JPS6441293A - Manufacture of substrate for optoelectronic integrated circuit - Google Patents
Manufacture of substrate for optoelectronic integrated circuitInfo
- Publication number
- JPS6441293A JPS6441293A JP19765787A JP19765787A JPS6441293A JP S6441293 A JPS6441293 A JP S6441293A JP 19765787 A JP19765787 A JP 19765787A JP 19765787 A JP19765787 A JP 19765787A JP S6441293 A JPS6441293 A JP S6441293A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- wiring
- stepped part
- smooth
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Junction Field-Effect Transistors (AREA)
- Semiconductor Lasers (AREA)
- Weting (AREA)
Abstract
PURPOSE:To prevent wiring disconnection from occurring upon the forming of a wiring pattern so as to improve yield, by forming a slant face to be smooth in an optoelectronic integrated circuit with wiring structure on its slant face part. CONSTITUTION:After a first mask 17 is used to form a stepped part 18 on a substrate 2, the first mask is removed. An etching solution of bromine- contained methylalcohol is used to etch the substrate 2, and then a slant plane at a stepped part 18 is formed into a smooth slant plane stepped part 1 of 20 deg. or smaller. Subsequently, an active layer 7, a gate layer 8, a contact layer 3, an etching stop layer 4, and a burial type layer structure 5 are formed on the substrate 2. Next the same process as conventional one is used to form a semiconductor laser part 6 and a field-effect transistor 9 respectively on right and left sides of the smooth slant face stepped part 1. Since the stepped part of the substrate is thus formed into the smooth slant face, wiring disconnection can be prevented from occurring due to defect in a wiring pattern upon the forming of the wiring 15.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19765787A JPS6441293A (en) | 1987-08-07 | 1987-08-07 | Manufacture of substrate for optoelectronic integrated circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19765787A JPS6441293A (en) | 1987-08-07 | 1987-08-07 | Manufacture of substrate for optoelectronic integrated circuit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6441293A true JPS6441293A (en) | 1989-02-13 |
Family
ID=16378146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19765787A Pending JPS6441293A (en) | 1987-08-07 | 1987-08-07 | Manufacture of substrate for optoelectronic integrated circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6441293A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6477982A (en) * | 1987-09-18 | 1989-03-23 | Sanyo Electric Co | Machining method of substrate |
| JP2001244572A (en) * | 2000-03-02 | 2001-09-07 | Sony Corp | Method of manufacturing semiconductor laser light emitting device |
| WO2008099779A1 (en) * | 2007-02-13 | 2008-08-21 | Olympus Corporation | Variable spectroscopic element, spectroscopic device, and endoscope system |
-
1987
- 1987-08-07 JP JP19765787A patent/JPS6441293A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6477982A (en) * | 1987-09-18 | 1989-03-23 | Sanyo Electric Co | Machining method of substrate |
| JP2001244572A (en) * | 2000-03-02 | 2001-09-07 | Sony Corp | Method of manufacturing semiconductor laser light emitting device |
| WO2008099779A1 (en) * | 2007-02-13 | 2008-08-21 | Olympus Corporation | Variable spectroscopic element, spectroscopic device, and endoscope system |
| JP2008197361A (en) * | 2007-02-13 | 2008-08-28 | Olympus Corp | Variable spectroscopic element, spectroscopic device, and endoscope system |
| US8134713B2 (en) | 2007-02-13 | 2012-03-13 | Olympus Corporation | Variable spectroscopy element, spectroscopy apparatus, and endoscope system |
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