp | Pattern detecting device |
JPH01111281A (ja) * | 1987-10-23 | 1989-04-27 | Matsushita Electric Ind Co Ltd | 部品認識方法 |
US5012524A (en) * | 1989-02-27 | 1991-04-30 | Motorola, Inc. | Automatic inspection method |
-
1990
- 1990-03-26 US US07/498,776 patent/US5137362A/en not_active Expired - Lifetime
- 1990-11-20 MY MYPI90002039A patent/MY104790A/en unknown
-
1991
- 1991-01-10 KR KR1019910000242A patent/KR0169985B1/ko not_active IP Right Cessation
- 1991-03-25 JP JP3132342A patent/JP2515630B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH06123609A (ja) | 1994-05-06 |
US5137362A (en) | 1992-08-11 |
MY104790A (en) | 1994-05-31 |
JP2515630B2 (ja) | 1996-07-10 |
KR910017199A (ko) | 1991-11-05 |
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