JPWO2018061644A1 - 金属窒化物含有粒子、分散組成物、硬化性組成物、硬化膜、及びそれらの製造方法、並びにカラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ - Google Patents

金属窒化物含有粒子、分散組成物、硬化性組成物、硬化膜、及びそれらの製造方法、並びにカラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ Download PDF

Info

Publication number
JPWO2018061644A1
JPWO2018061644A1 JP2018542042A JP2018542042A JPWO2018061644A1 JP WO2018061644 A1 JPWO2018061644 A1 JP WO2018061644A1 JP 2018542042 A JP2018542042 A JP 2018542042A JP 2018542042 A JP2018542042 A JP 2018542042A JP WO2018061644 A1 JPWO2018061644 A1 JP WO2018061644A1
Authority
JP
Japan
Prior art keywords
atom
group
metal nitride
curable composition
containing particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018542042A
Other languages
English (en)
Japanese (ja)
Inventor
浜田　大輔
大輔 浜田
久保田　誠
誠 久保田
貴規 田口
貴規 田口
裕貴 坂本
裕貴 坂本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of JPWO2018061644A1 publication Critical patent/JPWO2018061644A1/ja
Priority to JP2022039454A priority Critical patent/JP7373000B2/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/076—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with titanium or zirconium or hafnium
    • C01B21/0763—Preparation from titanium, zirconium or hafnium halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/28—Nitrogen-containing compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70—SSIS architectures; Circuits associated therewith

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
JP2018542042A 2016-09-30 2017-09-05 金属窒化物含有粒子、分散組成物、硬化性組成物、硬化膜、及びそれらの製造方法、並びにカラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ Pending JPWO2018061644A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022039454A JP7373000B2 (ja) 2016-09-30 2022-03-14 金属窒化物含有粒子、分散組成物、硬化性組成物、硬化膜、及びそれらの製造方法、並びにカラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016193263 2016-09-30
JP2016193263 2016-09-30
PCT/JP2017/031852 WO2018061644A1 (fr) 2016-09-30 2017-09-05 Particules à teneur en nitrure de métal, composition de dispersion, composition durcissable, film durci, procédés de fabrication de ceux-ci, filtre coloré, élément d'imagerie à semi-conducteurs, dispositif d'imagerie à semi-conducteurs, et capteur de rayons infrarouges

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022039454A Division JP7373000B2 (ja) 2016-09-30 2022-03-14 金属窒化物含有粒子、分散組成物、硬化性組成物、硬化膜、及びそれらの製造方法、並びにカラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ

Publications (1)

Publication Number Publication Date
JPWO2018061644A1 true JPWO2018061644A1 (ja) 2019-09-05

Family

ID=61763448

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2018542042A Pending JPWO2018061644A1 (ja) 2016-09-30 2017-09-05 金属窒化物含有粒子、分散組成物、硬化性組成物、硬化膜、及びそれらの製造方法、並びにカラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ
JP2022039454A Active JP7373000B2 (ja) 2016-09-30 2022-03-14 金属窒化物含有粒子、分散組成物、硬化性組成物、硬化膜、及びそれらの製造方法、並びにカラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022039454A Active JP7373000B2 (ja) 2016-09-30 2022-03-14 金属窒化物含有粒子、分散組成物、硬化性組成物、硬化膜、及びそれらの製造方法、並びにカラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ

Country Status (4)

Country Link
JP (2) JPWO2018061644A1 (fr)
KR (1) KR102294518B1 (fr)
TW (1) TWI751196B (fr)
WO (1) WO2018061644A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113104822A (zh) * 2021-03-31 2021-07-13 攀枝花学院 氧化钛还原氮化的方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7029546B2 (ja) * 2018-09-11 2022-03-03 富士フイルム株式会社 遮光性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置
DE102019124713A1 (de) 2018-11-27 2020-05-28 Samsung Electronics Co., Ltd. Vorrichtungen und Verfahren zur Steuerung einer Exposition gegenüber drahtloser Kommunikation
JP2020200376A (ja) * 2019-06-07 2020-12-17 三菱ケミカル株式会社 樹脂組成物、積層フィルム、積層フィルムの製造方法及び積層フィルムの使用用途

Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0222110A (ja) * 1988-04-23 1990-01-25 Tioxide Group Plc 窒素化合物
JPH11263639A (ja) * 1998-03-16 1999-09-28 Sumitomo Metal Mining Co Ltd 熱線遮蔽膜形成用塗布液及び熱線遮蔽膜
JP2001049190A (ja) * 1999-08-11 2001-02-20 Sumitomo Metal Mining Co Ltd 日射フィルター膜形成用塗布液
JP2006206891A (ja) * 2004-12-28 2006-08-10 Ishihara Sangyo Kaisha Ltd 黒色系酸窒化チタン
JP2007029859A (ja) * 2005-07-27 2007-02-08 Nisshin Seifun Group Inc 微粒子の製造方法および装置
JP2008269820A (ja) * 2007-04-17 2008-11-06 Mitsubishi Materials Corp 導電性黒色粉末とその黒色膜および製造方法
JP2010031158A (ja) * 2008-07-29 2010-02-12 Mitsubishi Materials Corp 黒色顔料分散液とその製造方法および用途
JP2010030841A (ja) * 2008-07-29 2010-02-12 Mitsubishi Materials Corp 黒色チタン酸窒化物粉末とその製造方法および用途
WO2010041658A1 (fr) * 2008-10-06 2010-04-15 昭和電工株式会社 Procédé de production de particule de mélange de carbonitrures ou de particule de mélange d'oxycarbonitrures, et leur utilisation
JP2012096945A (ja) * 2010-10-29 2012-05-24 Mitsubishi Materials Corp 青色遮蔽黒色粉末とその製造方法および用途
JP2012096971A (ja) * 2010-11-04 2012-05-24 Japan Fine Ceramics Center 超微粒かつ均質なチタン系炭窒化物固溶体粉末の製造方法
JP2012208374A (ja) * 2011-03-30 2012-10-25 Fujifilm Corp 感放射線性組成物、パターン形成方法、カラーフィルタ及びその製造方法、並びに、固体撮像素子
JP2012237952A (ja) * 2011-02-25 2012-12-06 Fujifilm Corp 遮光性組成物、遮光性組成物の製造方法、ソルダレジスト、パターン形成方法、及び固体撮像素子
JP2013237816A (ja) * 2012-05-17 2013-11-28 Fujifilm Corp 着色感放射線性組成物、これを用いたカラーフィルタ
JP2015063663A (ja) * 2013-08-27 2015-04-09 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
JP2015227282A (ja) * 2009-06-15 2015-12-17 東レ株式会社 黒色複合微粒子、黒色樹脂組成物、カラーフィルター基板および液晶表示装置
JP2016038587A (ja) * 2014-08-08 2016-03-22 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
JP5941180B1 (ja) * 2015-03-20 2016-06-29 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101090866B (zh) * 2004-12-28 2011-08-17 石原产业株式会社 黑色氮氧化钛
JP5099094B2 (ja) 2008-09-18 2012-12-12 東レ株式会社 黒色樹脂組成物、樹脂ブラックマトリクス、カラーフィルターおよび液晶表示装置
US8278657B2 (en) * 2009-02-13 2012-10-02 Semiconductor Energy Laboratory Co., Ltd. Transistor, semiconductor device including the transistor, and manufacturing method of the transistor and the semiconductor device
KR20140068852A (ko) * 2011-06-27 2014-06-09 식스포인트 머터리얼즈 인코퍼레이티드 전이금속 질화물을 함유하는 전극을 지닌 울트라커패시터

