JPWO2023139779A5 - - Google Patents

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Publication number
JPWO2023139779A5
JPWO2023139779A5 JP2023575022A JP2023575022A JPWO2023139779A5 JP WO2023139779 A5 JPWO2023139779 A5 JP WO2023139779A5 JP 2023575022 A JP2023575022 A JP 2023575022A JP 2023575022 A JP2023575022 A JP 2023575022A JP WO2023139779 A5 JPWO2023139779 A5 JP WO2023139779A5
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JP
Japan
Prior art keywords
metal layer
superconducting metal
superconducting
substrate
josephson element
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JP2023575022A
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English (en)
Japanese (ja)
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JPWO2023139779A1 (https=
JP7806814B2 (ja
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Priority claimed from PCT/JP2022/002371 external-priority patent/WO2023139779A1/ja
Publication of JPWO2023139779A1 publication Critical patent/JPWO2023139779A1/ja
Publication of JPWO2023139779A5 publication Critical patent/JPWO2023139779A5/ja
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JP2023575022A 2022-01-24 2022-01-24 ジョセフソン素子、超伝導回路、量子演算装置及びジョセフソン素子の製造方法 Active JP7806814B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/002371 WO2023139779A1 (ja) 2022-01-24 2022-01-24 ジョセフソン素子、超伝導回路、量子演算装置及びジョセフソン素子の製造方法

Publications (3)

Publication Number Publication Date
JPWO2023139779A1 JPWO2023139779A1 (https=) 2023-07-27
JPWO2023139779A5 true JPWO2023139779A5 (https=) 2024-10-02
JP7806814B2 JP7806814B2 (ja) 2026-01-27

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ID=87348417

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JP2023575022A Active JP7806814B2 (ja) 2022-01-24 2022-01-24 ジョセフソン素子、超伝導回路、量子演算装置及びジョセフソン素子の製造方法

Country Status (4)

Country Link
US (1) US20240431216A1 (https=)
EP (1) EP4471830B1 (https=)
JP (1) JP7806814B2 (https=)
WO (1) WO2023139779A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116940217A (zh) 2022-03-29 2023-10-24 腾讯科技（深圳）有限公司 约瑟夫森结制备方法及生产线设备
JP2025149087A (ja) * 2024-03-26 2025-10-08 富士通株式会社 ジョセフソン素子、量子ビット、及びジョセフソン素子の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02288403A (ja) 1989-04-27 1990-11-28 Nec Corp 超伝導モノリシック集積回路およびその製造方法
JPH03190289A (ja) * 1989-12-20 1991-08-20 Fujitsu Ltd ジョセフソン接合素子及びその製造方法
JP2827572B2 (ja) * 1991-05-24 1998-11-25 日本電気株式会社 層状超伝導体回路とその製造方法
JPH05102547A (ja) * 1991-05-30 1993-04-23 Fujitsu Ltd ジヨセフソン集積回路装置の製造方法
JPH05243628A (ja) * 1992-02-28 1993-09-21 Fujitsu Ltd ジョセフソン接合素子及びその製造方法
JPH05315659A (ja) 1992-05-06 1993-11-26 Nippon Steel Corp 放射線検出素子
US7060508B2 (en) 2003-02-12 2006-06-13 Northrop Grumman Corporation Self-aligned junction passivation for superconductor integrated circuit
US7615385B2 (en) * 2006-09-20 2009-11-10 Hypres, Inc Double-masking technique for increasing fabrication yield in superconducting electronics
US9177814B2 (en) 2013-03-15 2015-11-03 International Business Machines Corporation Suspended superconducting qubits
US9385294B2 (en) * 2014-09-26 2016-07-05 International Business Machines Corporation Diamond substrates for superconducting quantum circuits
EP3685451B1 (en) * 2017-09-18 2021-01-13 Google LLC Reducing junction resistance variation in two-step deposition processes
WO2019117883A1 (en) * 2017-12-13 2019-06-20 Intel Corporation Qubit devices with josephson junctions fabricated using air bridge or cantilever
US10256392B1 (en) * 2018-03-23 2019-04-09 International Business Machines Corporation Vertical transmon qubit device
CN113921691B (zh) * 2021-12-07 2022-03-18 材料科学姑苏实验室 一种约瑟夫森结、约瑟夫森结阵列、其制备方法和用途

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