JPWO2016171187A1 - 光硬化性樹脂組成物、これを用いる硬化膜の製造方法及び該硬化膜を含む積層体 - Google Patents

光硬化性樹脂組成物、これを用いる硬化膜の製造方法及び該硬化膜を含む積層体 Download PDF

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JPWO2016171187A1
JPWO2016171187A1 JP2017514171A JP2017514171A JPWO2016171187A1 JP WO2016171187 A1 JPWO2016171187 A1 JP WO2016171187A1 JP 2017514171 A JP2017514171 A JP 2017514171A JP 2017514171 A JP2017514171 A JP 2017514171A JP WO2016171187 A1 JPWO2016171187 A1 JP WO2016171187A1
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meth
cured film
acrylate
polyrotaxane
group
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JP2017514171A
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Japanese (ja)
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未央 安井
未央 安井
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/16—Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Laminated Bodies (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP2017514171A 2015-04-21 2016-04-20 光硬化性樹脂組成物、これを用いる硬化膜の製造方法及び該硬化膜を含む積層体 Pending JPWO2016171187A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015086506 2015-04-21
JP2015086506 2015-04-21
PCT/JP2016/062552 WO2016171187A1 (ja) 2015-04-21 2016-04-20 光硬化性樹脂組成物、これを用いる硬化膜の製造方法及び該硬化膜を含む積層体

Publications (1)

Publication Number Publication Date
JPWO2016171187A1 true JPWO2016171187A1 (ja) 2018-02-15

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JP2017514171A Pending JPWO2016171187A1 (ja) 2015-04-21 2016-04-20 光硬化性樹脂組成物、これを用いる硬化膜の製造方法及び該硬化膜を含む積層体

Country Status (4)

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JP (1) JPWO2016171187A1 (zh)
KR (1) KR20170139600A (zh)
TW (1) TW201704370A (zh)
WO (1) WO2016171187A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018038124A1 (ja) * 2016-08-23 2019-06-24 国立大学法人大阪大学 重合性官能基で修飾されたポリロタキサン及びその製造方法、並びに高分子材料及びその製造方法
JP6910378B2 (ja) * 2017-01-18 2021-07-28 住友化学株式会社 成形体およびその製造方法
JP6913592B2 (ja) * 2017-09-28 2021-08-04 株式会社ネオス 硬化性組成物および硬化被膜の製造方法ならびに樹脂成形物品
JP7039984B2 (ja) * 2017-12-14 2022-03-23 昭和電工マテリアルズ株式会社 回路接続用接着剤組成物及び回路接続構造体
JP7179503B2 (ja) * 2018-06-08 2022-11-29 東洋スチレン株式会社 スチレン系共重合体及びその成形品、シート
JP7060849B2 (ja) * 2018-06-27 2022-04-27 日産化学株式会社 インプリント用光硬化性組成物
WO2020129902A1 (ja) * 2018-12-21 2020-06-25 日産化学株式会社 インプリント用光硬化性組成物
JP7383448B2 (ja) * 2019-10-18 2023-11-20 リンテック株式会社 粘着剤、粘着シート、バックライトユニットおよび表示装置
EP4257566A4 (en) * 2020-12-07 2024-04-24 Sumitomo Electric Industries RESIN COMPOSITION, OPTICAL FIBER AND OPTICAL FIBER PRODUCTION METHOD
JPWO2022202005A1 (zh) * 2021-03-26 2022-09-29

Family Cites Families (6)

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Publication number Priority date Publication date Assignee Title
JP4911474B2 (ja) * 2008-02-26 2012-04-04 富士フイルム株式会社 ハードコートフィルム、偏光板、および画像表示装置
JP4961369B2 (ja) * 2008-02-27 2012-06-27 富士フイルム株式会社 光学フィルム、偏光板、画像表示装置および光学フィルムの製造方法
KR101418409B1 (ko) * 2012-05-31 2014-07-09 주식회사 엘지화학 하드코팅 조성물
KR101415839B1 (ko) * 2012-08-23 2014-07-09 주식회사 엘지화학 하드코팅 필름
KR101443845B1 (ko) * 2012-09-03 2014-09-23 주식회사 엘지화학 하드코팅 필름을 포함하는 편광판
KR101578914B1 (ko) * 2013-03-15 2015-12-18 주식회사 엘지화학 플라스틱 필름

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WO2016171187A1 (ja) 2016-10-27
KR20170139600A (ko) 2017-12-19

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