JPWO2023157441A5 - - Google Patents
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- JPWO2023157441A5 JPWO2023157441A5 JP2024500975A JP2024500975A JPWO2023157441A5 JP WO2023157441 A5 JPWO2023157441 A5 JP WO2023157441A5 JP 2024500975 A JP2024500975 A JP 2024500975A JP 2024500975 A JP2024500975 A JP 2024500975A JP WO2023157441 A5 JPWO2023157441 A5 JP WO2023157441A5
- Authority
- JP
- Japan
- Prior art keywords
- molecule
- atom
- compound
- carbon atoms
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022022023 | 2022-02-16 | ||
| PCT/JP2022/045918 WO2023157441A1 (ja) | 2022-02-16 | 2022-12-13 | エッチング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023157441A1 JPWO2023157441A1 (https=) | 2023-08-24 |
| JPWO2023157441A5 true JPWO2023157441A5 (https=) | 2024-10-21 |
Family
ID=87577943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024500975A Pending JPWO2023157441A1 (https=) | 2022-02-16 | 2022-12-13 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250343048A1 (https=) |
| EP (1) | EP4481794A4 (https=) |
| JP (1) | JPWO2023157441A1 (https=) |
| KR (1) | KR20240148841A (https=) |
| CN (1) | CN118679554A (https=) |
| TW (1) | TWI839042B (https=) |
| WO (1) | WO2023157441A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025121211A1 (ja) * | 2023-12-04 | 2025-06-12 | 株式会社レゾナック | エッチング方法 |
| WO2025254850A1 (en) * | 2024-06-04 | 2025-12-11 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Cryogenic etching using sof2 and its family |
| WO2025254704A1 (en) * | 2024-06-04 | 2025-12-11 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Cryogenic etching using carbon oxy halides |
| JP7832526B1 (ja) * | 2024-09-09 | 2026-03-18 | ダイキン工業株式会社 | エッチングガス |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US153771A (en) | 1874-08-04 | Improvement in sash-holders | ||
| JPH07201812A (ja) * | 1994-01-11 | 1995-08-04 | Tadahiro Omi | 固体表面処理装置及び処理方法、不動態膜形成装置及び方法、並びにプロセス装置 |
| KR100796067B1 (ko) * | 2006-05-09 | 2008-01-21 | 울산화학주식회사 | 반도체 제조용 건식 에칭 개스 및 그의 제조방법 |
| US9401240B2 (en) * | 2010-03-01 | 2016-07-26 | California Institute Of Technology | Integrated passive iron shims in silicon |
| US9711365B2 (en) * | 2014-05-02 | 2017-07-18 | International Business Machines Corporation | Etch rate enhancement for a silicon etch process through etch chamber pretreatment |
| JP6788176B2 (ja) * | 2015-04-06 | 2020-11-25 | セントラル硝子株式会社 | ドライエッチングガスおよびドライエッチング方法 |
| KR102652512B1 (ko) * | 2015-11-10 | 2024-03-28 | 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 | 에칭 반응물 및 이를 사용한 플라즈마-부재 옥사이드 에칭 공정 |
| JP6822763B2 (ja) * | 2015-11-16 | 2021-01-27 | セントラル硝子株式会社 | ドライエッチング方法 |
| JP6867581B2 (ja) * | 2016-02-09 | 2021-04-28 | セントラル硝子株式会社 | フッ素ガスの精製方法 |
| KR102675453B1 (ko) * | 2018-03-29 | 2024-06-17 | 샌트랄 글래스 컴퍼니 리미티드 | 기판 처리용 가스, 보관 용기 및 기판 처리 방법 |
| JPWO2023234305A1 (https=) * | 2022-05-31 | 2023-12-07 |
-
2022
- 2022-12-13 CN CN202280091495.6A patent/CN118679554A/zh active Pending
- 2022-12-13 WO PCT/JP2022/045918 patent/WO2023157441A1/ja not_active Ceased
- 2022-12-13 JP JP2024500975A patent/JPWO2023157441A1/ja active Pending
- 2022-12-13 US US18/839,152 patent/US20250343048A1/en active Pending
- 2022-12-13 EP EP22927327.1A patent/EP4481794A4/en active Pending
- 2022-12-13 KR KR1020247027141A patent/KR20240148841A/ko active Pending
- 2022-12-26 TW TW111149910A patent/TWI839042B/zh active
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