KR0146270B1 - 웨이퍼 정렬장치 - Google Patents

웨이퍼 정렬장치

Info

Publication number
KR0146270B1
KR0146270B1 KR1019940015585A KR19940015585A KR0146270B1 KR 0146270 B1 KR0146270 B1 KR 0146270B1 KR 1019940015585 A KR1019940015585 A KR 1019940015585A KR 19940015585 A KR19940015585 A KR 19940015585A KR 0146270 B1 KR0146270 B1 KR 0146270B1
Authority
KR
South Korea
Prior art keywords
wafer
wafer holding
wafers
pitch
holding plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019940015585A
Other languages
English (en)
Korean (ko)
Other versions
KR950004421A (ko
Inventor
도시오 오오노
Original Assignee
기다오까 다까시
미쓰비시 뎅끼 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 기다오까 다까시, 미쓰비시 뎅끼 가부시끼가이샤 filed Critical 기다오까 다까시
Publication of KR950004421A publication Critical patent/KR950004421A/ko
Application granted granted Critical
Publication of KR0146270B1 publication Critical patent/KR0146270B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3411—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • H10P72/3412—Batch transfer of wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/37—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations with orientating and positioning by means of a vibratory bowl or track
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y10S414/138—Wafers positioned vertically within cassette

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Warehouses Or Storage Devices (AREA)
KR1019940015585A 1993-07-01 1994-06-30 웨이퍼 정렬장치 Expired - Fee Related KR0146270B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP93-163656 1993-07-01
JP16365693A JP2812642B2 (ja) 1993-07-01 1993-07-01 ウエハ整列機

Publications (2)

Publication Number Publication Date
KR950004421A KR950004421A (ko) 1995-02-18
KR0146270B1 true KR0146270B1 (ko) 1998-11-02

Family

ID=15778089

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940015585A Expired - Fee Related KR0146270B1 (ko) 1993-07-01 1994-06-30 웨이퍼 정렬장치

Country Status (5)

Country Link
US (1) US5501568A (https=)
JP (1) JP2812642B2 (https=)
KR (1) KR0146270B1 (https=)
DE (1) DE4423207C2 (https=)
TW (1) TW259891B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100914761B1 (ko) * 2002-03-01 2009-08-31 도쿄엘렉트론가부시키가이샤 액처리장치 및 액처리방법

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0992704A (ja) * 1995-09-21 1997-04-04 Nakajima:Kk 半導体用シリコンウェハーの移し替え装置
KR100248864B1 (ko) * 1995-12-29 2000-03-15 윤종용 웨이퍼 이송장치를 위한 챠저 어셈블리
US6286688B1 (en) * 1996-04-03 2001-09-11 Scp Global Technologies, Inc. Compliant silicon wafer handling system
US5735662A (en) * 1996-05-14 1998-04-07 Micron Technology, Inc. Adjustable wafer transfer machine
US6250870B1 (en) 1998-08-05 2001-06-26 Micron Electronics, Inc. Apparatus for handling and processing microelectronic-device substrate assemblies
US6413459B1 (en) * 1998-08-05 2002-07-02 Micron Technology, Inc. Method for handling and processing microelectronic-device substrate assemblies
KR100764938B1 (ko) * 1999-08-27 2007-10-08 브룩스 오토메이션 아게 웨이퍼 스택 조절장치
KR100714262B1 (ko) * 2000-10-13 2007-05-02 삼성전자주식회사 반도체장치 제조설비의 웨이퍼 이송장치 및 그에 따른카세트
JP4180787B2 (ja) * 2000-12-27 2008-11-12 東京エレクトロン株式会社 基板処理装置および基板処理方法
US7628895B2 (en) * 2002-05-09 2009-12-08 Seagate Technology Llc W-patterned tools for transporting/handling pairs of disks
US7367773B2 (en) * 2002-05-09 2008-05-06 Maxtor Corporation Apparatus for combining or separating disk pairs simultaneously
US7083871B2 (en) * 2002-05-09 2006-08-01 Maxtor Corporation Single-sided sputtered magnetic recording disks
US7600359B2 (en) * 2002-05-09 2009-10-13 Seagate Technology Llc Method of merging two disks concentrically without gap between disks
US7180709B2 (en) * 2002-05-09 2007-02-20 Maxtor Corporation Information-storage media with dissimilar outer diameter and/or inner diameter chamfer designs on two sides
US7052739B2 (en) * 2002-05-09 2006-05-30 Maxtor Corporation Method of lubricating multiple magnetic storage disks in close proximity
TWI229324B (en) * 2002-05-09 2005-03-11 Maxtor Corp Method of simultaneous two-disk processing of single-sided magnetic recording disks
US7083376B2 (en) * 2002-10-10 2006-08-01 Maxtor Corporation Automated merge nest for pairs of magnetic storage disks
US7748532B2 (en) * 2002-10-10 2010-07-06 Seagate Technology Llc Cassette for holding disks of different diameters
US8172954B2 (en) * 2002-10-10 2012-05-08 Seagate Technology Llc Apparatus for simultaneous two-disk scrubbing and washing
US7083502B2 (en) * 2002-10-10 2006-08-01 Maxtor Corporation Method for simultaneous two-disk texturing
US7168153B2 (en) * 2002-10-10 2007-01-30 Maxtor Corporation Method for manufacturing single-sided hard memory disks
US7882616B1 (en) * 2004-09-02 2011-02-08 Seagate Technology Llc Manufacturing single-sided storage media
DE502006004199D1 (de) * 2006-11-24 2009-08-20 Jonas & Redmann Automationstec Verfahren zum Bilden einer in einem Prozessboot zu positionierenden Back-to-Back Wafercharge und Handhabungssystem zum Bilden der Back-to-Back Wafercharge
JP5151306B2 (ja) * 2007-08-09 2013-02-27 富士通株式会社 部品供給装置及びその方法
US8567837B2 (en) * 2010-11-24 2013-10-29 Taiwan Semiconductor Manufacturing Company, Ltd. Reconfigurable guide pin design for centering wafers having different sizes
US8936425B2 (en) * 2012-01-23 2015-01-20 Tera Autotech Corporation Ancillary apparatus and method for loading glass substrates into a bracket
CN102651427A (zh) * 2012-04-21 2012-08-29 中国电子科技集团公司第四十八研究所 一种批量硅片导向装置
CN102983229B (zh) * 2012-12-27 2015-05-20 无锡先导自动化设备股份有限公司 太阳能电池片自动上料装置
CN111916384B (zh) * 2020-08-17 2022-05-17 鑫天虹(厦门)科技有限公司 一种键合机对准模块和键合机

