JPWO2023190168A5 - - Google Patents
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- Publication number
- JPWO2023190168A5 JPWO2023190168A5 JP2024512358A JP2024512358A JPWO2023190168A5 JP WO2023190168 A5 JPWO2023190168 A5 JP WO2023190168A5 JP 2024512358 A JP2024512358 A JP 2024512358A JP 2024512358 A JP2024512358 A JP 2024512358A JP WO2023190168 A5 JPWO2023190168 A5 JP WO2023190168A5
- Authority
- JP
- Japan
- Prior art keywords
- curable resin
- forming
- substrate
- cured film
- resin layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022058472 | 2022-03-31 | ||
| PCT/JP2023/011841 WO2023190168A1 (ja) | 2022-03-31 | 2023-03-24 | 硬化膜形成方法、インプリントモールド用基板の製造方法、インプリントモールドの製造方法、凹凸構造体の製造方法、パターン形成方法、ハードマスク形成方法、絶縁膜形成方法及び半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023190168A1 JPWO2023190168A1 (https=) | 2023-10-05 |
| JPWO2023190168A5 true JPWO2023190168A5 (https=) | 2024-12-17 |
Family
ID=88201450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024512358A Pending JPWO2023190168A1 (https=) | 2022-03-31 | 2023-03-24 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250282915A1 (https=) |
| JP (1) | JPWO2023190168A1 (https=) |
| KR (1) | KR20240172190A (https=) |
| CN (1) | CN118974885A (https=) |
| TW (1) | TW202406722A (https=) |
| WO (1) | WO2023190168A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI893871B (zh) * | 2024-06-28 | 2025-08-11 | 力晶積成電子製造股份有限公司 | 標記的製造方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07113772B2 (ja) * | 1986-04-21 | 1995-12-06 | 株式会社日立製作所 | 微細パタ−ン形成方法 |
| TW200848935A (en) * | 2007-02-08 | 2008-12-16 | Fujifilm Electronic Materials | Photosensitive compositions employing silicon-containing additives |
| JP2009073078A (ja) * | 2007-09-21 | 2009-04-09 | Fujifilm Corp | 光ナノインプリント用硬化性組成物およびそれを用いた液晶表示装置用部材 |
| JP2010013514A (ja) * | 2008-07-02 | 2010-01-21 | Fujifilm Corp | ナノインプリント用硬化性組成物、これを用いた硬化物、並びに、液晶表示装置用部材 |
| JP5356516B2 (ja) * | 2009-05-20 | 2013-12-04 | 株式会社東芝 | 凹凸パターン形成方法 |
| WO2011049078A1 (ja) * | 2009-10-22 | 2011-04-28 | 日産化学工業株式会社 | ケイ素化合物を用いる膜形成組成物 |
| US8616873B2 (en) * | 2010-01-26 | 2013-12-31 | Molecular Imprints, Inc. | Micro-conformal templates for nanoimprint lithography |
| JP2011183554A (ja) * | 2010-03-04 | 2011-09-22 | Asahi Glass Co Ltd | 微細構造体の製造方法 |
| TWI633157B (zh) * | 2013-10-18 | 2018-08-21 | Shin-Etsu Chemical Co., Ltd. | 紫外線硬化性有機聚矽氧烷組成物及版材之製造方法 |
| JP2016093939A (ja) * | 2014-11-13 | 2016-05-26 | 大日本印刷株式会社 | 抗菌性物品 |
| US11340526B2 (en) * | 2016-05-25 | 2022-05-24 | Dai Nippon Printing Co., Ltd. | Production method of template, template blank, and template substrate for imprinting, production method of template for imprinting, and template |
| WO2019131351A1 (ja) * | 2017-12-27 | 2019-07-04 | 富士フイルム株式会社 | レジスト組成物、レジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
| TWI858038B (zh) | 2019-03-29 | 2024-10-11 | 日商大日本印刷股份有限公司 | 壓印用光硬化性樹脂組合物、壓印用光硬化性樹脂組合物之製造方法、及圖案形成體之製造方法 |
-
2023
- 2023-03-24 JP JP2024512358A patent/JPWO2023190168A1/ja active Pending
- 2023-03-24 KR KR1020247035943A patent/KR20240172190A/ko active Pending
- 2023-03-24 US US18/852,969 patent/US20250282915A1/en active Pending
- 2023-03-24 CN CN202380031542.2A patent/CN118974885A/zh active Pending
- 2023-03-24 WO PCT/JP2023/011841 patent/WO2023190168A1/ja not_active Ceased
- 2023-03-29 TW TW112111873A patent/TW202406722A/zh unknown
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