JPWO2008012877A1 - SiC基板を用いた化合物半導体装置とその製造方法 - Google Patents
SiC基板を用いた化合物半導体装置とその製造方法 Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims abstract description 126
- 239000004065 semiconductor Substances 0.000 title claims abstract description 100
- 150000001875 compounds Chemical class 0.000 title claims abstract description 77
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 229910002704 AlGaN Inorganic materials 0.000 claims abstract description 84
- 238000000034 method Methods 0.000 claims abstract description 22
- 239000000470 constituent Substances 0.000 claims abstract description 14
- 238000000927 vapour-phase epitaxy Methods 0.000 claims abstract description 4
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims abstract 4
- 229910052594 sapphire Inorganic materials 0.000 claims description 17
- 239000010980 sapphire Substances 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 14
- 239000012535 impurity Substances 0.000 claims description 12
- 239000010410 layer Substances 0.000 description 379
- 238000002248 hydride vapour-phase epitaxy Methods 0.000 description 92
- 239000000460 chlorine Substances 0.000 description 86
- 239000007789 gas Substances 0.000 description 46
- 238000009792 diffusion process Methods 0.000 description 30
- 239000013078 crystal Substances 0.000 description 24
- 230000000694 effects Effects 0.000 description 18
- 239000000203 mixture Substances 0.000 description 18
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 16
- 229910052801 chlorine Inorganic materials 0.000 description 16
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 12
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 12
- 238000005530 etching Methods 0.000 description 12
- 238000002955 isolation Methods 0.000 description 12
- 230000003071 parasitic effect Effects 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- 238000012986 modification Methods 0.000 description 10
- 230000004048 modification Effects 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 238000002109 crystal growth method Methods 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 230000003405 preventing effect Effects 0.000 description 8
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 8
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 6
- 229910021529 ammonia Inorganic materials 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 238000001784 detoxification Methods 0.000 description 6
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 6
- 238000011144 upstream manufacturing Methods 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 238000003917 TEM image Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000000724 energy-dispersive X-ray spectrum Methods 0.000 description 2
- 150000004678 hydrides Chemical class 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- QBJCZLXULXFYCK-UHFFFAOYSA-N magnesium;cyclopenta-1,3-diene Chemical compound [Mg+2].C1C=CC=[C-]1.C1C=CC=[C-]1 QBJCZLXULXFYCK-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 229910001510 metal chloride Inorganic materials 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000002096 quantum dot Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- 230000005533 two-dimensional electron gas Effects 0.000 description 2
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Abstract
