JPWO2022239284A5 - - Google Patents
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- Publication number
- JPWO2022239284A5 JPWO2022239284A5 JP2023520756A JP2023520756A JPWO2022239284A5 JP WO2022239284 A5 JPWO2022239284 A5 JP WO2022239284A5 JP 2023520756 A JP2023520756 A JP 2023520756A JP 2023520756 A JP2023520756 A JP 2023520756A JP WO2022239284 A5 JPWO2022239284 A5 JP WO2022239284A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- section
- region
- trench
- conductivity type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 21
- 239000000758 substrate Substances 0.000 claims 8
- 230000015556 catabolic process Effects 0.000 claims 6
- 238000009825 accumulation Methods 0.000 claims 4
- 239000011229 interlayer Substances 0.000 claims 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021080620 | 2021-05-11 | ||
| JP2021080620 | 2021-05-11 | ||
| PCT/JP2021/045100 WO2022239284A1 (ja) | 2021-05-11 | 2021-12-08 | 半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022239284A1 JPWO2022239284A1 (enExample) | 2022-11-17 |
| JPWO2022239284A5 true JPWO2022239284A5 (enExample) | 2023-07-18 |
| JP7613569B2 JP7613569B2 (ja) | 2025-01-15 |
Family
ID=84028076
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023520756A Active JP7613569B2 (ja) | 2021-05-11 | 2021-12-08 | 半導体装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20230268342A1 (enExample) |
| JP (1) | JP7613569B2 (enExample) |
| CN (1) | CN116420219A (enExample) |
| DE (1) | DE112021004621T5 (enExample) |
| WO (1) | WO2022239284A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117561612A (zh) * | 2022-01-20 | 2024-02-13 | 富士电机株式会社 | 半导体装置 |
| TW202531876A (zh) * | 2024-01-22 | 2025-08-01 | 日商新電元工業股份有限公司 | 半導體裝置 |
| JP2025132606A (ja) * | 2024-02-29 | 2025-09-10 | ミネベアパワーデバイス株式会社 | 半導体装置、および、電力変換装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4500530B2 (ja) * | 2003-11-05 | 2010-07-14 | トヨタ自動車株式会社 | 絶縁ゲート型半導体装置およびその製造方法 |
| US7923815B2 (en) * | 2008-01-07 | 2011-04-12 | International Business Machines Corporation | DRAM having deep trench capacitors with lightly doped buried plates |
| JP2016162855A (ja) * | 2015-02-27 | 2016-09-05 | 株式会社日立製作所 | 半導体装置およびそれを用いた電力変換装置 |
| DE112017000297T5 (de) * | 2016-08-12 | 2018-11-15 | Fuji Electric Co., Ltd. | Halbleiterbauteil und Herstellungsverfahren eines Halbleiterbauteils |
| JP7325931B2 (ja) * | 2017-05-16 | 2023-08-15 | 富士電機株式会社 | 半導体装置 |
| DE102017124871B4 (de) | 2017-10-24 | 2021-06-17 | Infineon Technologies Ag | Leistungshalbleiter-Vorrichtung und Verfahren zum Herstellen einer Leistungshalbleiter-Vorrichtung |
| JP7102808B2 (ja) * | 2018-03-15 | 2022-07-20 | 富士電機株式会社 | 半導体装置 |
| JP6992895B2 (ja) * | 2018-06-21 | 2022-01-13 | 富士電機株式会社 | 半導体装置および製造方法 |
| JP7404702B2 (ja) * | 2019-08-09 | 2023-12-26 | 富士電機株式会社 | 半導体装置 |
-
2021
- 2021-12-08 WO PCT/JP2021/045100 patent/WO2022239284A1/ja not_active Ceased
- 2021-12-08 DE DE112021004621.7T patent/DE112021004621T5/de active Pending
- 2021-12-08 JP JP2023520756A patent/JP7613569B2/ja active Active
- 2021-12-08 CN CN202180072400.1A patent/CN116420219A/zh active Pending
-
2023
- 2023-04-24 US US18/305,387 patent/US20230268342A1/en active Pending
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