CN117941011A - 可变形镜以及x射线装置 - Google Patents

可变形镜以及x射线装置 Download PDF

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Publication number
CN117941011A
CN117941011A CN202280062440.2A CN202280062440A CN117941011A CN 117941011 A CN117941011 A CN 117941011A CN 202280062440 A CN202280062440 A CN 202280062440A CN 117941011 A CN117941011 A CN 117941011A
Authority
CN
China
Prior art keywords
deformable mirror
ray
substrate
mirror
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280062440.2A
Other languages
English (en)
Chinese (zh)
Inventor
松山智至
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National University Corp Donghai National University
Original Assignee
National University Corp Donghai National University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National University Corp Donghai National University filed Critical National University Corp Donghai National University
Publication of CN117941011A publication Critical patent/CN117941011A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/08—Holders for targets or for other objects to be irradiated
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN202280062440.2A 2021-10-01 2022-09-22 可变形镜以及x射线装置 Pending CN117941011A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021-163085 2021-10-01
JP2021163085 2021-10-01
PCT/JP2022/035337 WO2023054157A1 (ja) 2021-10-01 2022-09-22 形状可変ミラーおよびｘ線装置

Publications (1)

Publication Number Publication Date
CN117941011A true CN117941011A (zh) 2024-04-26

Family

ID=85782540

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280062440.2A Pending CN117941011A (zh) 2021-10-01 2022-09-22 可变形镜以及x射线装置

Country Status (5)

Country Link
US (1) US20250132065A1 (https=)
EP (1) EP4411754A4 (https=)
JP (2) JP7587318B2 (https=)
CN (1) CN117941011A (https=)
WO (1) WO2023054157A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119694626A (zh) * 2024-12-16 2025-03-25 中国科学院上海高等研究院 聚焦装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3259373B2 (ja) * 1992-11-27 2002-02-25 株式会社日立製作所 露光方法及び露光装置
JPH06258498A (ja) * 1993-03-08 1994-09-16 Aloka Co Ltd 結晶モノクロメータ
JP2002122719A (ja) * 2000-08-08 2002-04-26 Olympus Optical Co Ltd 光学装置
FR2866122B1 (fr) * 2004-02-06 2006-05-19 Europ De Systemes Optiques Soc Miroir bimorphe.
JP4814782B2 (ja) * 2006-12-28 2011-11-16 株式会社ジェイテック 位相回復法を用いたｘ線集光方法及びその装置
WO2012126954A1 (en) * 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102014216458A1 (de) * 2014-08-19 2016-02-25 Carl Zeiss Smt Gmbh Optisches Element mit einer Beschichtung zur Beeinflussung von Heizstrahlung und optische Anordnung
DE102015213275A1 (de) * 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Spiegelanordnung für eine Lithographiebelichtungsanlage und Spiegelanordnung umfassendes optisches System
WO2017051890A1 (ja) 2015-09-25 2017-03-30 国立大学法人大阪大学 Ｘ線顕微鏡
DE102017203647A1 (de) * 2017-03-07 2018-09-13 Carl Zeiss Smt Gmbh Spiegel mit einer piezoelektrisch aktiven Schicht
DE102018212508A1 (de) * 2018-07-26 2020-01-30 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines deformierbaren Spiegels
WO2020148911A1 (ja) * 2019-01-18 2020-07-23 株式会社ジェイテックコーポレーション 形状可変ミラー及びその製造方法
JP7324989B2 (ja) 2019-07-30 2023-08-14 株式会社ジェイテックコーポレーション 形状可変ミラー
US11681155B2 (en) * 2019-08-07 2023-06-20 Teledyne Micralyne Inc. Asymmetric deformable diffractive grating modulator
KR102825008B1 (ko) * 2020-02-05 2025-06-27 삼성디스플레이 주식회사 광학 검사 장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119694626A (zh) * 2024-12-16 2025-03-25 中国科学院上海高等研究院 聚焦装置

Also Published As

Publication number Publication date
EP4411754A4 (en) 2025-10-15
JPWO2023054157A1 (https=) 2023-04-06
WO2023054157A1 (ja) 2023-04-06
US20250132065A1 (en) 2025-04-24
EP4411754A1 (en) 2024-08-07
JP2025020263A (ja) 2025-02-12
JP7587318B2 (ja) 2024-11-20

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