JPWO2021241581A1 - - Google Patents
Info
- Publication number
- JPWO2021241581A1 JPWO2021241581A1 JP2022526584A JP2022526584A JPWO2021241581A1 JP WO2021241581 A1 JPWO2021241581 A1 JP WO2021241581A1 JP 2022526584 A JP2022526584 A JP 2022526584A JP 2022526584 A JP2022526584 A JP 2022526584A JP WO2021241581 A1 JPWO2021241581 A1 JP WO2021241581A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020094819 | 2020-05-29 | ||
| JP2020094819 | 2020-05-29 | ||
| PCT/JP2021/019805 WO2021241581A1 (ja) | 2020-05-29 | 2021-05-25 | 感光性樹脂組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021241581A1 true JPWO2021241581A1 (https=) | 2021-12-02 |
| JPWO2021241581A5 JPWO2021241581A5 (https=) | 2022-11-01 |
| JP7211560B2 JP7211560B2 (ja) | 2023-01-24 |
Family
ID=78744092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022526584A Active JP7211560B2 (ja) | 2020-05-29 | 2021-05-25 | 感光性樹脂組成物 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7211560B2 (https=) |
| KR (1) | KR102773392B1 (https=) |
| CN (1) | CN115698855A (https=) |
| TW (1) | TW202208474A (https=) |
| WO (1) | WO2021241581A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025263530A1 (ja) * | 2024-06-19 | 2025-12-26 | 住友ベークライト株式会社 | 感光性樹脂組成物、硬化膜および半導体装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012123378A (ja) * | 2010-11-17 | 2012-06-28 | Asahi Kasei E-Materials Corp | 半導体素子表面保護膜又は層間絶縁膜用の感光性樹脂組成物 |
| WO2018088469A1 (ja) * | 2016-11-11 | 2018-05-17 | 住友ベークライト株式会社 | 感光性樹脂組成物、樹脂膜、硬化膜、半導体装置の製造方法、および半導体装置 |
| JP2019053220A (ja) * | 2017-09-15 | 2019-04-04 | 住友ベークライト株式会社 | 感光性樹脂組成物、半導体装置および電子機器 |
| JP2019101052A (ja) * | 2017-11-28 | 2019-06-24 | 日立化成株式会社 | 感光性樹脂組成物及び回路基板の製造方法 |
| JP2019109425A (ja) * | 2017-12-20 | 2019-07-04 | 住友ベークライト株式会社 | 永久膜形成用ネガ型感光性樹脂組成物、当該組成物の硬化膜および当該硬化膜を備える電気・電子機器 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007213032A (ja) | 2006-01-10 | 2007-08-23 | Hitachi Chemical Dupont Microsystems Ltd | ポジ型感光性樹脂組成物、パターン形成方法及び電子部品 |
| KR102015682B1 (ko) * | 2012-02-07 | 2019-08-28 | 히타치가세이가부시끼가이샤 | 감광성 수지 조성물, 패턴 경화막의 제조 방법 및 전자 부품 |
| JP6477925B2 (ja) * | 2016-09-08 | 2019-03-06 | 住友ベークライト株式会社 | 半導体装置の製造方法 |
| JP6566150B2 (ja) * | 2017-06-30 | 2019-08-28 | 住友ベークライト株式会社 | 感光性樹脂組成物、樹脂膜及び電子装置 |
| WO2019003918A1 (ja) * | 2017-06-30 | 2019-01-03 | 住友ベークライト株式会社 | 感光性樹脂組成物、樹脂膜及び電子装置 |
-
2021
- 2021-05-25 WO PCT/JP2021/019805 patent/WO2021241581A1/ja not_active Ceased
- 2021-05-25 KR KR1020227044405A patent/KR102773392B1/ko active Active
- 2021-05-25 CN CN202180038895.6A patent/CN115698855A/zh active Pending
- 2021-05-25 JP JP2022526584A patent/JP7211560B2/ja active Active
- 2021-05-28 TW TW110119409A patent/TW202208474A/zh unknown
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012123378A (ja) * | 2010-11-17 | 2012-06-28 | Asahi Kasei E-Materials Corp | 半導体素子表面保護膜又は層間絶縁膜用の感光性樹脂組成物 |
| WO2018088469A1 (ja) * | 2016-11-11 | 2018-05-17 | 住友ベークライト株式会社 | 感光性樹脂組成物、樹脂膜、硬化膜、半導体装置の製造方法、および半導体装置 |
| JP2019070832A (ja) * | 2016-11-11 | 2019-05-09 | 住友ベークライト株式会社 | 半導体装置の製造方法 |
| JP2019053220A (ja) * | 2017-09-15 | 2019-04-04 | 住友ベークライト株式会社 | 感光性樹脂組成物、半導体装置および電子機器 |
| JP2019101052A (ja) * | 2017-11-28 | 2019-06-24 | 日立化成株式会社 | 感光性樹脂組成物及び回路基板の製造方法 |
| JP2019109425A (ja) * | 2017-12-20 | 2019-07-04 | 住友ベークライト株式会社 | 永久膜形成用ネガ型感光性樹脂組成物、当該組成物の硬化膜および当該硬化膜を備える電気・電子機器 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN115698855A (zh) | 2023-02-03 |
| JP7211560B2 (ja) | 2023-01-24 |
| WO2021241581A1 (ja) | 2021-12-02 |
| TW202208474A (zh) | 2022-03-01 |
| KR20230013084A (ko) | 2023-01-26 |
| KR102773392B1 (ko) | 2025-02-27 |
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