JPWO2020235091A5 - - Google Patents
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- Publication number
- JPWO2020235091A5 JPWO2020235091A5 JP2021520016A JP2021520016A JPWO2020235091A5 JP WO2020235091 A5 JPWO2020235091 A5 JP WO2020235091A5 JP 2021520016 A JP2021520016 A JP 2021520016A JP 2021520016 A JP2021520016 A JP 2021520016A JP WO2020235091 A5 JPWO2020235091 A5 JP WO2020235091A5
- Authority
- JP
- Japan
- Prior art keywords
- particle beam
- charged particle
- image
- sample
- angle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims description 56
- 230000003287 optical effect Effects 0.000 claims description 6
- 230000000052 comparative effect Effects 0.000 claims description 5
- 238000011156 evaluation Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims 13
- 230000001678 irradiating effect Effects 0.000 claims 4
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2019/020503 WO2020235091A1 (ja) | 2019-05-23 | 2019-05-23 | 荷電粒子線装置及び荷電粒子線装置の制御方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020235091A1 JPWO2020235091A1 (https=) | 2020-11-26 |
| JPWO2020235091A5 true JPWO2020235091A5 (https=) | 2022-01-14 |
| JP7168777B2 JP7168777B2 (ja) | 2022-11-09 |
Family
ID=73458460
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021520016A Active JP7168777B2 (ja) | 2019-05-23 | 2019-05-23 | 荷電粒子線装置及び荷電粒子線装置の制御方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US11791131B2 (https=) |
| JP (1) | JP7168777B2 (https=) |
| WO (1) | WO2020235091A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020235091A1 (ja) * | 2019-05-23 | 2020-11-26 | 株式会社日立ハイテク | 荷電粒子線装置及び荷電粒子線装置の制御方法 |
| FR3103897B1 (fr) * | 2019-12-02 | 2022-04-01 | Safran | Dispositif et procédé de mesure des angles d’orientation d’un système d’imagerie x |
| JP2024134459A (ja) * | 2023-03-20 | 2024-10-03 | キオクシア株式会社 | 電子顕微鏡、及び、結晶評価方法 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3422045B2 (ja) * | 1993-06-21 | 2003-06-30 | 株式会社日立製作所 | 組成及び格子歪測定用電子顕微鏡及びその観察方法 |
| JPH08106873A (ja) * | 1994-10-04 | 1996-04-23 | Hitachi Ltd | 電子顕微鏡装置 |
| JP5268324B2 (ja) | 2007-10-29 | 2013-08-21 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微装置及び顕微方法 |
| JP5315906B2 (ja) | 2008-10-03 | 2013-10-16 | 富士通株式会社 | 電子線装置及びその補正方法、並びに補正用基板 |
| US9103769B2 (en) * | 2009-12-15 | 2015-08-11 | The Regents Of The University Of California | Apparatus and methods for controlling electron microscope stages |
| US8841613B2 (en) * | 2010-05-20 | 2014-09-23 | California Institute Of Technology | Method and system for 4D tomography and ultrafast scanning electron microscopy |
| JP6261178B2 (ja) * | 2013-03-27 | 2018-01-17 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置、荷電粒子ビーム装置を用いた試料の加工方法、及び荷電粒子ビーム装置を用いた試料の加工コンピュータプログラム |
| US9754762B2 (en) * | 2014-07-07 | 2017-09-05 | Hitachi High-Technologies Corporation | Electron microscope and sample observation method |
| EP2991098A1 (en) * | 2014-08-25 | 2016-03-02 | Fei Company | Method of acquiring EBSP patterns |
| JP6383650B2 (ja) | 2014-11-28 | 2018-08-29 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US9978557B2 (en) * | 2016-04-21 | 2018-05-22 | Fei Company | System for orienting a sample using a diffraction pattern |
| US9859091B1 (en) * | 2016-06-20 | 2018-01-02 | International Business Machines Corporation | Automatic alignment for high throughput electron channeling contrast imaging |
| JP6606706B2 (ja) * | 2016-06-24 | 2019-11-20 | 株式会社リガク | 処理方法、処理装置および処理プログラム |
| JP6876418B2 (ja) | 2016-12-05 | 2021-05-26 | 日本電子株式会社 | 画像取得方法および電子顕微鏡 |
| US9905394B1 (en) * | 2017-02-16 | 2018-02-27 | Carl Zeiss Microscopy Gmbh | Method for analyzing an object and a charged particle beam device for carrying out this method |
| US10811218B2 (en) * | 2017-05-31 | 2020-10-20 | Nippon Steel Corporation | Tilting parameters calculating device, sample stage, charged particle beam device, and program |
| JP6823563B2 (ja) * | 2017-07-31 | 2021-02-03 | 株式会社日立製作所 | 走査電子顕微鏡および画像処理装置 |
| JP2019191168A (ja) * | 2018-04-23 | 2019-10-31 | ブルカー ジェイヴィ イスラエル リミテッドBruker Jv Israel Ltd. | 小角x線散乱測定用のx線源光学系 |
| US10784076B2 (en) * | 2018-07-05 | 2020-09-22 | Fei Company | 3D defect characterization of crystalline samples in a scanning type electron microscope |
| US11756764B2 (en) * | 2019-04-23 | 2023-09-12 | Hitachi High-Tech Corporation | Charged particle beam apparatus and method of controlling charged particle beam apparatus |
| WO2020235091A1 (ja) * | 2019-05-23 | 2020-11-26 | 株式会社日立ハイテク | 荷電粒子線装置及び荷電粒子線装置の制御方法 |
| DE102020203580B4 (de) * | 2020-03-20 | 2021-10-07 | Carl Zeiss Microscopy Gmbh | Verfahren zum Ändern der Raum-Orientierung einer Mikroprobe in einem Mikroskop-System, sowie Computerprogrammprodukt |
| US11195693B1 (en) * | 2020-05-29 | 2021-12-07 | Fei Company | Method and system for dynamic band contrast imaging |
| US11650171B2 (en) * | 2021-06-24 | 2023-05-16 | Fei Company | Offcut angle determination using electron channeling patterns |
-
2019
- 2019-05-23 WO PCT/JP2019/020503 patent/WO2020235091A1/ja not_active Ceased
- 2019-05-23 US US17/608,651 patent/US11791131B2/en active Active
- 2019-05-23 JP JP2021520016A patent/JP7168777B2/ja active Active
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