JPS644662B2 - - Google Patents

Info

Publication number
JPS644662B2
JPS644662B2 JP5034882A JP5034882A JPS644662B2 JP S644662 B2 JPS644662 B2 JP S644662B2 JP 5034882 A JP5034882 A JP 5034882A JP 5034882 A JP5034882 A JP 5034882A JP S644662 B2 JPS644662 B2 JP S644662B2
Authority
JP
Japan
Prior art keywords
film
etching
photoresist film
coating layer
window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5034882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58166725A (ja
Inventor
Hirokazu Kaneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP5034882A priority Critical patent/JPS58166725A/ja
Publication of JPS58166725A publication Critical patent/JPS58166725A/ja
Publication of JPS644662B2 publication Critical patent/JPS644662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
JP5034882A 1982-03-29 1982-03-29 積層被覆層の開口部形成方法 Granted JPS58166725A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5034882A JPS58166725A (ja) 1982-03-29 1982-03-29 積層被覆層の開口部形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5034882A JPS58166725A (ja) 1982-03-29 1982-03-29 積層被覆層の開口部形成方法

Publications (2)

Publication Number Publication Date
JPS58166725A JPS58166725A (ja) 1983-10-01
JPS644662B2 true JPS644662B2 (enrdf_load_stackoverflow) 1989-01-26

Family

ID=12856403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5034882A Granted JPS58166725A (ja) 1982-03-29 1982-03-29 積層被覆層の開口部形成方法

Country Status (1)

Country Link
JP (1) JPS58166725A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9090363B2 (en) 2003-07-30 2015-07-28 Graham Packaging Company, L.P. Container handling system
US9162807B2 (en) 2004-09-30 2015-10-20 Graham Packaging Company, L.P. Pressure container with differential vacuum panels
US9707711B2 (en) 2006-04-07 2017-07-18 Graham Packaging Company, L.P. Container having outwardly blown, invertible deep-set grips

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5830774A (en) * 1996-06-24 1998-11-03 Motorola, Inc. Method for forming a metal pattern on a substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9090363B2 (en) 2003-07-30 2015-07-28 Graham Packaging Company, L.P. Container handling system
US9162807B2 (en) 2004-09-30 2015-10-20 Graham Packaging Company, L.P. Pressure container with differential vacuum panels
US9707711B2 (en) 2006-04-07 2017-07-18 Graham Packaging Company, L.P. Container having outwardly blown, invertible deep-set grips

Also Published As

Publication number Publication date
JPS58166725A (ja) 1983-10-01

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