JP7587318B2 - 形状可変ミラーおよびｘ線装置 - Google Patents

形状可変ミラーおよびｘ線装置 Download PDF

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Publication number
JP7587318B2
JP7587318B2 JP2023551410A JP2023551410A JP7587318B2 JP 7587318 B2 JP7587318 B2 JP 7587318B2 JP 2023551410 A JP2023551410 A JP 2023551410A JP 2023551410 A JP2023551410 A JP 2023551410A JP 7587318 B2 JP7587318 B2 JP 7587318B2
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Japan
Prior art keywords
deformable mirror
mirror
substrate
ray
optical system
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Japanese (ja)
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JPWO2023054157A1 (https=
JPWO2023054157A5 (https=
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智至 松山
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Tokai National Higher Education and Research System NUC
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Tokai National Higher Education and Research System NUC
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/08—Holders for targets or for other objects to be irradiated
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2023551410A 2021-10-01 2022-09-22 形状可変ミラーおよびｘ線装置 Active JP7587318B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024191535A JP2025020263A (ja) 2021-10-01 2024-10-31 形状可変ミラー

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021163085 2021-10-01
JP2021163085 2021-10-01
PCT/JP2022/035337 WO2023054157A1 (ja) 2021-10-01 2022-09-22 形状可変ミラーおよびｘ線装置

Related Child Applications (1)

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JP2024191535A Division JP2025020263A (ja) 2021-10-01 2024-10-31 形状可変ミラー

Publications (3)

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JPWO2023054157A1 JPWO2023054157A1 (https=) 2023-04-06
JPWO2023054157A5 JPWO2023054157A5 (https=) 2024-06-04
JP7587318B2 true JP7587318B2 (ja) 2024-11-20

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JP2023551410A Active JP7587318B2 (ja) 2021-10-01 2022-09-22 形状可変ミラーおよびｘ線装置
JP2024191535A Pending JP2025020263A (ja) 2021-10-01 2024-10-31 形状可変ミラー

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JP2024191535A Pending JP2025020263A (ja) 2021-10-01 2024-10-31 形状可変ミラー

Country Status (5)

Country Link
US (1) US20250132065A1 (https=)
EP (1) EP4411754A4 (https=)
JP (2) JP7587318B2 (https=)
CN (1) CN117941011A (https=)
WO (1) WO2023054157A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119694626B (zh) * 2024-12-16 2025-10-10 中国科学院上海高等研究院 聚焦装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002122719A (ja) 2000-08-08 2002-04-26 Olympus Optical Co Ltd 光学装置
JP2007527030A (ja) 2004-02-06 2007-09-20 ソシエテ、ユーロペーヌ、ド、システム、オプティク 半剛性材料からなる中央コアにより分離された２枚の圧電層を備えたバイモルフミラー
WO2008081873A1 (ja) 2006-12-28 2008-07-10 Jtec Corporation 位相回復法を用いたｘ線集光方法及びその装置
JP2018522280A (ja) 2015-07-15 2018-08-09 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ露光装置のミラー構成体及びミラー構成体を含む光学系

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3259373B2 (ja) * 1992-11-27 2002-02-25 株式会社日立製作所 露光方法及び露光装置
JPH06258498A (ja) * 1993-03-08 1994-09-16 Aloka Co Ltd 結晶モノクロメータ
WO2012126954A1 (en) * 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102014216458A1 (de) * 2014-08-19 2016-02-25 Carl Zeiss Smt Gmbh Optisches Element mit einer Beschichtung zur Beeinflussung von Heizstrahlung und optische Anordnung
WO2017051890A1 (ja) 2015-09-25 2017-03-30 国立大学法人大阪大学 Ｘ線顕微鏡
DE102017203647A1 (de) * 2017-03-07 2018-09-13 Carl Zeiss Smt Gmbh Spiegel mit einer piezoelektrisch aktiven Schicht
DE102018212508A1 (de) * 2018-07-26 2020-01-30 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines deformierbaren Spiegels
WO2020148911A1 (ja) * 2019-01-18 2020-07-23 株式会社ジェイテックコーポレーション 形状可変ミラー及びその製造方法
JP7324989B2 (ja) 2019-07-30 2023-08-14 株式会社ジェイテックコーポレーション 形状可変ミラー
US11681155B2 (en) * 2019-08-07 2023-06-20 Teledyne Micralyne Inc. Asymmetric deformable diffractive grating modulator
KR102825008B1 (ko) * 2020-02-05 2025-06-27 삼성디스플레이 주식회사 광학 검사 장치

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002122719A (ja) 2000-08-08 2002-04-26 Olympus Optical Co Ltd 光学装置
JP2007527030A (ja) 2004-02-06 2007-09-20 ソシエテ、ユーロペーヌ、ド、システム、オプティク 半剛性材料からなる中央コアにより分離された２枚の圧電層を備えたバイモルフミラー
WO2008081873A1 (ja) 2006-12-28 2008-07-10 Jtec Corporation 位相回復法を用いたｘ線集光方法及びその装置
JP2018522280A (ja) 2015-07-15 2018-08-09 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ露光装置のミラー構成体及びミラー構成体を含む光学系

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Publication number Publication date
EP4411754A4 (en) 2025-10-15
JPWO2023054157A1 (https=) 2023-04-06
WO2023054157A1 (ja) 2023-04-06
US20250132065A1 (en) 2025-04-24
EP4411754A1 (en) 2024-08-07
CN117941011A (zh) 2024-04-26
JP2025020263A (ja) 2025-02-12

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