Patent Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0222110A (ja) * 1988-04-23 1990-01-25 Tioxide Group Plc 窒素化合物
JPH11263639A (ja) * 1998-03-16 1999-09-28 Sumitomo Metal Mining Co Ltd 熱線遮蔽膜形成用塗布液及び熱線遮蔽膜
JP2001049190A (ja) * 1999-08-11 2001-02-20 Sumitomo Metal Mining Co Ltd 日射フィルター膜形成用塗布液
JP2006206891A (ja) * 2004-12-28 2006-08-10 Ishihara Sangyo Kaisha Ltd 黒色系酸窒化チタン
JP2007029859A (ja) * 2005-07-27 2007-02-08 Nisshin Seifun Group Inc 微粒子の製造方法および装置
JP2008269820A (ja) * 2007-04-17 2008-11-06 Mitsubishi Materials Corp 導電性黒色粉末とその黒色膜および製造方法
JP2010031158A (ja) * 2008-07-29 2010-02-12 Mitsubishi Materials Corp 黒色顔料分散液とその製造方法および用途
JP2010030841A (ja) * 2008-07-29 2010-02-12 Mitsubishi Materials Corp 黒色チタン酸窒化物粉末とその製造方法および用途
WO2010041658A1 (fr) * 2008-10-06 2010-04-15 昭和電工株式会社 Procédé de production de particule de mélange de carbonitrures ou de particule de mélange d'oxycarbonitrures, et leur utilisation
JP2015227282A (ja) * 2009-06-15 2015-12-17 東レ株式会社 黒色複合微粒子、黒色樹脂組成物、カラーフィルター基板および液晶表示装置
JP2012096945A (ja) * 2010-10-29 2012-05-24 Mitsubishi Materials Corp 青色遮蔽黒色粉末とその製造方法および用途
JP2012096971A (ja) * 2010-11-04 2012-05-24 Japan Fine Ceramics Center 超微粒かつ均質なチタン系炭窒化物固溶体粉末の製造方法
JP2012237952A (ja) * 2011-02-25 2012-12-06 Fujifilm Corp 遮光性組成物、遮光性組成物の製造方法、ソルダレジスト、パターン形成方法、及び固体撮像素子
JP2012208374A (ja) * 2011-03-30 2012-10-25 Fujifilm Corp 感放射線性組成物、パターン形成方法、カラーフィルタ及びその製造方法、並びに、固体撮像素子
JP2013237816A (ja) * 2012-05-17 2013-11-28 Fujifilm Corp 着色感放射線性組成物、これを用いたカラーフィルタ
JP2015063663A (ja) * 2013-08-27 2015-04-09 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
JP2016038587A (ja) * 2014-08-08 2016-03-22 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
JP5941180B1 (ja) * 2015-03-20 2016-06-29 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
押鐘 寧 ET AL.: "窒化チタン薄膜を金属層として利用した金属−誘電体−金属構造における表面プラズモンポラリトンの励起・伝", 2015年度精密工学会秋季大会学術講演会講演論文集, JPN7017003722, 4 September 2015 (2015-09-04), pages 321 - 322, ISSN: 0004661665 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113104822A (zh) * 2021-03-31 2021-07-13 攀枝花学院 氧化钛还原氮化的方法

Also Published As

Publication number Publication date
TWI751196B (zh) 2022-01-01
TW201815682A (zh) 2018-05-01
JP7373000B2 (ja) 2023-11-01
KR102294518B1 (ko) 2021-08-27
KR20190041493A (ko) 2019-04-22
JP2022079500A (ja) 2022-05-26
WO2018061644A1 (fr) 2018-04-05

Similar Documents

Publication Publication Date Title
JP7373000B2 (ja) 金属窒化物含有粒子、分散組成物、硬化性組成物、硬化膜、及びそれらの製造方法、並びにカラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ
WO2017203979A1 (fr) Composition durcissable, film durci, filtre de couleur, film de blocage de lumière, élément d'imagerie à l'état solide, dispositif d'affichage d'image, et procédé de production de film durci
TWI798453B (zh) 遮光性樹脂組成物、硬化膜、濾色器、遮光膜、固體攝像元件、圖像顯示裝置
KR102202906B1 (ko) 조성물, 경화막, 컬러 필터, 고체 촬상 소자, 적외선 센서, 근적외선 센서, 및 근접 센서
JP6745869B2 (ja) 組成物、組成物の製造方法、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置
WO2019176409A1 (fr) Procédé de fabrication de film durci et procédé de fabrication d'élément d'imagerie à semi-conducteurs
JP6818751B2 (ja) 硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、硬化膜の製造方法、及び、多官能チオール化合物
JP6680907B2 (ja) 硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、及び、硬化膜の製造方法
KR102160018B1 (ko) 조성물, 경화막, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치
JP6994044B2 (ja) 硬化膜の製造方法、固体撮像素子の製造方法、画像表示装置の製造方法
JP6727344B2 (ja) 硬化性組成物、化合物、硬化膜、硬化膜の製造方法、カラーフィルタの製造方法、固体撮像素子、赤外線センサ
WO2017208771A1 (fr) Composition, film durci, filtre coloré, film de blocage de lumière, dispositif d'imagerie à semi-conducteurs, et dispositif d'affichage d'image
JP6745977B2 (ja) 硬化性組成物、硬化膜、遮光膜、固体撮像素子、固体撮像装置、及び、硬化膜の製造方法
WO2017175550A1 (fr) Composition ainsi que procédé de fabrication de celle-ci, film durci, filtre coloré, film écran à la lumière, élément d'imagerie à semi-conducteurs, et dispositif d'affichage d'image
WO2019171902A1 (fr) Composition durcissable, film durci, élément optique, élément d'imagerie à semi-conducteurs, et filtre coloré

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20190311

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200526

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200721

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210105

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210222

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210803

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20211004

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20211130

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20211214