JPWO2024150368A5 - - Google Patents

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JPWO2024150368A5
JPWO2024150368A5 JP2024569941A JP2024569941A JPWO2024150368A5 JP WO2024150368 A5 JPWO2024150368 A5 JP WO2024150368A5 JP 2024569941 A JP2024569941 A JP 2024569941A JP 2024569941 A JP2024569941 A JP 2024569941A JP WO2024150368 A5 JPWO2024150368 A5 JP WO2024150368A5
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Japan
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region
trench
semiconductor device
trenches
insulating film
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JP2024569941A
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Japanese (ja)
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JP7851428B2 (ja
JPWO2024150368A1 (https=
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Priority claimed from PCT/JP2023/000592 external-priority patent/WO2024150368A1/ja
Publication of JPWO2024150368A1 publication Critical patent/JPWO2024150368A1/ja
Publication of JPWO2024150368A5 publication Critical patent/JPWO2024150368A5/ja
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JP2024569941A 2023-01-12 半導体装置、および、半導体装置の製造方法 Active JP7851428B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/000592 WO2024150368A1 (ja) 2023-01-12 2023-01-12 半導体装置、および、半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JPWO2024150368A1 JPWO2024150368A1 (https=) 2024-07-18
JPWO2024150368A5 true JPWO2024150368A5 (https=) 2025-03-27
JP7851428B2 JP7851428B2 (ja) 2026-04-24

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