KR102773392B1 - 감광성 수지 조성물 - Google Patents

감광성 수지 조성물 Download PDF

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Publication number
KR102773392B1
KR102773392B1 KR1020227044405A KR20227044405A KR102773392B1 KR 102773392 B1 KR102773392 B1 KR 102773392B1 KR 1020227044405 A KR1020227044405 A KR 1020227044405A KR 20227044405 A KR20227044405 A KR 20227044405A KR 102773392 B1 KR102773392 B1 KR 102773392B1
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KR
South Korea
Prior art keywords
resin composition
photosensitive resin
component
film
mass
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KR1020227044405A
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English (en)
Korean (ko)
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KR20230013084A (ko
Inventor
다로 기타하라
세이지 모리
Original Assignee
스미또모 베이크라이트 가부시키가이샤
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Publication of KR20230013084A publication Critical patent/KR20230013084A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Formation Of Insulating Films (AREA)
KR1020227044405A 2020-05-29 2021-05-25 감광성 수지 조성물 Active KR102773392B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020094819 2020-05-29
JPJP-P-2020-094819 2020-05-29
PCT/JP2021/019805 WO2021241581A1 (ja) 2020-05-29 2021-05-25 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
KR20230013084A KR20230013084A (ko) 2023-01-26
KR102773392B1 true KR102773392B1 (ko) 2025-02-27

Family

ID=78744092

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227044405A Active KR102773392B1 (ko) 2020-05-29 2021-05-25 감광성 수지 조성물

Country Status (5)

Country Link
JP (1) JP7211560B2 (https=)
KR (1) KR102773392B1 (https=)
CN (1) CN115698855A (https=)
TW (1) TW202208474A (https=)
WO (1) WO2021241581A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025263530A1 (ja) * 2024-06-19 2025-12-26 住友ベークライト株式会社 感光性樹脂組成物、硬化膜および半導体装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007213032A (ja) 2006-01-10 2007-08-23 Hitachi Chemical Dupont Microsystems Ltd ポジ型感光性樹脂組成物、パターン形成方法及び電子部品
JP6026097B2 (ja) * 2010-11-17 2016-11-16 旭化成株式会社 半導体素子表面保護膜又は層間絶縁膜用の感光性樹脂組成物
KR102015682B1 (ko) * 2012-02-07 2019-08-28 히타치가세이가부시끼가이샤 감광성 수지 조성물, 패턴 경화막의 제조 방법 및 전자 부품
JP6477925B2 (ja) * 2016-09-08 2019-03-06 住友ベークライト株式会社 半導体装置の製造方法
KR102004129B1 (ko) * 2016-11-11 2019-07-25 스미또모 베이크라이트 가부시키가이샤 감광성 수지 조성물, 수지막, 경화막, 반도체 장치의 제조 방법, 및 반도체 장치
JP6566150B2 (ja) * 2017-06-30 2019-08-28 住友ベークライト株式会社 感光性樹脂組成物、樹脂膜及び電子装置
WO2019003918A1 (ja) * 2017-06-30 2019-01-03 住友ベークライト株式会社 感光性樹脂組成物、樹脂膜及び電子装置
JP7062899B2 (ja) 2017-09-15 2022-05-09 住友ベークライト株式会社 感光性樹脂組成物、半導体装置および電子機器
JP2019101052A (ja) 2017-11-28 2019-06-24 日立化成株式会社 感光性樹脂組成物及び回路基板の製造方法
JP7081138B2 (ja) 2017-12-20 2022-06-07 住友ベークライト株式会社 永久膜形成用ネガ型感光性樹脂組成物、当該組成物の硬化膜および当該硬化膜を備える電気・電子機器

Also Published As

Publication number Publication date
JPWO2021241581A1 (https=) 2021-12-02
CN115698855A (zh) 2023-02-03
JP7211560B2 (ja) 2023-01-24
WO2021241581A1 (ja) 2021-12-02
TW202208474A (zh) 2022-03-01
KR20230013084A (ko) 2023-01-26

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