Description
導電性SiC基板と、
前記導電性SiC基板上に形成され、Clを含むAlN層と、
前記Clを含むAlN層の上に形成され、Clを含まないAlN層と、
前記Clを含まないAlN層上方に形成された素子構成層と、
を有する化合物半導体装置
が提供される。
(1)導電性SiC基板上に、H−VPEで第1AlNバッファ層を成長する工程と、
(2)前記第1AlNバッファ層の上に、MOCVDで第2AlNバッファ層を成長する工程と、
(3)前記第2AlNバッファ層の上にMOCVDで素子構成層を成長する工程と、
を有する化合物半導体装置の製造方法
が提供される。
圧力: 常圧
ガス流量: HCl:100ccm、
NH3:10LM(リットルパーミニッツ)、
温度: 1100℃。
第1AlNバッファ層2の抵抗率は、たとえば1×105(1E5の様に表記する)Ωcmより格段に高くすることができる。但し、第1AlNバッファ層2は、塩素を含むであろう。塩素が例えば電極まで拡散すると悪影響を及ぼす可能性が高い。厚い第1AlNバッファ層2の上に、MOCVDで第2AlNバッファ層3を成長し、第2AlNバッファ層3の上に、GaN系HEMT構成層を成長する。
原料とその流量: トリメチルガリウム(TMG): 0〜50sccm、
トリメチルアルミニウム(TMA): 0〜50sccm、
アンモニア(NH3): 20SLM、
n型不純物: シラン(SiH4)、
p型不純物: ビスシクロペンタディエニルマグネシウム(Cp2Mg)、
圧力: 100torr、
温度: 1100℃。
導電性SiC基板と、
前記導電性SiC基板上に形成され、Clを含むAlN層と、
前記Clを含むAlN層の上に形成され、Clを含まないAlN層と、
前記Clを含まないAlN層上方に形成された素子構成層と、
を有する化合物半導体装置
が提供される。
(1)導電性SiC基板上に、H−VPEで第1AlNバッファ層を成長する工程と、
(2)前記第1AlNバッファ層の上方に、MOCVDで第2AlNバッファ層を成長する工程と、
(3)前記第2AlNバッファ層の上にMOCVDで素子構成層を成長する工程と、
を有する化合物半導体装置の製造方法
が提供される。
圧力: 常圧
ガス流量: HCl:100ccm、
NH3:10LM(リットルパーミニッツ)、
温度: 1100℃。
第1AlNバッファ層2の抵抗率は、たとえば1×105(1E5の様に表記する)Ωcmより格段に高くすることができる。但し、第1AlNバッファ層2は、塩素を含むであろう。塩素が例えば電極まで拡散すると悪影響を及ぼす可能性が高い。厚い第1AlNバッファ層2の上に、MOCVDで第2AlNバッファ層3を成長し、第2AlNバッファ層3の上に、GaN系HEMT構成層を成長する。
原料とその流量: トリメチルガリウム(TMG): 0〜50sccm、
トリメチルアルミニウム(TMA): 0〜50sccm、
アンモニア(NH3): 20SLM、
n型不純物: シラン(SiH4)、
p型不純物: ビスシクロペンタディエニルマグネシウム(Cp2Mg)、
圧力: 100torr、
温度: 1100℃。
Claims (20)
- 導電性SiC基板と、
前記導電性SiC基板上に形成され、Clを含むAlNバッファ層と、
前記Clを含むAlN層の上に形成され、Clを含まない化合物半導体バッファ層と、
前記Clを含まないAlN層上方に形成された素子構成層と、
を有する化合物半導体装置。 - 前記Clを含むAlNバッファ層が10μm以上の厚さを有する請求項1記載の化合物半導体装置。
- 前記化合物半導体バッファ層がAlN層である請求項1記載の化合物半導体装置。
- 前記化合物半導体バッファ層がGaN層である請求項1記載の化合物半導体装置。
- 前記化合物半導体バッファ層の上に形成され、Clを含まないAlGaInN層、またはAlGaN層をさらに有する請求項3記載の化合物半導体装置。
- 前記素子構成層が、ノンドープGaN層、ノンドープAlGaN層、n型AlGaN層を含み、HEMTを構成する請求項3記載の化合物半導体装置。
- 前記素子構成層が、前記n型AlGaN層の上に形成されたn型GaN層をさらに含み、前記n型GaN層上に形成されたSiN層をさらに有する請求項6記載の化合物半導体装置。
- (1)導電性SiC基板上に、H−VPEで第1AlNバッファ層を成長する工程と、
(2)前記第1AlNバッファ層の上に、MOCVDで化合物半導体の第2バッファ層を成長する工程と、
(3)前記第2バッファ層の上方に素子構成層を成長する工程と、
を有する化合物半導体装置の製造方法。 - 前記第2バッファ層がAlN層である請求項8記載の化合物半導体装置の製造方法。
- 前記第2バッファ層がGaN層である請求項8記載の化合物半導体装置の製造方法。
- 前記工程(1)が、前記第1Alバッファ層を厚さ10μm以上成長する請求項8記載の化合物半導体装置の製造方法。
- 前記工程(2)と(3)の間に、
(4)前記第2AlNバッファ層の上に、MOCVDでAlGaN層を成長する工程を有する請求項9記載の化合物半導体装置の製造方法。 - 前記工程(3)が、ノンドープGaN層、ノンドープAlGaN層、n型AlGaN層を成長し、HEMT構造を形成する請求項9記載の化合物半導体装置の製造方法。
- 導電性SiCまたはサファイアの基板と、
前記基板上に形成され、Clを含むAlNバッファ層と、
前記Clを含むAlN層の上に形成され、Clを含まない化合物半導体バッファ層と、
前記Clを含まない化合物半導体バッファ層上方に形成された光素子構成層と、
を有する光化合物半導体装置。 - 前記化合物半導体バッファ層の表面は、前記AlNバッファ層の表面より平坦である請求項14記載の光化合物半導体装置。
- 前記化合物半導体バッファ層がAlN層である請求項14記載の光化合物半導体装置。
- 前記化合物半導体バッファ層がGaN層である請求項14記載の光化合物半導体装置。
- 前記光素子構成層が、前記化合物半導体バッファ層の上に形成され、Clを含まない第1AlGaInN層を有する請求項16記載の光化合物半導体装置。
- 前記第1AlGaInN層が、第1導電型の不純物をドープされ、前記光素子構成層が前記AlGaInN層の上に形成したノンドープAlGaInN発光層と、ノンドープ発光層の上に形成され、第1導電型と逆の第2導電型の不純物をドープされた第2AlGaInN層をさらに含む請求項18記載の光化合物半導体装置。
- 前記AlGaInN発光層が、第1および第2AlGaInN層より狭いバンドギャップを有する請求項19記載の光半導体装置。
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PCT/JP2006/314743 WO2008012877A1 (fr) | 2006-07-26 | 2006-07-26 | DISPOSITIF À SEMI-CONDUCTEURS COMPOSÉ EMPLOYANT UN SUBSTRAT DE SiC ET PROCÉDÉ POUR PRODUIRE CELUI-CI |
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JP5436819B2 (ja) * | 2008-08-04 | 2014-03-05 | 日本碍子株式会社 | 高周波用半導体素子、高周波用半導体素子形成用のエピタキシャル基板、および高周波用半導体素子形成用エピタキシャル基板の作製方法 |
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