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4108323A (en) * 1977-09-28 1978-08-22 Rca Corporation Machine for changing the spacing of a plurality of wafers
US4573851A (en) * 1983-05-18 1986-03-04 Microglass, Inc. Semiconductor wafer transfer apparatus and method
US4695217A (en) * 1983-11-21 1987-09-22 Lau John J Semiconductor wafer transfer apparatus
JPS60182735A (ja) * 1984-02-29 1985-09-18 Tomuko:Kk ウエ−ハの配列ピツチ変更装置
JPS6270437U (https=) * 1985-10-21 1987-05-02
JPS636857A (ja) * 1986-06-26 1988-01-12 Fujitsu Ltd ウエ−ハ移し替え装置
JPS6448442A (en) * 1987-08-19 1989-02-22 Texas Instruments Japan Shifter for semiconductor wafer
US5030057A (en) * 1987-11-06 1991-07-09 Tel Sagami Limited Semiconductor wafer transferring method and apparatus and boat for thermal treatment of a semiconductor wafer
US4856957A (en) * 1988-01-11 1989-08-15 Mactronix, Inc. Semiconductor wafer transfer apparatus with back-to-back positioning and separation
FR2627760B1 (fr) * 1988-02-26 1993-01-22 Stephanois Rech Mec Dispositif pour le transfert d'articles d'au moins un organe support a au moins un autre organe support
JP2590363B2 (ja) * 1988-04-05 1997-03-12 東京エレクトロン株式会社 ピッチ変換機
KR0129405B1 (ko) * 1988-04-25 1998-04-07 하자마 겐쥬 배열된 판형상체의 상호 피치간격을 변환하는 피치변환장치 및 피치변환방법
JPH02169408A (ja) * 1988-12-21 1990-06-29 Matsushita Electric Ind Co Ltd 基板ピッチ変更装置
US4957406A (en) * 1989-05-08 1990-09-18 Intelmatec Corporation Apparatus for transferring disks from one cassette to another with different pitch
JPH0379341A (ja) * 1989-08-22 1991-04-04 Kawasaki Steel Corp 溶接性の良好な塗装鋼板
JPH0384043A (ja) * 1989-08-28 1991-04-09 Nippon Sheet Glass Co Ltd 二酸化珪素被覆ポリカーボネート成形体およびその製造方法
JP2796169B2 (ja) * 1990-03-23 1998-09-10 株式会社タカトリハイテック ウエーハの移載装置
US5188499A (en) * 1990-12-14 1993-02-23 Mactronix Method and apparatus for varying wafer spacing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100914761B1 (ko) * 2002-03-01 2009-08-31 도쿄엘렉트론가부시키가이샤 액처리장치 및 액처리방법

Also Published As

Publication number Publication date
US5501568A (en) 1996-03-26
KR950004421A (ko) 1995-02-18
DE4423207A1 (de) 1995-01-12
JPH0717629A (ja) 1995-01-20
DE4423207C2 (de) 1997-09-25
JP2812642B2 (ja) 1998-10-22
TW259891B (https=) 1995-10-11

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