JPWO2019171205A5 - - Google Patents

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Publication number
JPWO2019171205A5
JPWO2019171205A5 JP2020504473A JP2020504473A JPWO2019171205A5 JP WO2019171205 A5 JPWO2019171205 A5 JP WO2019171205A5 JP 2020504473 A JP2020504473 A JP 2020504473A JP 2020504473 A JP2020504473 A JP 2020504473A JP WO2019171205 A5 JPWO2019171205 A5 JP WO2019171205A5
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JP
Japan
Prior art keywords
oxide
insulator
contact
region
conductor
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Application number
JP2020504473A
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English (en)
Japanese (ja)
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JPWO2019171205A1 (ja
JP7142081B2 (ja
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Priority claimed from PCT/IB2019/051516 external-priority patent/WO2019171205A1/ja
Publication of JPWO2019171205A1 publication Critical patent/JPWO2019171205A1/ja
Publication of JPWO2019171205A5 publication Critical patent/JPWO2019171205A5/ja
Priority to JP2022144504A priority Critical patent/JP2022171783A/ja
Application granted granted Critical
Publication of JP7142081B2 publication Critical patent/JP7142081B2/ja
Priority to JP2024082375A priority patent/JP2024103536A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2020504473A 2018-03-06 2019-02-26 積層体、及び半導体装置 Active JP7142081B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2022144504A JP2022171783A (ja) 2018-03-06 2022-09-12 半導体装置
JP2024082375A JP2024103536A (ja) 2018-03-06 2024-05-21 半導体装置

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2018040042 2018-03-06
JP2018040041 2018-03-06
JP2018040046 2018-03-06
JP2018040046 2018-03-06
JP2018040041 2018-03-06
JP2018040042 2018-03-06
PCT/IB2019/051516 WO2019171205A1 (ja) 2018-03-06 2019-02-26 積層体、及び半導体装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022144504A Division JP2022171783A (ja) 2018-03-06 2022-09-12 半導体装置

Publications (3)

Publication Number Publication Date
JPWO2019171205A1 JPWO2019171205A1 (ja) 2021-02-25
JPWO2019171205A5 true JPWO2019171205A5 (https=) 2022-02-17
JP7142081B2 JP7142081B2 (ja) 2022-09-26

Family

ID=67847021

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2020504473A Active JP7142081B2 (ja) 2018-03-06 2019-02-26 積層体、及び半導体装置
JP2022144504A Withdrawn JP2022171783A (ja) 2018-03-06 2022-09-12 半導体装置
JP2024082375A Withdrawn JP2024103536A (ja) 2018-03-06 2024-05-21 半導体装置

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2022144504A Withdrawn JP2022171783A (ja) 2018-03-06 2022-09-12 半導体装置
JP2024082375A Withdrawn JP2024103536A (ja) 2018-03-06 2024-05-21 半導体装置

Country Status (5)

Country Link
US (2) US11387343B2 (https=)
JP (3) JP7142081B2 (https=)
KR (1) KR102740089B1 (https=)
CN (1) CN111819670B (https=)
WO (1) WO2019171205A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102208520B1 (ko) 2016-07-19 2021-01-26 어플라이드 머티어리얼스, 인코포레이티드 디스플레이 디바이스들에서 활용되는 지르코늄 산화물을 포함하는 하이-k 유전체 재료들
KR102686124B1 (ko) * 2021-09-07 2024-07-17 한양대학교 산학협력단 헥사고날 구조를 갖는 준-단배향 igzo 물질막, 및 그 제조방법, 그리고 준-단배향 igzo 물질막이 사용된 반도체 소자
TW202339171A (zh) * 2021-09-21 2023-10-01 日商半導體能源研究所股份有限公司 半導體裝置
CN115386887A (zh) * 2022-08-31 2022-11-25 青岛云路先进材料技术股份有限公司 一种非晶、纳米晶合金层叠体切割面的清洗液和清洗方法

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Publication number Priority date Publication date Assignee Title
KR102089200B1 (ko) * 2009-11-28 2020-03-13 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제조 방법
WO2011142371A1 (en) * 2010-05-14 2011-11-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
CN107947763B (zh) * 2010-08-06 2021-12-28 株式会社半导体能源研究所 半导体集成电路
TWI657580B (zh) * 2011-01-26 2019-04-21 Semiconductor Energy Laboratory Co., Ltd. 半導體裝置及其製造方法
JP5806905B2 (ja) * 2011-09-30 2015-11-10 株式会社半導体エネルギー研究所 半導体装置
US8941113B2 (en) * 2012-03-30 2015-01-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor element, semiconductor device, and manufacturing method of semiconductor element
US9048323B2 (en) * 2012-04-30 2015-06-02 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
KR102099261B1 (ko) * 2012-08-10 2020-04-09 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제작 방법
US9263531B2 (en) * 2012-11-28 2016-02-16 Semiconductor Energy Laboratory Co., Ltd. Oxide semiconductor film, film formation method thereof, and semiconductor device
WO2015125042A1 (en) * 2014-02-19 2015-08-27 Semiconductor Energy Laboratory Co., Ltd. Oxide, semiconductor device, module, and electronic device
WO2015145292A1 (en) * 2014-03-28 2015-10-01 Semiconductor Energy Laboratory Co., Ltd. Transistor and semiconductor device
WO2016092427A1 (en) 2014-12-10 2016-06-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
JP6674269B2 (ja) * 2015-02-09 2020-04-01 株式会社半導体エネルギー研究所 半導体装置、及び半導体装置の作製方法
US9653613B2 (en) 2015-02-27 2017-05-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP2016225613A (ja) * 2015-05-26 2016-12-28 株式会社半導体エネルギー研究所 半導体装置及び半導体装置の駆動方法
US10096631B2 (en) * 2015-11-30 2018-10-09 Semiconductor Energy Laboratory Co., Ltd. Signal processing circuit and semiconductor device including the signal processing circuit
JP6811084B2 (ja) * 2015-12-18 2021-01-13 株式会社半導体エネルギー研究所 半導体装置
US20170221899A1 (en) * 2016-01-29 2017-08-03 Semiconductor Energy Laboratory Co., Ltd. Microcontroller System
US10043917B2 (en) * 2016-03-03 2018-08-07 United Microelectronics Corp. Oxide semiconductor device and method of manufacturing the same
WO2017158465A1 (ja) 2016-03-18 2017-09-21 株式会社半導体エネルギー研究所 記憶装置

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