JPWO2015111586A1 - フッ化マグネシウム焼結体の製造方法、中性子モデレータの製造方法及び中性子モデレータ - Google Patents
フッ化マグネシウム焼結体の製造方法、中性子モデレータの製造方法及び中性子モデレータ Download PDFInfo
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- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 title claims abstract description 147
- 229910001635 magnesium fluoride Inorganic materials 0.000 title claims abstract description 147
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 75
- 239000000843 powder Substances 0.000 claims abstract description 41
- 238000005245 sintering Methods 0.000 claims abstract description 33
- 239000000463 material Substances 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims description 42
- 238000003754 machining Methods 0.000 claims description 20
- 238000010030 laminating Methods 0.000 claims description 9
- 238000010079 rubber tapping Methods 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 2
- 238000005336 cracking Methods 0.000 abstract description 17
- 239000000543 intermediate Substances 0.000 description 107
- 238000010586 diagram Methods 0.000 description 31
- 229910002804 graphite Inorganic materials 0.000 description 14
- 239000010439 graphite Substances 0.000 description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 11
- 238000003475 lamination Methods 0.000 description 10
- 238000005520 cutting process Methods 0.000 description 9
- 238000005553 drilling Methods 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 8
- 238000005452 bending Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000002560 therapeutic procedure Methods 0.000 description 6
- 206010028980 Neoplasm Diseases 0.000 description 5
- 201000011510 cancer Diseases 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 4
- -1 polytetrafluoroethylene Polymers 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 description 4
- 239000013077 target material Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 238000005341 cation exchange Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-BJUDXGSMSA-N Boron-10 Chemical compound [10B] ZOXJGFHDIHLPTG-BJUDXGSMSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010038111 Recurrent cancer Diseases 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005429 filling process Methods 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000011275 oncology therapy Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000002490 spark plasma sintering Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Abstract
Description
図1は、本実施形態に係る中性子モデレータを備える中性子源発生装置を説明する説明図である。図1に示すように、中性子源発生装置は、加速器100と、ビームトランスポート25と、ベンディング磁石26と、ターゲットユニット20とを備えている。
図2は、本実施形態に係る中性子モデレータの斜視図である。図3は、図2の側面図である。図4は、図3の上面図である。図5は、図3に示すA−A断面の断面図である。中性子モデレータ1は、図3に示すように、図1に示すターゲット27側を上面1A、照射部28側を下面1B、外周1Pを有する略円柱体である。図3に示すように、中性子モデレータ1の厚みを図1に示すターゲット27から照射部28に向かう中性子の通過方向の厚みLとした場合、中性子モデレータ1は、直径Dに対する厚みLの比(厚みL/直径D)が180%以上であることが多い。このような中性子モデレータ1の形状を一体で焼結した場合、加圧状態の不均一性から、中性子モデレータ1の内部で相対密度が低下する可能性がある。中性子モデレータ1の相対密度の不均一性は、中性子の減速に影響を与える可能性がある。また、中性子モデレータ1は、大型サイズ(特に直径(φ)150mm以上)である場合、外周部に割れ又は欠けが発生する可能性がある。
試料は、純度99%以上のフッ化マグネシウム粉末(森田化学工業製)を、内容積が焼結直径φ(mm)×厚さ(mm)となる金型の容器に充填し、タッピング充填を行った。
2 第1中間積層体
3 第2中間積層体
4 第3中間積層体
20 ターゲットユニット
21 イオン源
22 低エネルギービーム輸送系
23 加速管
25 ビームトランスポート
26 ベンディング磁石
27 ターゲット
28 照射部
29 中性子反射体
30 放電プラズマ焼結装置
40 ドリル
100 加速器
ds フッ化マグネシウム焼結体
E 直流パルス電源
GD グラファイトダイ
GP グラファイトパンチ
GS グラファイトスペーサー
試料は、純度99%以上のフッ化マグネシウム粉末(森田化学工業製)を、内容積が直径φ(mm)×厚さ(mm)となる金型の容器に充填し、タッピング充填を行った。
Claims (7)
- フッ化マグネシウム焼結体の製造方法であって、
フッ化マグネシウム粉末材を金型にタッピング充填を行う粉体充填工程と
前記粉体充填工程で充填された前記フッ化マグネシウム粉末材を、パルスを通電しながら焼結するパルス通電焼結を行い、フッ化マグネシウム焼結体を得るパルス通電焼結工程と、
を含むことを特徴とするフッ化マグネシウム焼結体の製造方法。 - 前記粉体充填工程において、フッ化マグネシウム粉末材が99質量%以上の高純度材であり、残部が不可避不純物を含む、請求項1に記載のフッ化マグネシウム焼結体の製造方法。
- 請求項1乃至請求項2に記載のフッ化マグネシウム焼結体の製造方法で製造された複数の円盤状のフッ化マグネシウム焼結体を複数準備する準備工程と、
前記円盤状のフッ化マグネシウム焼結体を積層し、接合して、中性子モデレータを製造する積層工程と、
を含む中性子モデレータの製造方法。 - 前記積層工程は、前記円盤状のフッ化マグネシウム焼結体を中間体とした場合、前記中間体にさらに機械加工工程により孔開け加工を行った第2中間積層体を少なくとも1つ積層する、請求項3に記載の中性子モデレータの製造方法。
- 前記積層工程では、前記円盤状のフッ化マグネシウム焼結体を中間体とした場合、前記中間体に機械加工工程により外周にテーパ加工を行った第3中間積層体を少なくとも1つ積層する、請求項4に記載の中性子モデレータの製造方法。
- 前記積層工程では、前記第1中間積層体、前記第2中間積層体及び前記第3中間積層体を積層することにより、中性子モデレータを製造する請求項5に記載の中性子モデレータの製造方法。
- 中性子を減速させる中性子モデレータであって、
複数の円盤状のフッ化マグネシウム焼結体が積層される中間積層体を含むことを特徴とする中性子モデレータ。
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