JPWO2023054157A5 - - Google Patents

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Publication number
JPWO2023054157A5
JPWO2023054157A5 JP2023551410A JP2023551410A JPWO2023054157A5 JP WO2023054157 A5 JPWO2023054157 A5 JP WO2023054157A5 JP 2023551410 A JP2023551410 A JP 2023551410A JP 2023551410 A JP2023551410 A JP 2023551410A JP WO2023054157 A5 JPWO2023054157 A5 JP WO2023054157A5
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JP
Japan
Prior art keywords
deformable mirror
mirror according
reflective layer
reflective
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023551410A
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English (en)
Japanese (ja)
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JPWO2023054157A1 (https=
JP7587318B2 (ja
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Publication date
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Priority claimed from PCT/JP2022/035337 external-priority patent/WO2023054157A1/ja
Publication of JPWO2023054157A1 publication Critical patent/JPWO2023054157A1/ja
Publication of JPWO2023054157A5 publication Critical patent/JPWO2023054157A5/ja
Priority to JP2024191535A priority Critical patent/JP2025020263A/ja
Application granted granted Critical
Publication of JP7587318B2 publication Critical patent/JP7587318B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2023551410A 2021-10-01 2022-09-22 形状可変ミラーおよびｘ線装置 Active JP7587318B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024191535A JP2025020263A (ja) 2021-10-01 2024-10-31 形状可変ミラー

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021163085 2021-10-01
JP2021163085 2021-10-01
PCT/JP2022/035337 WO2023054157A1 (ja) 2021-10-01 2022-09-22 形状可変ミラーおよびｘ線装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024191535A Division JP2025020263A (ja) 2021-10-01 2024-10-31 形状可変ミラー

Publications (3)

Publication Number Publication Date
JPWO2023054157A1 JPWO2023054157A1 (https=) 2023-04-06
JPWO2023054157A5 true JPWO2023054157A5 (https=) 2024-06-04
JP7587318B2 JP7587318B2 (ja) 2024-11-20

Family

ID=85782540

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2023551410A Active JP7587318B2 (ja) 2021-10-01 2022-09-22 形状可変ミラーおよびｘ線装置
JP2024191535A Pending JP2025020263A (ja) 2021-10-01 2024-10-31 形状可変ミラー

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024191535A Pending JP2025020263A (ja) 2021-10-01 2024-10-31 形状可変ミラー

Country Status (5)

Country Link
US (1) US20250132065A1 (https=)
EP (1) EP4411754A4 (https=)
JP (2) JP7587318B2 (https=)
CN (1) CN117941011A (https=)
WO (1) WO2023054157A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119694626B (zh) * 2024-12-16 2025-10-10 中国科学院上海高等研究院 聚焦装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3259373B2 (ja) * 1992-11-27 2002-02-25 株式会社日立製作所 露光方法及び露光装置
JPH06258498A (ja) * 1993-03-08 1994-09-16 Aloka Co Ltd 結晶モノクロメータ
JP2002122719A (ja) * 2000-08-08 2002-04-26 Olympus Optical Co Ltd 光学装置
FR2866122B1 (fr) * 2004-02-06 2006-05-19 Europ De Systemes Optiques Soc Miroir bimorphe.
JP4814782B2 (ja) * 2006-12-28 2011-11-16 株式会社ジェイテック 位相回復法を用いたｘ線集光方法及びその装置
WO2012126954A1 (en) * 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102014216458A1 (de) * 2014-08-19 2016-02-25 Carl Zeiss Smt Gmbh Optisches Element mit einer Beschichtung zur Beeinflussung von Heizstrahlung und optische Anordnung
DE102015213275A1 (de) * 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Spiegelanordnung für eine Lithographiebelichtungsanlage und Spiegelanordnung umfassendes optisches System
WO2017051890A1 (ja) 2015-09-25 2017-03-30 国立大学法人大阪大学 Ｘ線顕微鏡
DE102017203647A1 (de) * 2017-03-07 2018-09-13 Carl Zeiss Smt Gmbh Spiegel mit einer piezoelektrisch aktiven Schicht
DE102018212508A1 (de) * 2018-07-26 2020-01-30 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines deformierbaren Spiegels
WO2020148911A1 (ja) * 2019-01-18 2020-07-23 株式会社ジェイテックコーポレーション 形状可変ミラー及びその製造方法
JP7324989B2 (ja) 2019-07-30 2023-08-14 株式会社ジェイテックコーポレーション 形状可変ミラー
US11681155B2 (en) * 2019-08-07 2023-06-20 Teledyne Micralyne Inc. Asymmetric deformable diffractive grating modulator
KR102825008B1 (ko) * 2020-02-05 2025-06-27 삼성디스플레이 주식회사 광학 검사 장치

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